Patent | Date |
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Method of post optical proximity correction (OPC) printing verification by machine learning Grant 11,308,256 - Wang , et al. April 19, 2 | 2022-04-19 |
Optical proximity correction methodology using pattern classification for target placement Grant 11,048,161 - Wang , et al. June 29, 2 | 2021-06-29 |
Methodology for pattern density optimization Grant 10,860,774 - Wang , et al. December 8, 2 | 2020-12-08 |
Method Of Post Optical Proximity Correction (opc) Printing Verification By Machine Learning App 20200320246 - WANG; Hung-Chun ;   et al. | 2020-10-08 |
Method for integrated circuit manufacturing Grant 10,747,938 - Wang , et al. A | 2020-08-18 |
Method of post optical proximity correction (OPC) printing verification by machine learning Grant 10,691,864 - Wang , et al. | 2020-06-23 |
Optical Proximity Correction Methodology Using Pattern Classification for Target Placement App 20200142294 - Wang; Hung-Chun ;   et al. | 2020-05-07 |
Optical proximity correction methodology using pattern classification for target placement Grant 10,527,928 - Wang , et al. J | 2020-01-07 |
Optical proximity correction methodology using underlying layer information Grant 10,520,829 - Wang , et al. Dec | 2019-12-31 |
Method for Integrated Circuit Manufacturing App 20190340330 - Wang; Hung-Chun ;   et al. | 2019-11-07 |
Method for integrated circuit manufacturing Grant 10,360,339 - Wang , et al. | 2019-07-23 |
Method Of Post Optical Proximity Correction (opc) Printing Verification By Machine Learning App 20190147134 - Wang; Hung-Chun ;   et al. | 2019-05-16 |
Optical Proximity Correction Methodology Using Underlying Layer Information App 20190094710 - Wang; Hung-Chun ;   et al. | 2019-03-28 |
Methodology For Pattern Density Optimization App 20180349545 - Wang; Hung-Chun ;   et al. | 2018-12-06 |
Methodology for pattern density optimization Grant 10,049,178 - Wang , et al. August 14, 2 | 2018-08-14 |
Optical Proximity Correction Methodology Using Pattern Classification for Target Placement App 20180173090 - Wang; Hung-Chun ;   et al. | 2018-06-21 |
System and method for pattern correction in e-beam lithography Grant 9,529,959 - Wang , et al. December 27, 2 | 2016-12-27 |
Methodology For Pattern Density Optimization App 20160275232 - Wang; Hung-Chun ;   et al. | 2016-09-22 |
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes Grant 9,418,191 - Wang , et al. August 16, 2 | 2016-08-16 |
Methodology for pattern density optimization Grant 9,411,924 - Wang , et al. August 9, 2 | 2016-08-09 |
Methodology of optical proximity correction optimization Grant 9,390,217 - Wang , et al. July 12, 2 | 2016-07-12 |
Method for Integrated Circuit Manufacturing App 20160162627 - Wang; Hung-Chun ;   et al. | 2016-06-09 |
Electron beam data storage system and method for high volume manufacturing Grant 9,336,986 - Wang , et al. May 10, 2 | 2016-05-10 |
Method and system for E-beam lithography with multi-exposure Grant 9,305,799 - Chen , et al. April 5, 2 | 2016-04-05 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 9,298,083 - Chang , et al. March 29, 2 | 2016-03-29 |
Method for integrated circuit manufacturing Grant 9,262,578 - Wang , et al. February 16, 2 | 2016-02-16 |
Method for Integrated Circuit Manufacturing App 20150310158 - Wang; Hung-Chun ;   et al. | 2015-10-29 |
Layout design for electron-beam high volume manufacturing Grant 9,165,106 - Wang , et al. October 20, 2 | 2015-10-20 |
System And Method For Pattern Correction In E-beam Lithography App 20150242562 - WANG; Hung-Chun ;   et al. | 2015-08-27 |
Layout Design For Electron-beam High Volume Manufacturing App 20150149969 - Wang; Hung-Chun ;   et al. | 2015-05-28 |
Methodology for pattern correction Grant 9,026,955 - Wang , et al. May 5, 2 | 2015-05-05 |
Methodology For Pattern Density Optimization App 20150106779 - Wang; Hung-Chun ;   et al. | 2015-04-16 |
Methodology For Pattern Correction App 20150106773 - Wang; Hung-Chun ;   et al. | 2015-04-16 |
Layout design for electron-beam high volume manufacturing Grant 8,949,749 - Wang , et al. February 3, 2 | 2015-02-03 |
Smart subfield method for E-beam lithography Grant 8,945,803 - Chen , et al. February 3, 2 | 2015-02-03 |
Electron Beam Data Storage System and Method for High Volume Manufacturing App 20150008343 - WANG; HUNG-CHUN ;   et al. | 2015-01-08 |
Method and System for E-Beam Lithography with Multi-Exposure App 20140367588 - Chen; Pei-Shiang ;   et al. | 2014-12-18 |
Electron beam data storage system and method for high volume manufacturing Grant 8,841,049 - Wang , et al. September 23, 2 | 2014-09-23 |
Method and system for E-beam lithography with multi-exposure Grant 8,835,082 - Chen , et al. September 16, 2 | 2014-09-16 |
Extreme Ultraviolet Light (euv) Photomasks, And Fabrication Methods Thereof App 20140248555 - CHANG; Ching-Hsu ;   et al. | 2014-09-04 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 8,764,995 - Chang , et al. July 1, 2 | 2014-07-01 |
System, Method And Computer Program Product To Evaluate A Semiconductor Wafer Fabrication Process App 20140119638 - Chang; Feng-Ju ;   et al. | 2014-05-01 |
Layout Design for Electron-Beam High Volume Manufacturing App 20140115546 - Wang; Hung-Chun ;   et al. | 2014-04-24 |
Novel Methodology of Optical Proximity Correction Optimization App 20140109026 - Wang; Hung-Chun ;   et al. | 2014-04-17 |
Smart Subfield Method For E-Beam Lithographny App 20140099582 - Chen; Pei-Shiang ;   et al. | 2014-04-10 |
Method and System for E-Beam Lithography with Multi-Exposure App 20140038107 - Chen; Pei-Shiang ;   et al. | 2014-02-06 |
Providing Elecron Beam Proximity Effect Correction By Simulating Write Operations Of Polygonal Shapes App 20140033144 - Wang; Hung-Chun ;   et al. | 2014-01-30 |
Methodology of optical proximity correction optimization Grant 8,631,360 - Wang , et al. January 14, 2 | 2014-01-14 |
Pattern correction with location effect Grant 8,627,241 - Wang , et al. January 7, 2 | 2014-01-07 |
Smart subfield method for E-beam lithography Grant 8,609,308 - Chen , et al. December 17, 2 | 2013-12-17 |
Smart Subfield Method For E-beam Lithography App 20130323648 - Chen; Pei-Shiang ;   et al. | 2013-12-05 |
Geometric pattern data quality verification for maskless lithography Grant 8,601,407 - Wang , et al. December 3, 2 | 2013-12-03 |
Electron Beam Data Storage System and Method for High Volume Manufacturing App 20130316289 - Wang; Hung-Chun ;   et al. | 2013-11-28 |
Novel Methodology Of Optical Proximity Correction Optimization App 20130275926 - Wang; Hung-Chun ;   et al. | 2013-10-17 |
Pattern Correction With Location Effect App 20130275925 - Wang; Hung-Chun ;   et al. | 2013-10-17 |
Electron beam data storage system and method for high volume manufacturing Grant 8,507,159 - Wang , et al. August 13, 2 | 2013-08-13 |
Striping methodology for maskless lithography Grant 8,473,877 - Wang , et al. June 25, 2 | 2013-06-25 |
Method for high volume e-beam lithography Grant 8,468,473 - Wang , et al. June 18, 2 | 2013-06-18 |
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes Grant 8,464,186 - Wang , et al. June 11, 2 | 2013-06-11 |
Striping Methodology For Maskless Lithography App 20130061187 - Wang; Hung-Chun ;   et al. | 2013-03-07 |
Geometric Pattern Data Quality Verification For Maskless Lithography App 20130055173 - Wang; Hung-Chun ;   et al. | 2013-02-28 |
Electron Beam Data Storage System And Method For High Volume Manufacturing App 20120237877 - Wang; Hung-Chun ;   et al. | 2012-09-20 |
Systems And Methods Providing Electron Beam Proximity Effect Correction App 20120192126 - Wang; Hung-Chun ;   et al. | 2012-07-26 |
Extreme Ultraviolet Light (euv) Photomasks, And Fabrication Methods Thereof App 20120045712 - CHANG; Ching-Hsu ;   et al. | 2012-02-23 |
Anti-ESD photomask blank Grant 7,387,855 - Chiang , et al. June 17, 2 | 2008-06-17 |
Method for repairing a phase shift mask Grant 7,348,106 - Wang , et al. March 25, 2 | 2008-03-25 |
Anti-ESD photomask blank App 20060154153 - Chiang; Eric ;   et al. | 2006-07-13 |
Method for repairing a phase shift mask App 20050247669 - Wang, Hung-Chun ;   et al. | 2005-11-10 |