Watarai; Toshiharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Watarai; Toshiharu.The latest application filed is for "exhaust component cleaning method and substrate processing apparatus including exhaust component".

Company Profile

6.8.7

Watarai; Toshiharu - Tokyo JP
Watarai; Toshiharu - Chofu JP
Watarai; Toshiharu - Fuchu JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exhaust Component Cleaning Method And Substrate Processing Apparatus Including Exhaust Component App 20210071296 - Watarai; Toshiharu ; et al.	2021-03-11
Reaction chamber passivation and selective deposition of metallic films Grant 10,793,946 - Longrie , et al. October 6, 2	2020-10-06
Reaction Chamber Passivation And Selective Deposition Of Metallic Films App 20200291511 - Longrie; Delphine ; et al.	2020-09-17
Reaction chamber passivation and selective deposition of metallic films Grant 10,480,064 - Longrie , et al. Nov	2019-11-19
Method for forming spacers using silicon nitride film for spacer-defined multiple patterning Grant 10,468,251 - Ishikawa , et al. No	2019-11-05
Susceptor Grant D864,134 - Watarai , et al. Oc	2019-10-22
Reaction Chamber Passivation And Selective Deposition Of Metallic Films App 20190055643 - Longrie; Delphine ; et al.	2019-02-21
Reaction chamber passivation and selective deposition of metallic films Grant 10,041,166 - Longrie , et al. August 7, 2	2018-08-07
Selective deposition of metallic films Grant 10,014,212 - Chen , et al. July 3, 2	2018-07-03
Reaction Chamber Passivation And Selective Deposition Of Metallic Films App 20180080121 - Longrie; Delphine ; et al.	2018-03-22
Selective Deposition Of Metallic Films App 20170358482 - Chen; Shang ; et al.	2017-12-14
Method For Forming Spacers Using Silicon Nitride Film For Spacer-defined Multiple Patterning App 20170316940 - Ishikawa; Dai ; et al.	2017-11-02
Selective deposition of metallic films Grant 9,805,974 - Chen , et al. October 31, 2	2017-10-31
Reaction chamber passivation and selective deposition of metallic films Grant 9,803,277 - Longrie , et al. October 31, 2	2017-10-31
Measurement Device And Measurement Method App 20140336990 - Iwai; Toshiaki ; et al.	2014-11-13

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