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Patent applications and USPTO patent grants for Wang; Shyan-Yhu.The latest application filed is for "semiconductor device".
Patent | Date |
---|---|
Semiconductor device Grant 7,759,734 - Liu , et al. July 20, 2 | 2010-07-20 |
Semiconductor device Grant 7,741,659 - Yang , et al. June 22, 2 | 2010-06-22 |
Semiconductor Device App 20090224336 - Liu; Yuh-Turng ;   et al. | 2009-09-10 |
Method for manufacturing gate oxide layer with different thicknesses Grant 7,528,076 - Chan , et al. May 5, 2 | 2009-05-05 |
Semiconductor Device App 20090108348 - Yang; Ching-Ho ;   et al. | 2009-04-30 |
Method For Manufacturing Gate Oxide Layer With Different Thicknesses App 20080280448 - Chan; Shu-Chun ;   et al. | 2008-11-13 |
Interconnect structure and method of manufacturing the same App 20070063349 - Kao; Tsui-Lien ;   et al. | 2007-03-22 |
Method for forming via holes by using retardation layers to reduce overetching App 20020009877 - Wang, Shyan-Yhu ;   et al. | 2002-01-24 |
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