Wang; Qing Min
Patent Applications and Registrations
Patent applications and USPTO patent grants for Wang; Qing Min.The latest application filed is for "bismaleimide cross-linker for low loss dielectric".
- Wang; Qing Min - North Andover MA
- Wang; Qing Min - Edison NJ
- Wang, Qing Min - North Plainfield NJ
| Patent | Date |
|---|---|
| Bismaleimide Cross-linker For Low Loss Dielectric App 20210198396 - Murphy; Jaclyn ; et al. | 2021-07-01 |
| Polyarylene resins Grant 10,894,848 - Kinzie , et al. January 19, 2 | 2021-01-19 |
| Polyarylene Resins App 20180171069 - Wang; Qing Min ; et al. | 2018-06-21 |
| Polyarylene Resins App 20180162968 - Kinzie; Charles R. ; et al. | 2018-06-14 |
| Organometallic compounds Grant 8,343,580 - Wang , et al. January 1, 2 | 2013-01-01 |
| Method And Apparatus For Using Solution Based Precursors For Atomic Layer Deposition App 20120294753 - MA; Ce ; et al. | 2012-11-22 |
| Method And Apparatus For Using Solution Based Precursors For Atomic Layer Deposition App 20120295038 - Ma; Ce ; et al. | 2012-11-22 |
| Precursor Compositions And Methods App 20110287184 - SHENAI-KHATKHATE; Deodatta Vinayak ; et al. | 2011-11-24 |
| Method of forming metal-containing layer using organometallic compounds Grant 8,012,536 - Shenai-Khatkhate , et al. September 6, 2 | 2011-09-06 |
| Organometallic Compounds App 20110064879 - Wang; Qing Min ; et al. | 2011-03-17 |
| Methods And Apparatus For The Vaporization And Delivery Of Solution Precursors For Atomic Layer Deposition App 20100151261 - Ma; Ce ; et al. | 2010-06-17 |
| Precursors For Atomic Layer Deposition App 20100055321 - Ma; Ce ; et al. | 2010-03-04 |
| Methods For Atomic Layer Deposition App 20100036144 - Ma; Ce ; et al. | 2010-02-11 |
| Single Precursors For Atomic Layer Deposition App 20090305504 - Ma; Ce ; et al. | 2009-12-10 |
| Method And Apparatus For Using Solution Precursors For Atomic Layer Deposition App 20090220374 - MA; Ce ; et al. | 2009-09-03 |
| Organometallic compounds Grant 7,547,631 - Shenai-Khatkhate , et al. June 16, 2 | 2009-06-16 |
| Organometallic compounds Grant 7,531,458 - Shenai-Khatkhate , et al. May 12, 2 | 2009-05-12 |
| Method and apparatus for using solution based precursors for atomic layer deposition Grant 7,514,119 - Ma , et al. April 7, 2 | 2009-04-07 |
| Precursor compositions and methods App 20090017208 - Shenai-Khatkhate; Deodatta Vinayak ; et al. | 2009-01-15 |
| Organometallic compounds App 20080305260 - Shenai-Khatkhate; Deodatta Vinayak ; et al. | 2008-12-11 |
| Organometallic compounds App 20080026576 - Shenai-Khatkhate; Deodatta Vinayak ; et al. | 2008-01-31 |
| Organometallic compounds App 20080026578 - Shenai-Khatkhate; Deodatta Vinayak ; et al. | 2008-01-31 |
| Organometallic compounds App 20080026577 - Shenai-Khatkhate; Deodatta Vinayak ; et al. | 2008-01-31 |
| Method of forming low dielectric constant layer App 20070077778 - Ma; Ce ; et al. | 2007-04-05 |
| Method and apparatus for using solution based precursors for atomic layer deposition App 20060269667 - Ma; Ce ; et al. | 2006-11-30 |
| Low temperature selective epitaxial growth of silicon germanium layers App 20060071213 - Ma; Ce ; et al. | 2006-04-06 |
| Method and apparatus for maintaining by-product volatility in deposition process App 20050250347 - Bailey, Christopher M. ; et al. | 2005-11-10 |
| Acid copper electroplating solutions App 20040187731 - Wang, Qing Min ; et al. | 2004-09-30 |
| Process for stripping amine borane complex from an electroless plating solution Grant 6,790,364 - Wang , et al. September 14, 2 | 2004-09-14 |
| Process for stripping amine borane complex from an electroless plating solution App 20040060874 - Wang, Qing Min ; et al. | 2004-04-01 |
| Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film Grant 6,649,540 - Wang , et al. November 18, 2 | 2003-11-18 |
| Asymmetric organocyclosiloxanes and their use for making organosilicon polymer low-k dielectric film Grant 6,572,923 - Ma , et al. June 3, 2 | 2003-06-03 |
| Metallo-organic polymers for gas separation and purification Grant 6,491,740 - Wang , et al. December 10, 2 | 2002-12-10 |
| Asymmetric organocyclosiloxanes and their use for making organosilicon polymer low-k dielectric film App 20020132408 - Ma, Ce ; et al. | 2002-09-19 |
| Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film App 20020076944 - Wang, Qing Min ; et al. | 2002-06-20 |
| Low-k dielectric CVD precursors and uses thereof App 20020072220 - Wang, Qing Min ; et al. | 2002-06-13 |
| Adsorbents and adsorptive separation process Grant 6,350,298 - Su , et al. February 26, 2 | 2002-02-26 |
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