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Watanabe; Iwao Patent Filings

Watanabe; Iwao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Watanabe; Iwao.The latest application filed is for "multiply divided anode wall type plasma generating apparatus and plasma processing apparatus".

Company Profile
0.8.4
  • Watanabe; Iwao - Tokyo JP
  • Watanabe; Iwao - Takahagi JP
  • Watanabe; Iwao - Kodaira JP
  • Watanabe; Iwao - Atsugi JP
  • Watanabe; Iwao - Kanagawa JP
  • Watanabe; Iwao - Okayama JP
  • Watanabe; Iwao - Kadoma JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Divided annular rib type plasma processing apparatus
Grant 8,833,299 - Shiina , et al. September 16, 2
2014-09-16
Composition of conductive rubber
Grant 8,221,653 - Aoyama , et al. July 17, 2
2012-07-17
Multiply Divided Anode Wall Type Plasma Generating Apparatus and Plasma Processing Apparatus
App 20120037504 - Shiina; Yuichi ;   et al.
2012-02-16
Divided Annular Rib Type Plasma Processing Apparatus
App 20120031337 - Shiina; Yuichi ;   et al.
2012-02-09
Composition Of Conductive Rubber
App 20110049436 - AOYAMA; Takashi ;   et al.
2011-03-03
Optical connector cleaning device
Grant 7,216,393 - Sato , et al. May 15, 2
2007-05-15
Optical connector cleaning device
App 20030126707 - Sato, Daisuke ;   et al.
2003-07-10
Identification plate attachment structure
Grant 5,802,754 - Watanabe September 8, 1
1998-09-08
Microwave ion source
Grant 4,857,809 - Torii , et al. August 15, 1
1989-08-15
Free-access floor
Grant 4,850,163 - Kobayashi , et al. July 25, 1
1989-07-25
Fluid exhausting device
Grant 4,111,615 - Watanabe September 5, 1
1978-09-05

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