Weber; Joern

Patent Applications and Registrations

Patent applications and USPTO patent grants for Weber; Joern.The latest application filed is for "optical element and optical assembly comprising same".

Company Profile

2.9.8

Weber; Joern - Aalen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus Grant 11,328,831 - Grasse , et al. May 10, 2	2022-05-10
Optical Element And Optical Assembly Comprising Same App 20190064405 - GRASSE; Christian ; et al.	2019-02-28
Method For Treating A Reflective Optical Element For The Euv Wavelength Range, Method For Producing Same, And Treating Apparatus App 20190035512 - Grasse; Christian ; et al.	2019-01-31
Reflective optical element Grant 10,061,205 - Ehm , et al. August 28, 2	2018-08-28
Reflective optical element, and optical system of a microlithographic projection exposure apparatus Grant 9,915,873 - Enkisch , et al. March 13, 2	2018-03-13
Reflective Optical Element App 20170160639 - EHM; Dirk Heinrich ; et al.	2017-06-08
Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective Grant 9,494,718 - Muellender , et al. November 15, 2	2016-11-15
Reflective Optical Element, And Optical System Of A Microlithographic Projection Exposure Apparatus App 20160266499 - ENKISCH; Hartmut ; et al.	2016-09-15
Reflective optical element for EUV lithography Grant 8,937,709 - Weber January 20, 2	2015-01-20
Reflective optical element for EUV lithography Grant 8,928,972 - Weber January 6, 2	2015-01-06
Mirror For The Euv Wavelength Range, Substrate For Such A Mirror, Projection Objective For Microlithography Comprising Such A Mirror Or Such A Substrate, And Projection Exposure Apparatus For Microlithography Comprising Such A Projection Objective App 20130038929 - MUELLENDER; Stephan ; et al.	2013-02-14
Reflective Optical Element For Euv Lithography App 20120019797 - WEBER; Joern	2012-01-26
Reflective Optical Element For Euv Lithography App 20120013976 - WEBER; Joern	2012-01-19

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