| Patent | Date |
|---|
Air Spacers Around Contact Plugs and Method Forming Same
App 20220310820 - Huang; Chen-Huang ; et al. | 2022-09-29 |
Air Spacer and Method of Forming Same
App 20220285530 - Sie; Ming-Jhe ; et al. | 2022-09-08 |
FinFET device and method
Grant 11,437,498 - Wu , et al. September 6, 2 | 2022-09-06 |
Semiconductor Device and Method of Manufacture
App 20220262920 - Huang; Chen-Huang ; et al. | 2022-08-18 |
Nanostructure Field-Effect Transistor Device and Method of Forming
App 20220209023 - Chang; Cheng-Chung ; et al. | 2022-06-30 |
Air spacers around contact plugs and method forming same
Grant 11,355,616 - Huang , et al. June 7, 2 | 2022-06-07 |
Air spacer and method of forming same
Grant 11,349,014 - Sie , et al. May 31, 2 | 2022-05-31 |
Semiconductor device and method of manufacture
Grant 11,329,140 - Huang , et al. May 10, 2 | 2022-05-10 |
Nanostructure field-effect transistor device and method of forming
Grant 11,282,967 - Chang , et al. March 22, 2 | 2022-03-22 |
Air Spacer and Method of Forming Same
App 20210408266 - Sie; Ming-Jhe ; et al. | 2021-12-30 |
Fin Field-effect Transistor And Method Of Forming The Same
App 20210376114 - Hsiao; Hsu Ming ; et al. | 2021-12-02 |
Method For Forming Fin Field Effect Transistor (finfet) Device Structure
App 20210343711 - WU; Chung-Shu ; et al. | 2021-11-04 |
Semiconductor Device and Method of Manufacture
App 20210226033 - Huang; Chen-Huang ; et al. | 2021-07-22 |
Method for forming fin field effect transistor (FinFet) device structure
Grant 11,063,043 - Wu , et al. July 13, 2 | 2021-07-13 |
Nanostructure Field-effect Transistor Device And Method Of Forming
App 20210202756 - Chang; Cheng-Chung ; et al. | 2021-07-01 |
Air Spacers Around Contact Plugs and Method Forming Same
App 20210134973 - Huang; Chen-Huang ; et al. | 2021-05-06 |
Finfet Device And Method
App 20210111272 - Wu; Chung-Shu ; et al. | 2021-04-15 |
Method of forming semiconductor device and semiconductor device
Grant 10,879,074 - Jang , et al. December 29, 2 | 2020-12-29 |
FinFET device and method
Grant 10,861,960 - Wu , et al. December 8, 2 | 2020-12-08 |
Cut Metal Gate Processes
App 20200350172 - Jang; Shu-Uei ; et al. | 2020-11-05 |
Method Of Forming Semiconductor Device And Semiconductor Device
App 20200294804 - JANG; Shu-Uei ; et al. | 2020-09-17 |
Cut metal gate processes
Grant 10,714,347 - Jang , et al. | 2020-07-14 |
Method of forming semiconductor structure and semiconductor device
Grant 10,672,613 - Jang , et al. | 2020-06-02 |
Cut Metal Gate Processes
App 20200135472 - Jang; Shu-Uei ; et al. | 2020-04-30 |
Method For Forming Fin Field Effect Transistor (finfet) Device Structure
App 20200135725 - WU; Chung-Shu ; et al. | 2020-04-30 |
Fin field effect transistor (FinFET) device structure and method for forming the same
Grant 10,515,952 - Wu , et al. Dec | 2019-12-24 |
Method Of Forming Semiconductor Structure And Semiconductor Device
App 20190157090 - JANG; Shu-Uei ; et al. | 2019-05-23 |
Method for forming fin field effect transistor (FinFET) device structure
Grant 10,276,449 - Wu , et al. | 2019-04-30 |
Fin Field Effect Transistor (finfet) Device Structure And Method For Forming The Same
App 20190043857 - WU; Chung-Shu ; et al. | 2019-02-07 |
Composite hard mask etching profile for preventing pattern collapse in high-aspect-ratio trenches
Grant 9,449,821 - Yang , et al. September 20, 2 | 2016-09-20 |
High Aspect Ratio Structure
App 20160172294 - Chang; Sheng-Yuan ; et al. | 2016-06-16 |
Method of fabricating deep trench semiconductor devices, and deep trench semiconductor devices
Grant 9,349,746 - Yang , et al. May 24, 2 | 2016-05-24 |
Method of word-line formation by semi-damascene process with thin protective conductor layer
Grant 9,252,153 - Lung , et al. February 2, 2 | 2016-02-02 |
Method of Controlling Recess Depth and Bottom ECD in Over-Etching
App 20160020119 - Chang; Sheng-Yuan ; et al. | 2016-01-21 |
Composite Hard Mask Etching Profile for Preventing Pattern Collapse in High-Aspect-Ratio Trenches
App 20160020211 - Yang; Zusing ; et al. | 2016-01-21 |
Semiconductor Structure And Manufacturing Method Of The Same
App 20150194481 - Lai; Erh-Kun ; et al. | 2015-07-09 |
Method of forming self-aligned contacts and local interconnects
Grant 8,076,230 - Wei December 13, 2 | 2011-12-13 |
Process of forming a self-aligned contact in a semiconductor device
Grant 7,723,229 - Wei , et al. May 25, 2 | 2010-05-25 |
Method Of Forming Self-aligned Contacts And Local Interconnects
App 20090280633 - Wei; An Chyi | 2009-11-12 |
Method of forming self-aligned contacts and local interconnects
Grant 7,575,990 - Wei August 18, 2 | 2009-08-18 |
Plasma etching methods using nitrogen memory species for sustaining glow discharge
Grant 7,410,593 - Lee , et al. August 12, 2 | 2008-08-12 |
Method of performing a pressure calibration during waferless autoclean process
App 20070246063 - Wei; An Chyi ; et al. | 2007-10-25 |
Plasma etching methods using nitrogen memory species for sustaining glow discharge
App 20070193977 - Lee; Hong-Ji ; et al. | 2007-08-23 |
Method of forming self-aligned contacts and local interconnects
App 20070004187 - Wei; An Chyi | 2007-01-04 |
Process of forming a self-aligned contact in a semiconductor device
App 20060240654 - Wei; An Chyi ; et al. | 2006-10-26 |
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