Wang; Yuxiang May

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Yuxiang May.The latest application filed is for "etch pattern definition using a cvd organic layer as an anti-reflection coating and hardmask".

Company Profile

0.8.10

Wang; Yuxiang May - Palo Alto CA
Wang; Yuxiang May - Sunnyvale CA
Wang; Yuxiang May - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of depositing an amorphous carbon film for etch hardmask application Grant 7,638,440 - Wang , et al. December 29, 2	2009-12-29
Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask App 20080197109 - Mui; David S. ; et al.	2008-08-21
Liquid precursors for the CVD deposition of amorphous carbon films Grant 7,407,893 - Seamons , et al. August 5, 2	2008-08-05
Method of depositing an amorphous carbon layer Grant 7,335,462 - Fairbairn , et al. February 26, 2	2008-02-26
Method Of Depositing An Amorphous Carbon Layer App 20070128538 - FAIRBAIRN; KEVIN ; et al.	2007-06-07
Method of depositing an amorphous carbon layer Grant 7,223,526 - Fairbairn , et al. May 29, 2	2007-05-29
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 7,105,460 - Kim , et al. September 12, 2	2006-09-12
Liquid precursors for the CVD deposition of amorphous carbon films App 20050287771 - Seamons, Martin Jay ; et al.	2005-12-29
Method of depositing an amorphous carbon film for metal etch hardmask application App 20050199585 - Wang, Yuxiang May ; et al.	2005-09-15
Method of depositing an amorphous carbon film for etch hardmask application App 20050202683 - Wang, Yuxiang May ; et al.	2005-09-15
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 6,927,178 - Kim , et al. August 9, 2	2005-08-09
Method of depositing an amrphous carbon layer App 20050112509 - Fairbairn, Kevin ; et al.	2005-05-26
Method of depositing an amorphous carbon layer Grant 6,841,341 - Fairbairn , et al. January 11, 2	2005-01-11
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040214446 - Kim, Bok Hoen ; et al.	2004-10-28
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040009676 - Kim, Bok Hoen ; et al.	2004-01-15
Method for depositing an amorphous carbon layer Grant 6,573,030 - Fairbairn , et al. June 3, 2	2003-06-03
Method of depositing an amorphous carbon layer App 20030091938 - Fairbairn, Kevin ; et al.	2003-05-15
Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask App 20020086547 - Mui, David S. ; et al.	2002-07-04

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