Wang; Hong-xing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Hong-xing.The latest application filed is for "haptic input stylus".

Company Profile

0.7.11

Wang; Hong-xing - Shenzhen CN
Wang; Hong-Xing - Osaka N/A JP
Wang; Hong-Xing - Boston MA
Wang; Hong Xing - Tokushima JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Speaker system and method for driving same Grant 9,357,290 - Zhou , et al. May 31, 2	2016-05-31
Haptic Input Stylus App 20140028592 - Wang; Hong Xing ; et al.	2014-01-30
Speaker System and Method for Driving Same App 20130259268 - Zhou; Rong-guan ; et al.	2013-10-03
Carbon film and carbon film structure Grant 8,518,542 - Hiraki , et al. August 27, 2	2013-08-27
Carbon film having shape suitable for field emission Grant 8,421,330 - Haba , et al. April 16, 2	2013-04-16
Method Of Assessing Mammalian Embryo Quality App 20110076694 - Kidder; Gerald M. ; et al.	2011-03-31
Carbon Film Having Shape Suitable For Field Emission App 20110037375 - HABA; Masanori ; et al.	2011-02-17
Carbon Film And Carbon Film Structure App 20100304077 - Wang; Hong-Xing ; et al.	2010-12-02
Carbon film having shape suitable for field emission Grant 7,839,067 - Haba , et al. November 23, 2	2010-11-23
Plasma Generating Device And Film Deposition Method In Which The Plasma Generating Device Is Used App 20090266703 - Jiang; Nan ; et al.	2009-10-29
Carbon film having shape suitable for field emission App 20070035227 - Haba; Masanori ; et al.	2007-02-15
Chemical vapor deposition apparatus and chemical vapor deposition method Grant 6,666,921 - Sakai , et al. December 23, 2	2003-12-23
Chemical vapor deposition apparatus and chemical vapor deposition method App 20030015137 - Sakai, Shiro ; et al.	2003-01-23
Chemical vapor deposition apparatus and chemical vapor deposition method App 20020160112 - Sakai, Shiro ; et al.	2002-10-31
Chemical vapor deposition apparatus and chemical vapor deposition method App 20020042191 - Sakai, Shiro ; et al.	2002-04-11

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