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name:-0.014868021011353
name:-0.0089237689971924
name:-0.013909101486206
Wang; Yuhou Patent Filings

Wang; Yuhou

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Yuhou.The latest application filed is for "rf pulsing within pulsing for semiconductor rf plasma processing".

Company Profile
14.8.14
  • Wang; Yuhou - Fremont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Frequency tuning for a matchless plasma source
Grant 11,437,219 - Long , et al. September 6, 2
2022-09-06
Rf Pulsing Within Pulsing For Semiconductor Rf Plasma Processing
App 20220254608 - Long; Maolin ;   et al.
2022-08-11
Dual-frequency, Direct-drive Inductively Coupled Plasma Source
App 20220199365 - Long; Maolin ;   et al.
2022-06-23
RF pulsing within pulsing for semiconductor RF plasma processing
Grant 11,342,159 - Long , et al. May 24, 2
2022-05-24
Substrate Location Detection And Adjustment
App 20220126454 - Martin; Michael John ;   et al.
2022-04-28
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20220117074 - Long; Maolin ;   et al.
2022-04-14
Matchless plasma source for semiconductor wafer fabrication
Grant 11,224,116 - Long , et al. January 11, 2
2022-01-11
Direct Frequency Tuning For Matchless Plasma Source In Substrate Processing Systems
App 20210210314 - WANG; Yuhou ;   et al.
2021-07-08
Image based plasma sheath profile detection on plasma processing tools
Grant 10,957,521 - Wang , et al. March 23, 2
2021-03-23
Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
Grant 10,879,044 - Wang , et al. December 29, 2
2020-12-29
Rf Pulsing Within Pulsing For Semiconductor Rf Plasma Processing
App 20200335305 - Long; Maolin ;   et al.
2020-10-22
Frequency Tuning for a Matchless Plasma Source
App 20200286713 - Long; Maolin ;   et al.
2020-09-10
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20200253034 - Kind Code
2020-08-06
Frequency tuning for a matchless plasma source
Grant 10,672,590 - Long , et al.
2020-06-02
Matchless plasma source for semiconductor wafer fabrication
Grant 10,638,593 - Long , et al.
2020-04-28
Image Based Plasma Sheath Profile Detection On Plasma Processing Tools
App 20190371581 - Wang; Yuhou ;   et al.
2019-12-05
Frequency Tuning for a Matchless Plasma Source
App 20190287764 - Long; Maolin ;   et al.
2019-09-19
Matchless Plasma Source For Semiconductor Wafer Fabrication
App 20190215942 - Long; Maolin ;   et al.
2019-07-11
Matchless Plasma Source for Semiconductor Wafer Fabrication
App 20190116656 - Long; Maolin ;   et al.
2019-04-18
Matchless plasma source for semiconductor wafer fabrication
Grant 10,264,663 - Long , et al.
2019-04-16
Auxiliary Circuit In Rf Matching Network For Frequency Tuning Assisted Dual-level Pulsing
App 20180294566 - Wang; Yuhou ;   et al.
2018-10-11
Detection System for Tunable/Replaceable Edge Coupling Ring
App 20170263478 - McCHESNEY; Jon ;   et al.
2017-09-14

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