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Patent applications and USPTO patent grants for Watanabe; Iwao.The latest application filed is for "multiply divided anode wall type plasma generating apparatus and plasma processing apparatus".
Patent | Date |
---|---|
Divided annular rib type plasma processing apparatus Grant 8,833,299 - Shiina , et al. September 16, 2 | 2014-09-16 |
Composition of conductive rubber Grant 8,221,653 - Aoyama , et al. July 17, 2 | 2012-07-17 |
Multiply Divided Anode Wall Type Plasma Generating Apparatus and Plasma Processing Apparatus App 20120037504 - Shiina; Yuichi ;   et al. | 2012-02-16 |
Divided Annular Rib Type Plasma Processing Apparatus App 20120031337 - Shiina; Yuichi ;   et al. | 2012-02-09 |
Composition Of Conductive Rubber App 20110049436 - AOYAMA; Takashi ;   et al. | 2011-03-03 |
Optical connector cleaning device Grant 7,216,393 - Sato , et al. May 15, 2 | 2007-05-15 |
Optical connector cleaning device App 20030126707 - Sato, Daisuke ;   et al. | 2003-07-10 |
Identification plate attachment structure Grant 5,802,754 - Watanabe September 8, 1 | 1998-09-08 |
Microwave ion source Grant 4,857,809 - Torii , et al. August 15, 1 | 1989-08-15 |
Free-access floor Grant 4,850,163 - Kobayashi , et al. July 25, 1 | 1989-07-25 |
Fluid exhausting device Grant 4,111,615 - Watanabe September 5, 1 | 1978-09-05 |
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