loadpatents
name:-0.043317079544067
name:-0.044002056121826
name:-0.014080047607422
Wang; Hung-Chun Patent Filings

Wang; Hung-Chun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Hung-Chun.The latest application filed is for "method of post optical proximity correction (opc) printing verification by machine learning".

Company Profile
12.44.40
  • Wang; Hung-Chun - Taichung TW
  • Wang; Hung-Chun - Taichung County TW
  • Wang; Hung-Chun - Ching-Suei TW
  • Wang; Hung-Chun - Ching-Shuei TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of post optical proximity correction (OPC) printing verification by machine learning
Grant 11,308,256 - Wang , et al. April 19, 2
2022-04-19
Optical proximity correction methodology using pattern classification for target placement
Grant 11,048,161 - Wang , et al. June 29, 2
2021-06-29
Methodology for pattern density optimization
Grant 10,860,774 - Wang , et al. December 8, 2
2020-12-08
Method Of Post Optical Proximity Correction (opc) Printing Verification By Machine Learning
App 20200320246 - WANG; Hung-Chun ;   et al.
2020-10-08
Method for integrated circuit manufacturing
Grant 10,747,938 - Wang , et al. A
2020-08-18
Method of post optical proximity correction (OPC) printing verification by machine learning
Grant 10,691,864 - Wang , et al.
2020-06-23
Optical Proximity Correction Methodology Using Pattern Classification for Target Placement
App 20200142294 - Wang; Hung-Chun ;   et al.
2020-05-07
Optical proximity correction methodology using pattern classification for target placement
Grant 10,527,928 - Wang , et al. J
2020-01-07
Optical proximity correction methodology using underlying layer information
Grant 10,520,829 - Wang , et al. Dec
2019-12-31
Method for Integrated Circuit Manufacturing
App 20190340330 - Wang; Hung-Chun ;   et al.
2019-11-07
Method for integrated circuit manufacturing
Grant 10,360,339 - Wang , et al.
2019-07-23
Method Of Post Optical Proximity Correction (opc) Printing Verification By Machine Learning
App 20190147134 - Wang; Hung-Chun ;   et al.
2019-05-16
Optical Proximity Correction Methodology Using Underlying Layer Information
App 20190094710 - Wang; Hung-Chun ;   et al.
2019-03-28
Methodology For Pattern Density Optimization
App 20180349545 - Wang; Hung-Chun ;   et al.
2018-12-06
Methodology for pattern density optimization
Grant 10,049,178 - Wang , et al. August 14, 2
2018-08-14
Optical Proximity Correction Methodology Using Pattern Classification for Target Placement
App 20180173090 - Wang; Hung-Chun ;   et al.
2018-06-21
System and method for pattern correction in e-beam lithography
Grant 9,529,959 - Wang , et al. December 27, 2
2016-12-27
Methodology For Pattern Density Optimization
App 20160275232 - Wang; Hung-Chun ;   et al.
2016-09-22
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
Grant 9,418,191 - Wang , et al. August 16, 2
2016-08-16
Methodology for pattern density optimization
Grant 9,411,924 - Wang , et al. August 9, 2
2016-08-09
Methodology of optical proximity correction optimization
Grant 9,390,217 - Wang , et al. July 12, 2
2016-07-12
Method for Integrated Circuit Manufacturing
App 20160162627 - Wang; Hung-Chun ;   et al.
2016-06-09
Electron beam data storage system and method for high volume manufacturing
Grant 9,336,986 - Wang , et al. May 10, 2
2016-05-10
Method and system for E-beam lithography with multi-exposure
Grant 9,305,799 - Chen , et al. April 5, 2
2016-04-05
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
Grant 9,298,083 - Chang , et al. March 29, 2
2016-03-29
Method for integrated circuit manufacturing
Grant 9,262,578 - Wang , et al. February 16, 2
2016-02-16
Method for Integrated Circuit Manufacturing
App 20150310158 - Wang; Hung-Chun ;   et al.
2015-10-29
Layout design for electron-beam high volume manufacturing
Grant 9,165,106 - Wang , et al. October 20, 2
2015-10-20
System And Method For Pattern Correction In E-beam Lithography
App 20150242562 - WANG; Hung-Chun ;   et al.
2015-08-27
Layout Design For Electron-beam High Volume Manufacturing
App 20150149969 - Wang; Hung-Chun ;   et al.
2015-05-28
Methodology for pattern correction
Grant 9,026,955 - Wang , et al. May 5, 2
2015-05-05
Methodology For Pattern Density Optimization
App 20150106779 - Wang; Hung-Chun ;   et al.
2015-04-16
Methodology For Pattern Correction
App 20150106773 - Wang; Hung-Chun ;   et al.
2015-04-16
Layout design for electron-beam high volume manufacturing
Grant 8,949,749 - Wang , et al. February 3, 2
2015-02-03
Smart subfield method for E-beam lithography
Grant 8,945,803 - Chen , et al. February 3, 2
2015-02-03
Electron Beam Data Storage System and Method for High Volume Manufacturing
App 20150008343 - WANG; HUNG-CHUN ;   et al.
2015-01-08
Method and System for E-Beam Lithography with Multi-Exposure
App 20140367588 - Chen; Pei-Shiang ;   et al.
2014-12-18
Electron beam data storage system and method for high volume manufacturing
Grant 8,841,049 - Wang , et al. September 23, 2
2014-09-23
Method and system for E-beam lithography with multi-exposure
Grant 8,835,082 - Chen , et al. September 16, 2
2014-09-16
Extreme Ultraviolet Light (euv) Photomasks, And Fabrication Methods Thereof
App 20140248555 - CHANG; Ching-Hsu ;   et al.
2014-09-04
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
Grant 8,764,995 - Chang , et al. July 1, 2
2014-07-01
System, Method And Computer Program Product To Evaluate A Semiconductor Wafer Fabrication Process
App 20140119638 - Chang; Feng-Ju ;   et al.
2014-05-01
Layout Design for Electron-Beam High Volume Manufacturing
App 20140115546 - Wang; Hung-Chun ;   et al.
2014-04-24
Novel Methodology of Optical Proximity Correction Optimization
App 20140109026 - Wang; Hung-Chun ;   et al.
2014-04-17
Smart Subfield Method For E-Beam Lithographny
App 20140099582 - Chen; Pei-Shiang ;   et al.
2014-04-10
Method and System for E-Beam Lithography with Multi-Exposure
App 20140038107 - Chen; Pei-Shiang ;   et al.
2014-02-06
Providing Elecron Beam Proximity Effect Correction By Simulating Write Operations Of Polygonal Shapes
App 20140033144 - Wang; Hung-Chun ;   et al.
2014-01-30
Methodology of optical proximity correction optimization
Grant 8,631,360 - Wang , et al. January 14, 2
2014-01-14
Pattern correction with location effect
Grant 8,627,241 - Wang , et al. January 7, 2
2014-01-07
Smart subfield method for E-beam lithography
Grant 8,609,308 - Chen , et al. December 17, 2
2013-12-17
Smart Subfield Method For E-beam Lithography
App 20130323648 - Chen; Pei-Shiang ;   et al.
2013-12-05
Geometric pattern data quality verification for maskless lithography
Grant 8,601,407 - Wang , et al. December 3, 2
2013-12-03
Electron Beam Data Storage System and Method for High Volume Manufacturing
App 20130316289 - Wang; Hung-Chun ;   et al.
2013-11-28
Novel Methodology Of Optical Proximity Correction Optimization
App 20130275926 - Wang; Hung-Chun ;   et al.
2013-10-17
Pattern Correction With Location Effect
App 20130275925 - Wang; Hung-Chun ;   et al.
2013-10-17
Electron beam data storage system and method for high volume manufacturing
Grant 8,507,159 - Wang , et al. August 13, 2
2013-08-13
Striping methodology for maskless lithography
Grant 8,473,877 - Wang , et al. June 25, 2
2013-06-25
Method for high volume e-beam lithography
Grant 8,468,473 - Wang , et al. June 18, 2
2013-06-18
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
Grant 8,464,186 - Wang , et al. June 11, 2
2013-06-11
Striping Methodology For Maskless Lithography
App 20130061187 - Wang; Hung-Chun ;   et al.
2013-03-07
Geometric Pattern Data Quality Verification For Maskless Lithography
App 20130055173 - Wang; Hung-Chun ;   et al.
2013-02-28
Electron Beam Data Storage System And Method For High Volume Manufacturing
App 20120237877 - Wang; Hung-Chun ;   et al.
2012-09-20
Systems And Methods Providing Electron Beam Proximity Effect Correction
App 20120192126 - Wang; Hung-Chun ;   et al.
2012-07-26
Extreme Ultraviolet Light (euv) Photomasks, And Fabrication Methods Thereof
App 20120045712 - CHANG; Ching-Hsu ;   et al.
2012-02-23
Anti-ESD photomask blank
Grant 7,387,855 - Chiang , et al. June 17, 2
2008-06-17
Method for repairing a phase shift mask
Grant 7,348,106 - Wang , et al. March 25, 2
2008-03-25
Anti-ESD photomask blank
App 20060154153 - Chiang; Eric ;   et al.
2006-07-13
Method for repairing a phase shift mask
App 20050247669 - Wang, Hung-Chun ;   et al.
2005-11-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed