loadpatents
Patent applications and USPTO patent grants for Wang; Deyan.The latest application filed is for "photoresist topcoat compositions and pattern formation methods".
Patent | Date |
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Photoresist Topcoat Compositions And Pattern Formation Methods App 20220214619 - Kaitz; Joshua ;   et al. | 2022-07-07 |
Photoresist Compositions And Pattern Formation Methods App 20220214616 - Kaitz; Joshua ;   et al. | 2022-07-07 |
Polymers for display devices Grant 11,332,559 - Song , et al. May 17, 2 | 2022-05-17 |
High Refractive Index Materials App 20220112321 - PATTERSON; Anastasia ;   et al. | 2022-04-14 |
Coating Compositions And Methods Of Forming Electronic Devices App 20210341840 - Liu; Sheng ;   et al. | 2021-11-04 |
Optically Clear Shear Thickening Fluids And Optical Display Device Comprising Same App 20210277219 - Wang; Deyan ;   et al. | 2021-09-09 |
Compositions comprising base-reactive component and processes for photolithography Grant 11,106,137 - Wang , et al. August 31, 2 | 2021-08-31 |
Polymers For Display Devices App 20210017308 - Song; Yixuan ;   et al. | 2021-01-21 |
Acoustic wave sensors and methods of sensing a gas-phase analyte Grant 10,794,866 - Gilmore , et al. October 6, 2 | 2020-10-06 |
Anti-reflective Coating App 20200263041 - Wang; Deyan ;   et al. | 2020-08-20 |
Photoresist topcoat compositions and methods of processing photoresist compositions Grant 10,578,969 - Liu , et al. | 2020-03-03 |
Compositions comprising sulfonamide material and processes for photolithography Grant 10,558,122 - Wang , et al. Feb | 2020-02-11 |
Compositions Comprising Hetero-substituted Carbocyclic Aryl Component And Processes For Photolithography App 20190346763 - Wang; Deyan ;   et al. | 2019-11-14 |
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions App 20190235385 - Liu; Cong ;   et al. | 2019-08-01 |
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography Grant 10,359,698 - Wang , et al. | 2019-07-23 |
Acoustic Wave Sensors And Methods Of Sensing A Gas-phase Analyte App 20190219543 - GILMORE; Christopher ;   et al. | 2019-07-18 |
Compositions and processes for immersion lithography Grant 10,222,699 - Wang , et al. | 2019-03-05 |
Photoresist topcoat compositions and methods of processing photoresist compositions Grant 10,197,918 - Liu , et al. Fe | 2019-02-05 |
Processes for photolithography Grant 10,180,627 - Wang , et al. Ja | 2019-01-15 |
Neutral layer polymers, methods of manufacture thereof and articles comprising the same Grant 10,167,411 - Trefonas, III , et al. J | 2019-01-01 |
A Method Of Making A Multilayer Structure App 20180286598 - Wang; Deyan ;   et al. | 2018-10-04 |
Method Of Forming A Multilayer Structure App 20180282165 - Wang; Deyan | 2018-10-04 |
A Method Of Making A Graphitic Carbon Sheet App 20180273388 - Wang; Deyan ;   et al. | 2018-09-27 |
A Method Of Making A Composite Multilayer Structure App 20180265363 - Wang; Deyan ;   et al. | 2018-09-20 |
Compositions And Methods For Forming A Pixel-defining Layer App 20180224741 - Chuang; Peng-Wei ;   et al. | 2018-08-09 |
Topcoat compositions and pattern-forming methods Grant 10,042,259 - Kaur , et al. August 7, 2 | 2018-08-07 |
Topcoat Compositions And Pattern-forming Methods App 20180118970 - Kaur; Irvinder ;   et al. | 2018-05-03 |
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions App 20180120703 - Liu; Cong ;   et al. | 2018-05-03 |
Coating compositions for photoresists Grant 9,958,780 - Wang , et al. May 1, 2 | 2018-05-01 |
Polyarylene materials Grant 9,868,820 - Gilmore , et al. January 16, 2 | 2018-01-16 |
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same App 20170327712 - Trefonas, III; Peter ;   et al. | 2017-11-16 |
Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers Grant 9,802,400 - Trefonas, III , et al. October 31, 2 | 2017-10-31 |
Compositions and processes for immersion lithography Grant 9,696,622 - Wang July 4, 2 | 2017-07-04 |
Compositions comprising base-reactive component and processes for photolithography Grant 9,696,627 - Wang , et al. July 4, 2 | 2017-07-04 |
Metal hardmask compositions Grant 9,562,169 - Wang , et al. February 7, 2 | 2017-02-07 |
Hardmask Grant 9,563,126 - Yamada , et al. February 7, 2 | 2017-02-07 |
Compositions and processes for immersion lithography Grant 9,563,128 - Wang February 7, 2 | 2017-02-07 |
Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate Grant 9,515,272 - Kim , et al. December 6, 2 | 2016-12-06 |
Compositions and processes for photolithography Grant 9,507,260 - Wang , et al. November 29, 2 | 2016-11-29 |
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions App 20160333212 - Liu; Cong ;   et al. | 2016-11-17 |
Photoresist compositions and methods of forming photolithographic patterns Grant 9,482,945 - Park , et al. November 1, 2 | 2016-11-01 |
Photoresist compositions and methods of forming photolithographic patterns Grant 9,482,948 - Bae , et al. November 1, 2 | 2016-11-01 |
Compositions comprising base-reactive component and processes for photolithography Grant 9,436,082 - Wang , et al. September 6, 2 | 2016-09-06 |
Neutral layer polymers, methods of manufacture thereof and articles comprising the same Grant 9,382,444 - Trefonas, III , et al. July 5, 2 | 2016-07-05 |
Display Device Manufacture App 20160133864 - Kim; Young Seok ;   et al. | 2016-05-12 |
Topcoat Compositions And Photolithographic Methods App 20160130462 - LIU; Cong ;   et al. | 2016-05-12 |
Photoresist Compositions And Methods Of Forming Photolithographic Patterns App 20160109800 - BAE; Young Cheol ;   et al. | 2016-04-21 |
Photoresist Compositions And Methods Of Forming Photolithographic Patterns App 20160103393 - PARK; Jong Keun ;   et al. | 2016-04-14 |
Hardmask Grant 9,296,879 - Yamada , et al. March 29, 2 | 2016-03-29 |
Compositions Comprising Sulfonamide Material And Processes For Photolithography App 20160070172 - Wang; Deyan ;   et al. | 2016-03-10 |
Polyarylene Materials App 20160060393 - GILMORE; Christopher D. ;   et al. | 2016-03-03 |
Compositions and processes for photolithography Grant 9,274,427 - Wang , et al. March 1, 2 | 2016-03-01 |
Hardmask App 20160048077 - YAMADA; Shintaro ;   et al. | 2016-02-18 |
Compositions and processes for immersion lithography Grant 9,244,355 - Caporale , et al. January 26, 2 | 2016-01-26 |
Compositions Comprising Carboxy Component And Processes For Photolithography App 20150378255 - Wang; Deyan ;   et al. | 2015-12-31 |
Photoresist compositions and methods of forming photolithographic patterns Grant 9,188,864 - Bae , et al. November 17, 2 | 2015-11-17 |
Topcoat Compositions And Photolithographic Methods App 20150323869 - Liu; Cong ;   et al. | 2015-11-12 |
Hardmask surface treatment Grant 9,171,720 - Wang , et al. October 27, 2 | 2015-10-27 |
Metal Hardmask Compositions App 20150291829 - Wang; Deyan ;   et al. | 2015-10-15 |
Base reactive photoacid generators and photoresists comprising same Grant 9,156,785 - Aqad , et al. October 13, 2 | 2015-10-13 |
Photoresist compositions and methods of forming photolithographic patterns Grant 9,158,198 - Park , et al. October 13, 2 | 2015-10-13 |
Hardmask surface treatment Grant 9,136,123 - Wang , et al. September 15, 2 | 2015-09-15 |
Methods and compositions for removal of metal hardmasks Grant 9,102,901 - Wang , et al. August 11, 2 | 2015-08-11 |
Metal hardmask compositions Grant 9,070,548 - Wang , et al. June 30, 2 | 2015-06-30 |
Topcoat compositions and photolithographic methods Grant 9,063,425 - Wang June 23, 2 | 2015-06-23 |
Photoresist and coated substrate comprising same Grant 9,012,128 - Wang , et al. April 21, 2 | 2015-04-21 |
Compositions comprising sulfonamide material and processes for photolithography Grant 9,005,880 - Wang , et al. April 14, 2 | 2015-04-14 |
Compositions comprising carboxy component and processes for photolithography Grant 8,975,006 - Wang , et al. March 10, 2 | 2015-03-10 |
Hardmask App 20150064612 - YAMADA; Shintaro ;   et al. | 2015-03-05 |
Compositions And Processes For Immersion Lithography App 20150044609 - Wang; Deyan ;   et al. | 2015-02-12 |
Organometal Materials And Process App 20150024522 - WANG; Deyan ;   et al. | 2015-01-22 |
Organoaluminum Materials For Forming Aluminum Oxide Layer From Coating Composition That Contains Organic Solvent App 20150024607 - WANG; Deyan ;   et al. | 2015-01-22 |
Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent Grant 8,927,439 - Wang , et al. January 6, 2 | 2015-01-06 |
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same App 20140378592 - Trefonas, III; Peter ;   et al. | 2014-12-25 |
Orientation Control Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same App 20140377518 - Trefonas, III; Peter ;   et al. | 2014-12-25 |
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same App 20140377465 - Trefonas, III; Peter ;   et al. | 2014-12-25 |
Compositions and processes for photolithography Grant 8,883,400 - Wang , et al. November 11, 2 | 2014-11-11 |
Compositions And Processes For Immersion Lithography App 20140322648 - Wang; Deyan | 2014-10-30 |
Compositions and processes for immersion lithography Grant 8,871,428 - Wang , et al. October 28, 2 | 2014-10-28 |
Compositions And Processes For Photolithography App 20140295348 - WANG; Deyan ;   et al. | 2014-10-02 |
Compositions and processes for photolithography Grant 8,808,967 - Wang , et al. August 19, 2 | 2014-08-19 |
Hardmask Grant 8,795,774 - Wang , et al. August 5, 2 | 2014-08-05 |
Hardmask Surface Treatment App 20140202632 - WANG; Deyan ;   et al. | 2014-07-24 |
Hardmask Surface Treatment App 20140206201 - WANG; Deyan ;   et al. | 2014-07-24 |
Methods And Compositions For Removal Of Metal Hardmasks App 20140179582 - Wang; Deyan ;   et al. | 2014-06-26 |
Compositions and processes for photolithography Grant 8,748,080 - Wang , et al. June 10, 2 | 2014-06-10 |
Surface active additive and photoresist composition comprising same Grant 8,722,825 - Wang , et al. May 13, 2 | 2014-05-13 |
Compositions and processes for immersion lithography Grant 8,715,902 - Wang May 6, 2 | 2014-05-06 |
Hardmask App 20140087066 - WANG; Deyan ;   et al. | 2014-03-27 |
Photoresist And Coated Substrate Comprising Same App 20140065540 - Wang; Deyan ;   et al. | 2014-03-06 |
Photoresist Compositions And Methods Of Forming Photolithographic Patterns App 20140038102 - PARK; Jong Keun ;   et al. | 2014-02-06 |
Metal Hardmask Compositions App 20130337179 - Wang; Deyan ;   et al. | 2013-12-19 |
Leveler compounds Grant 8,506,788 - Wang , et al. August 13, 2 | 2013-08-13 |
Surface Active Additive And Photoresist Composition Comprising Same App 20130137035 - Wang; Deyan ;   et al. | 2013-05-30 |
Topcoat Compositions And Photolithographic Methods App 20130115553 - Wang; Deyan | 2013-05-09 |
Compositions And Processes For Immersion Lithography App 20130065178 - WANG; Deyan ;   et al. | 2013-03-14 |
Compositions And Processes For Photolithography App 20130017487 - Wang; Deyan ;   et al. | 2013-01-17 |
Leveler Compounds App 20130001088 - Wang; Deyan ;   et al. | 2013-01-03 |
Compositions And Processes For Photolithography App 20120264053 - WANG; Deyan | 2012-10-18 |
Leveler compounds Grant 8,262,891 - Wang , et al. September 11, 2 | 2012-09-11 |
Compositions And Processes For Photolithography App 20120225384 - Wang; Deyan ;   et al. | 2012-09-06 |
Compositons and processes for immersion lithography Grant 8,257,902 - Wang , et al. September 4, 2 | 2012-09-04 |
Compositions and processes for photolithography Grant 8,241,832 - Wang , et al. August 14, 2 | 2012-08-14 |
Compositions Comprising Base-reactive Component And Processes For Photolithography App 20120171626 - WANG; Deyan ;   et al. | 2012-07-05 |
Compositions Comprising Sugar Component And Processes For Photolithography App 20120156595 - OH; Joon-Seok ;   et al. | 2012-06-21 |
Base Reactive Photoacid Generators And Photoresists Comprising Same App 20120129108 - AQAD; Emad ;   et al. | 2012-05-24 |
Compositions Comprising Base-reactive Component And Processes For Photolithography App 20120122030 - WANG; Deyan ;   et al. | 2012-05-17 |
Compositions and processes for photolithography Grant 8,158,325 - Wang , et al. April 17, 2 | 2012-04-17 |
Photoresist Compositions And Methods Of Forming Photolithographic Patterns App 20110294069 - Bae; Young Cheol ;   et al. | 2011-12-01 |
Compositions And Processes For Immersion Lithography App 20110255069 - WANG; Deyan | 2011-10-20 |
Compositions Comprising Base-reactive Component And Processes For Photolithography App 20110255061 - Wang; Deyan ;   et al. | 2011-10-20 |
Compositions and processes for photolithography Grant 8,012,666 - Gallagher , et al. September 6, 2 | 2011-09-06 |
Compositions and processes for immersion lithography Grant 7,968,268 - Wang June 28, 2 | 2011-06-28 |
Coating Compositions For Photoresists App 20110143281 - WANG; Deyan ;   et al. | 2011-06-16 |
Compositions and processes for photolithography Grant 7,955,778 - Gallagher , et al. June 7, 2 | 2011-06-07 |
Processes For Photolithography App 20110003257 - Wang; Deyan ;   et al. | 2011-01-06 |
Compositions and processes for photolithography App 20100304290 - Wang; Deyan ;   et al. | 2010-12-02 |
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography App 20100297549 - Wang; Deyan ;   et al. | 2010-11-25 |
Compositions comprising sulfonamide material and processes for photolithography App 20100297550 - Wang; Deyan ;   et al. | 2010-11-25 |
Coating compositions for photoresists Grant 7,776,506 - Wang , et al. August 17, 2 | 2010-08-17 |
Compositions and processes for photolithography App 20100183976 - Wang; Deyan ;   et al. | 2010-07-22 |
Compositions and processes for photolithography App 20100183977 - Wang; Deyan ;   et al. | 2010-07-22 |
Compositions comprising carboxy component and processes for photolithography App 20100173245 - Wang; Deyan ;   et al. | 2010-07-08 |
Leveler compounds Grant 7,662,981 - Wang , et al. February 16, 2 | 2010-02-16 |
Compositions and processes for photolithography App 20090233224 - Gallagher; Michael K. ;   et al. | 2009-09-17 |
Leveler compounds App 20090139873 - Wang; Deyan ;   et al. | 2009-06-04 |
Compositions and processes for immersion lithography App 20090130592 - Wang; Deyan | 2009-05-21 |
Compositions and processes for immersion lithography App 20090123869 - Wang; Deyan | 2009-05-14 |
Compositons and processes for immersion lithography App 20090117489 - Wang; Deyan ;   et al. | 2009-05-07 |
Leveler compounds Grant 7,510,639 - Wang , et al. March 31, 2 | 2009-03-31 |
Compositions and processes for immersion lithography App 20080193872 - Caporale; Stefan J. ;   et al. | 2008-08-14 |
Compositions and processes for photolithography App 20070212646 - Gallagher; Michael K. ;   et al. | 2007-09-13 |
Coating compositions for photoresists App 20070160930 - Wang; Deyan ;   et al. | 2007-07-12 |
Leveler compounds App 20070084732 - Wang; Deyan ;   et al. | 2007-04-19 |
Compositions and processes for photolithography App 20070087286 - Wang; Deyan ;   et al. | 2007-04-19 |
Compositions and processes for immersion lithography App 20060246373 - Wang; Deyan | 2006-11-02 |
Leveler compounds Grant 7,128,822 - Wang , et al. October 31, 2 | 2006-10-31 |
Leveler compounds App 20060016693 - Wang; Deyan ;   et al. | 2006-01-26 |
Plating method App 20050020068 - Wang, Deyan ;   et al. | 2005-01-27 |
Leveler compounds App 20040249177 - Wang, Deyan ;   et al. | 2004-12-09 |
Electroplating composition App 20040222104 - Wang, Deyan ;   et al. | 2004-11-11 |
Electroplating bath App 20040217009 - Mikkola, Robert D. ;   et al. | 2004-11-04 |
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