Wang; Shiang-Bau

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Shiang-Bau.The latest application filed is for "air spacer and method of forming same".

Company Profile

23.75.76

Wang; Shiang-Bau - Pingzchen City TW
WANG; SHIANG-BAU - TAOYUAN COUNTY TW
Wang; Shiang-Bau - Pingzchen TW
WANG; Shiang-Bau - Hsinchu TW
Wang; Shiang-Bau - Taoyuan N/A TW
WANG; Shiang-Bau - Taoyuan City TW
WANG; Shiang-Bau - Dayuan Shiang TW
Wang; Shiang-Bau - Madison WI

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Air Spacer and Method of Forming Same App 20220285530 - Sie; Ming-Jhe ; et al.	2022-09-08
Semiconductor Device and Method of Manufacture App 20220262920 - Huang; Chen-Huang ; et al.	2022-08-18
Semiconductor Structure And Manufacturing Method Thereof App 20220208993 - WANG; SHIANG-BAU	2022-06-30
Air spacer and method of forming same Grant 11,349,014 - Sie , et al. May 31, 2	2022-05-31
Semiconductor device and method of manufacture Grant 11,329,140 - Huang , et al. May 10, 2	2022-05-10
Semiconductor structure and manufacturing method thereof Grant 11,282,941 - Wang March 22, 2	2022-03-22
Cut-Fin Isolation Regions and Method Forming Same App 20220059685 - Wang; Shiang-Bau ; et al.	2022-02-24
Air Spacer and Method of Forming Same App 20210408266 - Sie; Ming-Jhe ; et al.	2021-12-30
Semiconductor Device And Method App 20210351084 - Wang; Shiang-Bau ; et al.	2021-11-11
Cut-fin isolation regions and method forming same Grant 11,171,236 - Wang , et al. November 9, 2	2021-11-09
Semiconductor Wafer Measurement Method And System App 20210342994 - CHEN; Peng-Ren ; et al.	2021-11-04
Partial Directional Etch Method and Resulting Structures App 20210265487 - Wang; Shiang-Bau	2021-08-26
Semiconductor wafer measurement method and system Grant 11,094,057 - Chen , et al. August 17, 2	2021-08-17
Metal Gate Structure Cutting Process App 20210242192 - Wang; Shiang-Bau ; et al.	2021-08-05
Semiconductor Device and Method of Manufacture App 20210226033 - Huang; Chen-Huang ; et al.	2021-07-22
Semiconductor device and method Grant 11,069,579 - Wang , et al. July 20, 2	2021-07-20
Metal gate structure cutting process Grant 11,056,478 - Wang , et al. July 6, 2	2021-07-06
Method of Manufacturing a Semiconductor Device App 20210090958 - Jang; Shu-Uei ; et al.	2021-03-25
Semiconductor Device and Method App 20210074579 - Wang; Shiang-Bau ; et al.	2021-03-11
Highly strained source/drain trenches in semiconductor devices Grant 10,868,166 - Kao , et al. December 15, 2	2020-12-15
Method of manufacturing a semiconductor device Grant 10,861,746 - Jang , et al. December 8, 2	2020-12-08
Lithography mask and method Grant 10,859,902 - Wang , et al. December 8, 2	2020-12-08
Semiconductor device and method Grant 10,847,409 - Wang , et al. November 24, 2	2020-11-24
Semiconductor Wafer Measurement Method And System App 20200364844 - CHEN; Peng-Ren ; et al.	2020-11-19
Semiconductor Structure With Patterned Fin Structure App 20200335323 - WANG; Shiang-Bau	2020-10-22
Semiconductor wafer measurement method and system Grant 10,762,621 - Chen , et al. Sep	2020-09-01
Semiconductor structure with etched fin structure Grant 10,707,072 - Wang	2020-07-07
Semiconductor Device and Method of Manufacture App 20200176318 - Jang; Shu-Uei ; et al.	2020-06-04
Semiconductor Device and Method App 20200126868 - Wang; Shiang-Bau ; et al.	2020-04-23
Fin Field Effect Transistor (finfet) Device With Protection Layer App 20200119005 - WANG; Shiang-Bau	2020-04-16
Semiconductor Device and Method App 20200105583 - Wang; Shiang-Bau ; et al.	2020-04-02
Cut-Fin Isolation Regions and Method Forming Same App 20200044070 - Wang; Shiang-Bau ; et al.	2020-02-06
Lithography Mask and Method App 20200004134 - Wang; Shiang-Bau ; et al.	2020-01-02
Fin field effect transistor (FinFET) device with protection layer Grant 10,504,893 - Wang Dec	2019-12-10
Lithography mask and method Grant 10,481,483 - Wang , et al. Nov	2019-11-19
Semiconductor Structure And Manufacturing Method Thereof App 20190341470 - WANG; SHIANG-BAU	2019-11-07
Semiconductor Wafer Measurement Method And System App 20190259140 - CHEN; Peng-Ren ; et al.	2019-08-22
Semiconductor structure and manufacturing method thereof Grant 10,355,131 - Wang July 16, 2	2019-07-16
Method and system for diagnosing a semiconductor wafer Grant 10,304,178 - Chen , et al.	2019-05-28
Semiconductor Structure With Etched Fin Structure App 20190131122 - WANG; Shiang-Bau	2019-05-02
Metal gate structure cutting process Grant 10,269,787 - Wang , et al.	2019-04-23
Metal Gate Structure Cutting Process App 20190109126 - Wang; Shiang-Bau ; et al.	2019-04-11
Metal Gate Structure Cutting Process App 20190006345 - WANG; SHIANG-BAU ; et al.	2019-01-03
Lithography Mask and Method App 20190004416 - Wang; Shiang-Bau ; et al.	2019-01-03
Semiconductor structure with etched fin structure Grant 10,163,624 - Wang Dec	2018-12-25
Semiconductor structure having low-k spacer and method of manufacturing the same Grant 10,020,198 - Wang , et al. July 10, 2	2018-07-10
Semiconductor Structure Having Low-k Spacer And Method Of Manufacturing The Same App 20180174846 - WANG; Shiang-Bau ; et al.	2018-06-21
Semiconductor structure and method Grant 9,945,048 - Syue , et al. April 17, 2	2018-04-17
Semiconductor Structure And Manufacturing Method Thereof App 20170338341 - WANG; SHIANG-BAU	2017-11-23
Intelligent metrology based on module knowledge Grant 9,824,940 - Wang , et al. November 21, 2	2017-11-21
Semiconductor Structure With Etched Fin Structure App 20170256390 - WANG; Shiang-Bau	2017-09-07
Dimension measurement apparatus calibration standard and method for forming the same Grant 9,691,587 - Wang June 27, 2	2017-06-27
Method for forming semiconductor structure with etched fin structure Grant 9,659,766 - Wang May 23, 2	2017-05-23
Method of forming metal gate to mitigate antenna defect Grant 9,613,959 - Wang April 4, 2	2017-04-04
Intelligent Metrology Based On Module Knowledge App 20170092548 - Wang; Shiang-Bau ; et al.	2017-03-30
Method And System For Diagnosing A Semiconductor Wafer App 20170084016 - CHEN; Peng-Ren ; et al.	2017-03-23
Method Of Forming Metal Gate To Mitigate Antenna Defect App 20170033105 - Wang; Shiang-Bau	2017-02-02
Integrated circuit having a contact etch stop layer Grant 9,508,814 - Wang November 29, 2	2016-11-29
Semiconductor Structure With Etched Fin Structure And Method For Forming The Same App 20160181360 - WANG; Shiang-Bau	2016-06-23
Fin Field Effect Transistor (finfet) Device With Protection Layer App 20160064377 - WANG; Shiang-Bau	2016-03-03
Dimension Measurement Apparatus Calibration Standard And Method For Forming The Same App 20150380209 - WANG; Shiang-Bau	2015-12-31
Sidewall free CESL for enlarging ILD gap-fill window Grant 9,218,974 - Chung , et al. December 22, 2	2015-12-22
Integrated Circuit Having A Contact Etch Stop Layer App 20150364559 - WANG; Shiang-Bau	2015-12-17
Integrated circuit having a contact etch stop layer and method of forming the same Grant 9,142,462 - Wang September 22, 2	2015-09-22
Hard mask removal method Grant 9,099,299 - Wang August 4, 2	2015-08-04
Sidewall-free CESL for enlarging ILD gap-fill window Grant 8,999,834 - Chung , et al. April 7, 2	2015-04-07
Wafer alignment system and method Grant 8,932,945 - Syue , et al. January 13, 2	2015-01-13
Method of dual epi process for semiconductor device Grant 8,900,957 - Chung , et al. December 2, 2	2014-12-02
Method of dual EPI process for semiconductor device Grant 8,900,956 - Chung , et al. December 2, 2	2014-12-02
Isolation structure profile for gap filing Grant 8,853,817 - Wang October 7, 2	2014-10-07
Isolation structure profile for gap filing Grant 8,822,304 - Wang September 2, 2	2014-09-02
End-to-end gap fill using dielectric film Grant 8,759,919 - Wang June 24, 2	2014-06-24
Sidewall-free Cesl For Enlarging Ild Gap-fill Window App 20140170846 - Chung; Han-Pin ; et al.	2014-06-19
Method Of Dual Epi Process For Semiconductor Device App 20140073096 - Chung; Han-Pin ; et al.	2014-03-13
Method Of Dual Epi Process For Semicondcutor Device App 20140073097 - Chung; Han-Pin ; et al.	2014-03-13
Isolation Structure Profile for Gap Filing App 20140054744 - Wang; Shiang-Bau	2014-02-27
Isolation Structure Profile for Gap Filing App 20140057409 - Wang; Shiang-Bau	2014-02-27
Wafer Alignment System and Method App 20140011348 - Syue; Sen-Hong ; et al.	2014-01-09
Semiconductor Structure and Method App 20130337631 - Syue; Sen-Hong ; et al.	2013-12-19
Method of dual EPI process for semiconductor device Grant 8,609,497 - Chung , et al. December 17, 2	2013-12-17
Post CMP planarization by cluster ion beam etch Grant 8,604,562 - Wang December 10, 2	2013-12-10
Isolation structure profile for gap filling Grant 8,598,675 - Wang December 3, 2	2013-12-03
Epitaxial process for forming semiconductor devices Grant 8,598,661 - Wang December 3, 2	2013-12-03
Method of fabricating gate electrode using a treated hard mask Grant 8,569,185 - Yeh , et al. October 29, 2	2013-10-29
Sidewall-Free CESL for Enlarging ILD Gap-Fill Window App 20130270651 - Chung; Han-Pin ; et al.	2013-10-17
Process for forming a metal oxide semiconductor devices Grant 8,518,786 - Wang August 27, 2	2013-08-27
End-to-end Gap Fill Using Dielectric Film App 20130193519 - Wang; Shiang-Bau	2013-08-01
STI structure and method of forming bottom void in same Grant 8,461,015 - Huang , et al. June 11, 2	2013-06-11
Epitaxial Process For Forming Semiconductor Devices App 20130130461 - WANG; Shiang-Bau	2013-05-23
Epitaxial Process For Forming Semiconductor Devices App 20130126982 - WANG; Shiang-Bau	2013-05-23
Novel Hard Mask Removal Method App 20130122699 - WANG; Shiang-Bau	2013-05-16
End-to-end gap fill using dielectric film Grant 8,404,534 - Wang March 26, 2	2013-03-26
Method of fabricating integrated circuit device, including removing at least a portion of a spacer Grant 8,389,371 - Wang March 5, 2	2013-03-05
Epitaxial process for forming semiconductor devices Grant 8,383,485 - Wang February 26, 2	2013-02-26
Multilayer hard mask Grant 8,372,755 - Wang , et al. February 12, 2	2013-02-12
Hard mask removal method Grant 8,361,338 - Wang January 29, 2	2013-01-29
Epitaxial Process For Forming Semiconductor Devices App 20130015533 - WANG; Shiang-Bau	2013-01-17
Post Cmp Planarization By Cluster Ion Beam Etch App 20120217587 - WANG; Shiang-Bau	2012-08-30
Isolation Structure Profile For Gap Filling App 20120205774 - Wang; Shiang-Bau	2012-08-16
End-to-end Gap Fill Using Dielectric Film App 20120205746 - Wang; Shiang-Bau	2012-08-16
Post CMP planarization by cluster ION beam etch Grant 8,193,094 - Wang June 5, 2	2012-06-05
Integrated Circuit Having A Contact Etch Stop Layer And Method Of Forming The Same App 20120098070 - WANG; Shiang-Bau	2012-04-26
Highly Strained Source/drain Trenches In Semiconductor Devices App 20120018786 - KAO; Ta-Wei ; et al.	2012-01-26
Method of fabricating gate electrode using a hard mask with spacers Grant 8,093,146 - Wang January 10, 2	2012-01-10
Method Of Fabricating An Integrated Circuit Device App 20120003806 - WANG; Shiang-Bau	2012-01-05
Post Cmp Planarization By Cluster Ion Beam Etch App 20110312180 - WANG; Shiang-Bau	2011-12-22
Method for forming highly strained source/drain trenches Grant 8,071,481 - Kao , et al. December 6, 2	2011-12-06
Method Of Fabricating Gate Electrode Using A Hard Mask With Spacers App 20110230029 - WANG; Shiang-Bau	2011-09-22
Method of Dual EPI Process For Semiconductor Device App 20110201164 - Chung; Han-Pin ; et al.	2011-08-18
Novel Hard Mask Removal Method App 20110195575 - WANG; Shiang-Bau	2011-08-11
Method Of Fabricating Gate Electrode Using A Treated Hard Mask App 20110195548 - Yeh; Matt ; et al.	2011-08-11
Multilayer Hard Mask App 20110171804 - Wang; Shiang-Bau ; et al.	2011-07-14
Method of forming a shallow trench isolation structure Grant 7,947,551 - Syue , et al. May 24, 2	2011-05-24
Double Patterning Strategy For Forming Fine Patterns In Photolithography App 20110059407 - LIN; Li-Te S. ; et al.	2011-03-10
Sti Structure And Method Of Forming Bottom Void In Same App 20110006390 - HUANG; Yu-Lien ; et al.	2011-01-13
Sidewall-Free CESL for Enlarging ILD Gap-Fill Window App 20100314690 - Chung; Han-Pin ; et al.	2010-12-16
Method For Forming Highly Strained Source/drain Trenches App 20100270598 - KAO; Ta-Wei ; et al.	2010-10-28
MOS devices with continuous contact etch stop layer Grant 7,732,878 - Yao , et al. June 8, 2	2010-06-08
MOS devices with continuous contact etch stop layer App 20080093675 - Yao; Liang-Gi ; et al.	2008-04-24
In-situ critical dimension measurement Grant 7,301,645 - Wang , et al. November 27, 2	2007-11-27
Etching process to avoid polysilicon notching Grant 7,109,085 - Wang , et al. September 19, 2	2006-09-19
Etching Process To Avoid Polysilicon Notching App 20060154487 - Wang; Shiang-Bau ; et al.	2006-07-13
In-situ critical dimension measrument App 20060046323 - Wang; Shiang-Bau ; et al.	2006-03-02
Gas distribution plate electrode for a plasma receptor Grant 6,677,712 - Katz , et al. January 13, 2	2004-01-13
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase Grant 6,667,577 - Shannon , et al. December 23, 2	2003-12-23
Inductive antenna for a plasma reactor producing reduced fluorine dissociation Grant 6,652,712 - Wang , et al. November 25, 2	2003-11-25
Gas Distribution Plate Electrode For A Plasma Reactor App 20030201723 - Katz, Dan ; et al.	2003-10-30
Gas distribution plate electrode for a plasma reactor Grant 6,586,886 - Katz , et al. July 1, 2	2003-07-01
Gas Distribution Plate Electrode For A Plasma Reactor App 20030111961 - Katz, Dan ; et al.	2003-06-19
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase App 20030111962 - Shannon, Steven ; et al.	2003-06-19
Inductive antenna for a plasma reactor producing reduced fluorine dissociation App 20030111181 - Wang, Shiang-Bau ; et al.	2003-06-19
Method and apparatus for plasma processing with control of ion energy distribution at the substrates Grant 6,201,208 - Wendt , et al. March 13, 2	2001-03-13