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name:-0.025783061981201
name:-0.022125005722046
name:-0.013436079025269
Weeks; Keith Doran Patent Filings

Weeks; Keith Doran

Patent Applications and Registrations

Patent applications and USPTO patent grants for Weeks; Keith Doran.The latest application filed is for "semiconductor device including superlattice with oxygen and carbon monolayers".

Company Profile
10.19.20
  • Weeks; Keith Doran - Chandler AZ
  • Weeks; Keith Doran - Gilbert AZ
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for making superlattice structures with reduced defect densities
Grant 11,430,869 - Weeks , et al. August 30, 2
2022-08-30
Method for making semiconductor device including a superlattice with different non-semiconductor material monolayers
Grant 11,302,823 - Weeks , et al. April 12, 2
2022-04-12
Method For Making Semiconductor Device Including Superlattice With Oxygen And Carbon Monolayers
App 20220005927 - WEEKS; KEITH DORAN ;   et al.
2022-01-06
Method For Making A Semiconductor Device Using Superlattices With Different Non-semiconductor Thermal Stabilities
App 20220005706 - WEEKS; KEITH DORAN ;   et al.
2022-01-06
Semiconductor Device Including Superlattice With Oxygen And Carbon Monolayers
App 20220005926 - WEEKS; KEITH DORAN ;   et al.
2022-01-06
Semiconductor device including a superlattice with different non-semiconductor material monolayers
Grant 11,177,351 - Weeks , et al. November 16, 2
2021-11-16
Semiconductor Device Including A Superlattice With Different Non-semiconductor Material Monolayers
App 20210265465 - WEEKS; KEITH DORAN ;   et al.
2021-08-26
Method For Making Semiconductor Device Including A Superlattice With Different Non-semiconductor Material Monolayers
App 20210265509 - Weeks; Keith Doran ;   et al.
2021-08-26
Method for making a semiconductor device including a superlattice within a recessed etch
Grant 11,075,078 - Cody , et al. July 27, 2
2021-07-27
Method For Making Superlattice Structures With Reduced Defect Densities
App 20200411645 - WEEKS; KEITH DORAN ;   et al.
2020-12-31
Method for making superlattice structures with reduced defect densities
Grant 10,811,498 - Weeks , et al. October 20, 2
2020-10-20
Method for making a semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
Grant 10,727,049 - Weeks , et al.
2020-07-28
Method For Making A Semiconductor Device Including A Superlattice Having Nitrogen Diffused Therein
App 20200135489 - WEEKS; KEITH DORAN ;   et al.
2020-04-30
Semiconductor Device Including Superlattice Structures With Reduced Defect Densities
App 20200075327 - WEEKS; Keith Doran ;   et al.
2020-03-05
Method For Making Superlattice Structures With Reduced Defect Densities
App 20200075731 - WEEKS; KEITH DORAN ;   et al.
2020-03-05
Semiconductor device including superlattice structures with reduced defect densities
Grant 10,566,191 - Weeks , et al. Feb
2020-02-18
Semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
Grant 10,468,245 - Weeks , et al. No
2019-11-05
Semiconductor Device Including Compound Semiconductor Materials And An Impurity And Point Defect Blocking Superlattice
App 20190279868 - Weeks; Keith Doran ;   et al.
2019-09-12
Method For Making A Semiconductor Device Including Compound Semiconductor Materials And An Impurity And Point Defect Blocking Su
App 20190279869 - WEEKS; KEITH DORAN ;   et al.
2019-09-12
Method of making a semiconductor device with a buried insulating layer formed by annealing a superlattice
Grant 10,109,479 - Mears , et al. October 23, 2
2018-10-23
Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
Grant 9,490,325 - Weeks November 8, 2
2016-11-08
Structures And Devices Including A Tensile-stressed Silicon Arsenic Layer And Methods Of Forming Same
App 20160181368 - Weeks; Keith Doran
2016-06-23
Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
Grant 9,324,811 - Weeks April 26, 2
2016-04-26
Selective epitaxial formation of semiconductive films
Grant 9,312,131 - Bauer , et al. April 12, 2
2016-04-12
Doped semiconductor films and processing
Grant 9,099,423 - Weeks , et al. August 4, 2
2015-08-04
Doped Semiconductor Films And Processing
App 20150014816 - Weeks; Keith Doran ;   et al.
2015-01-15
Structures And Devices Including A Tensile-stressed Silicon Arsenic Layer And Methods Of Forming Same
App 20140084341 - Weeks; Keith Doran
2014-03-27
Selective epitaxial formation of semiconductor films
Grant 8,278,176 - Bauer , et al. October 2, 2
2012-10-02
Selective Epitaxial Formation Of Semiconductive Films
App 20120244688 - Bauer; Matthias ;   et al.
2012-09-27
Heteroepitaxial deposition over an oxidized surface
Grant 7,901,968 - Weeks , et al. March 8, 2
2011-03-08
Selective deposition of silicon-containing films
Grant 7,816,236 - Bauer , et al. October 19, 2
2010-10-19
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition
Grant 7,648,690 - Bauer , et al. January 19, 2
2010-01-19
Methods Of Making Substitutionally Carbon-doped Crystalline Si-containing Materials By Chemical Vapor Deposition
App 20090026496 - Bauer; Matthias ;   et al.
2009-01-29
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition
Grant 7,438,760 - Bauer , et al. October 21, 2
2008-10-21
Selective Epitaxial Formation Of Semiconductor Films
App 20070287272 - Bauer; Matthias ;   et al.
2007-12-13
Relaxed heteroepitaxial layers
App 20070224787 - Weeks; Keith Doran ;   et al.
2007-09-27
Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition
App 20060240630 - Bauer; Matthias ;   et al.
2006-10-26
Selective deposition of silicon-containing films
App 20060234504 - Bauer; Matthias ;   et al.
2006-10-19

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