Patent applications and USPTO patent grants for Wang; Guangxin.The latest application filed is for "tantalum sputtering target and method of manufacture".
Patent | Date |
---|---|
Methods for electrically forming materials Grant 7,252,751 - Wang August 7, 2 | 2007-08-07 |
Capacitor containing high purity tantalum Grant 7,102,229 - Rosenberg , et al. September 5, 2 | 2006-09-05 |
Tantalum sputtering target and method of manufacture App 20050284546 - Rosenberg, Harry ;   et al. | 2005-12-29 |
Tantalum sputtering target and method of manufacture App 20050284259 - Rosenberg, Harry ;   et al. | 2005-12-29 |
Tantalum sputtering target and method of manufacture Grant 6,958,257 - Rosenberg , et al. October 25, 2 | 2005-10-25 |
Tantalum sputtering target and method of manufacture Grant 6,955,938 - Rosenberg , et al. October 18, 2 | 2005-10-18 |
Apparatus for processing metals Grant 6,843,896 - Wang , et al. January 18, 2 | 2005-01-18 |
Method for processing metals Grant 6,818,119 - Wang , et al. November 16, 2 | 2004-11-16 |
Methods for electrically forming materials App 20040168932 - Wang, Guangxin | 2004-09-02 |
Tantalum sputtering target and method of manufacture Grant 6,566,161 - Rosenberg , et al. May 20, 2 | 2003-05-20 |
Tantalum sputtering target and method of manufacture App 20030082864 - Rosenberg, Harry ;   et al. | 2003-05-01 |
Method for processing metals App 20020189953 - Wang, Guangxin ;   et al. | 2002-12-19 |
Apparatus for processing metals App 20020189937 - Wang, Guangxin ;   et al. | 2002-12-19 |
Methods for electrically forming materials; and mixed metal materials App 20020139667 - Wang, Guangxin | 2002-10-03 |
Solids comprising tantalum, strontium and silicon Grant 6,454,994 - Wang September 24, 2 | 2002-09-24 |
Tantalum sputtering target and method of manufacture App 20020132388 - Rosenberg, Harry ;   et al. | 2002-09-19 |
SEC | 0001421490 | Wang Guangxin |
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