Wang; Youn-Kyung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Youn-Kyung.The latest application filed is for "siloxane polymer composition".

Company Profile

0.8.9

Wang; Youn-Kyung - Seongnam-si N/A KR
Wang; Youn-Kyung - Gyeonggi-do KR
Wang; Youn-Kyung - Yongin-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Siloxane polymer composition Grant 8,450,444 - Kim , et al. May 28, 2	2013-05-28
Method of forming fine pattern employing self-aligned double patterning Grant 8,071,484 - Kim , et al. December 6, 2	2011-12-06
Siloxane Polymer Composition App 20100305266 - KIM; Kyoung-Mi ; et al.	2010-12-02
Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same Grant 7,776,730 - Kim , et al. August 17, 2	2010-08-17
Method and apparatus for analyzing a photoresist film Grant 7,629,583 - Kim , et al. December 8, 2	2009-12-08
Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same App 20090017592 - Kim; Kyoung-Mi ; et al.	2009-01-15
Method Of Forming Fine Pattern Employing Self-aligned Double Patterning App 20080305636 - KIM; Kyoung-Mi ; et al.	2008-12-11
Photoresist composition and method of forming a pattern using the same Grant 7,419,759 - Kim , et al. September 2, 2	2008-09-02
Method And Apparatus For Analyzing A Photoresist Film App 20080117408 - Kim; Young-Hoon ; et al.	2008-05-22
Photoresist composition and method of forming a pattern using same Grant 7,282,319 - Kim , et al. October 16, 2	2007-10-16
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition Grant 7,258,963 - Wang , et al. August 21, 2	2007-08-21
Photoresist composition and method of forming a pattern using the same App 20060166134 - Kim; Kyoung-Mi ; et al.	2006-07-27
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition App 20060160019 - Wang; Youn-Kyung ; et al.	2006-07-20
Photoresist composition and method of forming a pattern using the same App 20050277056 - Kim, Kyoung-Mi ; et al.	2005-12-15
Photoresist composition and method of forming a pattern using same App 20050266342 - Kim, Kyoung-Mi ; et al.	2005-12-01
Photoresist composition and method of forming same App 20050266343 - Kim, Kyoung-Mi ; et al.	2005-12-01

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