Wang; Tzu Yi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Wang; Tzu Yi.The latest application filed is for "reticle container".
- Wang; Tzu Yi - New Taipei TW
- WANG; Tzu Yi - Hsinchu City TW
- WANG; Tzu-Yi - Hsinchu TW
| Patent | Date |
|---|---|
| Headphone with pressure sensor Grant 11,388,504 - Lo , et al. July 12, 2 | 2022-07-12 |
| Reticle Container App 20220155676 - HSU; Pei-Cheng ; et al. | 2022-05-19 |
| Absorber Materials For Extreme Ultraviolet Mask App 20220121101 - TANADY; Kevin ; et al. | 2022-04-21 |
| Method Of Manufacturing Euv Photo Masks App 20220057706 - LEE; Hsin-Chang ; et al. | 2022-02-24 |
| Mask for EUV lithography and method of manufacturing the same Grant 11,249,384 - Hsu , et al. February 15, 2 | 2022-02-15 |
| Reticle container Grant 11,237,477 - Hsu , et al. February 1, 2 | 2022-02-01 |
| Extreme Ultraviolet Mask And Method Of Manufacturing The Same App 20210333717 - HSIEH; Wei-Che ; et al. | 2021-10-28 |
| Method for Extreme Ultraviolet Lithography Mask Treatment App 20210311383 - Hsu; Pei-Cheng ; et al. | 2021-10-07 |
| EUV photo masks Grant 11,119,398 - Lee , et al. September 14, 2 | 2021-09-14 |
| Method of manufacturing EUV photo masks Grant 11,106,126 - Lee , et al. August 31, 2 | 2021-08-31 |
| Method for extreme ultraviolet lithography mask treatment Grant 11,048,158 - Hsu , et al. June 29, 2 | 2021-06-29 |
| Method Of Manufacturing Euv Photo Masks App 20200103742 - LEE; Hsin-Chang ; et al. | 2020-04-02 |
| Euv Photo Masks App 20200103743 - LEE; Hsin-Chang ; et al. | 2020-04-02 |
| Mask For Euv Lithography And Method Of Manufacturing The Same App 20200004133 - HSU; Pei-Cheng ; et al. | 2020-01-02 |
| Method for Extreme Ultraviolet Lithography Mask Treatment App 20190324364 - Hsu; Pei-Cheng ; et al. | 2019-10-24 |
| Reticle Container App 20190101821 - HSU; Pei-Cheng ; et al. | 2019-04-04 |
| Compensation of reticle flatness on focus deviation in optical lithography Grant 7,924,405 - Yeh , et al. April 12, 2 | 2011-04-12 |
| Compensation Of Reticle Flatness On Focus Deviation In Optical Lithography App 20090027643 - Yeh; Lee-Chih ; et al. | 2009-01-29 |
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