| Patent | Date |
|---|
Corner spoiler for improving profile uniformity
Grant 10,697,063 - Zhao , et al. | 2020-06-30 |
Flip edge shadow frame
Grant 10,676,817 - Wang , et al. | 2020-06-09 |
Plasma uniformity control by gas diffuser hole design
Grant 10,312,058 - Choi , et al. | 2019-06-04 |
Plasma uniformity control by gas diffuser hole design
Grant 10,262,837 - Choi , et al. | 2019-04-16 |
Showerhead support structure for improved gas flow
Grant 10,087,524 - Tiner , et al. October 2, 2 | 2018-10-02 |
Plasma Uniformity Control By Gas Diffuser Hole Design
App 20180025890 - CHOI; Soo Young ; et al. | 2018-01-25 |
Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixture
Grant 9,818,606 - Wang , et al. November 14, 2 | 2017-11-14 |
Run-to-run stability of film deposition
Grant 9,299,558 - Zhao , et al. March 29, 2 | 2016-03-29 |
Methods for depositing a silicon containing layer with argon gas dilution
Grant 9,287,137 - Wang , et al. March 15, 2 | 2016-03-15 |
Plasma Uniformity Control By Gas Diffuser Hole Design
App 20160056019 - CHOI; Soo Young ; et al. | 2016-02-25 |
Plasma uniformity control by gas diffuser hole design
Grant 9,200,368 - Choi , et al. December 1, 2 | 2015-12-01 |
Run-to-run Stability Of Film Deposition
App 20150270107 - ZHAO; Lai ; et al. | 2015-09-24 |
Corner Spoiler For Improving Profile Uniformity
App 20150211120 - ZHAO; Lai ; et al. | 2015-07-30 |
Gas Confiner Assembly For Eliminating Shadow Frame
App 20150211121 - ZHAO; Lai ; et al. | 2015-07-30 |
Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser anneal
Grant 9,048,099 - Wang , et al. June 2, 2 | 2015-06-02 |
Amorphous Silicon Thickness Uniformity Improved By Process Diluted With Hydrogen And Argon Gas Mixture
App 20140357065 - WANG; Qunhua ; et al. | 2014-12-04 |
Multi-layer Amorphous Silicon Structure With Improved Poly-silicon Quality After Excimer Laser Anneal
App 20140335680 - WANG; Qunhua ; et al. | 2014-11-13 |
Flip Edge Shadow Frame
App 20140251216 - WANG; Qunhua ; et al. | 2014-09-11 |
Showerhead Support Structure For Improved Gas Flow
App 20140246521 - TINER; Robin L. ; et al. | 2014-09-04 |
Showerhead support structure for improved gas flow
Grant 8,721,791 - Tiner , et al. May 13, 2 | 2014-05-13 |
Flip Edge Shadow Frame
App 20130263782 - WANG; QUNHUA ; et al. | 2013-10-10 |
Methods For Depositing A Silicon Containing Layer With Argon Gas Dilution
App 20130087783 - Wang; Qunhua ; et al. | 2013-04-11 |
Mini Blocker Plate With Standoff Spacers
App 20130004681 - Tso; Alan ; et al. | 2013-01-03 |
Flow blocker plate
Grant D664,249 - Wang , et al. July 24, 2 | 2012-07-24 |
Showerhead Support Structure For Improved Gas Flow
App 20120027918 - Tiner; Robin L. ; et al. | 2012-02-02 |
Contamination Reducing Liner For Inductively Coupled Chamber
App 20120009356 - Choi; Soo Young ; et al. | 2012-01-12 |
Precise Temperature Control For Teos Application By Heat Transfer Fluid
App 20120009347 - Lee; Dongsuh ; et al. | 2012-01-12 |
Plasma uniformity control by gas diffuser hole design
Grant 8,083,853 - Choi , et al. December 27, 2 | 2011-12-27 |
Plasma Uniformity Control By Gas Diffuser Hole Design
App 20110290183 - Choi; Soo Young ; et al. | 2011-12-01 |
Shadow frame with cross beam for semiconductor equipment
Grant 8,002,896 - Tanaka , et al. August 23, 2 | 2011-08-23 |
Method of controlling the film properties of PECVD-deposited thin films
Grant 7,785,672 - Choi , et al. August 31, 2 | 2010-08-31 |
Methods and apparatus for reducing arcing during plasma processing
Grant 7,501,161 - Hou , et al. March 10, 2 | 2009-03-10 |
Chamber Idle Process For Improved Repeatability Of Films
App 20080292811 - CHOI; YOUNG-JIN ; et al. | 2008-11-27 |
Apparatus And Method For Deposition Over Large Area Substrates
App 20080282982 - White; John M. ; et al. | 2008-11-20 |
Gas Distribution Uniformity Improvement By Baffle Plate With Multi-size Holes For Large Size Pecvd Systems
App 20080178807 - Wang; Qunhua ; et al. | 2008-07-31 |
Contamination Reducing Liner For Inductively Coupled Chamber
App 20080118663 - Choi; Soo Young ; et al. | 2008-05-22 |
Plasma uniformity control by gas diffuser hole design
App 20060236934 - Choi; Soo Young ; et al. | 2006-10-26 |
Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
Grant 7,125,758 - Choi , et al. October 24, 2 | 2006-10-24 |
Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems
App 20060228490 - Wang; Qunhua ; et al. | 2006-10-12 |
Sulfur hexafluoride remote plasma source clean
App 20060090773 - Choi; Soo Young ; et al. | 2006-05-04 |
Shadow frame with cross beam for semiconductor equipment
App 20060030088 - Tanaka; Sakae ; et al. | 2006-02-09 |
Methods and apparatus for reducing arcing during plasma processing
App 20050266174 - Hou, Li ; et al. | 2005-12-01 |
Method of controlling the film properties of PECVD-deposited thin films
App 20050255257 - Choi, Soo Young ; et al. | 2005-11-17 |
Plasma uniformity control by gas diffuser hole design
App 20050251990 - Choi, Soo Young ; et al. | 2005-11-17 |
Shadow frame with cross beam for semiconductor equipment
Grant 6,960,263 - Tanaka , et al. November 1, 2 | 2005-11-01 |
Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
App 20050233595 - Choi, Soo Young ; et al. | 2005-10-20 |
Shadow frame with cross beam for semiconductor equipment
App 20030200928 - Tanaka, Sakae ; et al. | 2003-10-30 |
System and method for metal induced crystallization of polycrystalline thin film transistors
App 20030203123 - Shang, Quanyaun ; et al. | 2003-10-30 |
| 