WEI; Jia-Lin
Patent Applications and Registrations
Patent applications and USPTO patent grants for WEI; Jia-Lin.The latest application filed is for "photoresist layer surface treatment, cap layer, and method of forming photoresist pattern".
- WEI; Jia-Lin - Hsinchu TW
| Patent | Date |
|---|---|
| Method Of Manufacturing A Semiconductor Device App 20210302839 - LIU; Chih-Cheng ; et al. | 2021-09-30 |
| Method Of Manufacturing A Semiconductor Device App 20210302833 - WENG; Ming-Hui ; et al. | 2021-09-30 |
| Method Of Manufacturing A Semiconductor Device App 20210305047 - WEI; Jia-Lin ; et al. | 2021-09-30 |
| Photoresist Layer Surface Treatment, Cap Layer, And Method Of Forming Photoresist Pattern App 20210305040 - KUO; Yi-Chen ; et al. | 2021-09-30 |
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