Wei; Lung-Chen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wei; Lung-Chen.The latest application filed is for "method of fabricating polishing pad having detection window thereon".

Company Profile

0.4.6

Wei; Lung-Chen - Taichung TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of fabricating polishing pad having detection window thereon Grant 7,875,335 - Shih , et al. January 25, 2	2011-01-25
Method of manufacturing polishing pad Grant 7,285,233 - Shih , et al. October 23, 2	2007-10-23
Method of fabricating polishing pad having detection window thereon Grant 7,241,408 - Shih , et al. July 10, 2	2007-07-10
Method of manufacturing polishing pad Grant 7,132,070 - Shih , et al. November 7, 2	2006-11-07
Method of fabricating polishing pad having detection window thereon App 20060197249 - Shih; Wen-Chang ; et al.	2006-09-07
Method of fabricating polishing pad having detection window thereon App 20060198992 - Shih; Wen-Chang ; et al.	2006-09-07
Method of manufacturing polishing pad App 20060113705 - Shih; Wen-Chang ; et al.	2006-06-01
Method of fabricating polishing pad having detection window thereon App 20040094855 - Shih, Wen-Chang ; et al.	2004-05-20
Method of manufacturing polishing pad App 20040096529 - Shih, Wen-Chang ; et al.	2004-05-20
Method For Manufacturing Auxiliary Gas-adding Polyurethae/polyurethane-ure- A Polishing Pad App 20040021243 - Shih, Wen-Chang ; et al.	2004-02-05

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