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name:-0.098775863647461
name:-0.29862499237061
name:-0.014700889587402
Wang; Deyan Patent Filings

Wang; Deyan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Deyan.The latest application filed is for "photoresist topcoat compositions and pattern formation methods".

Company Profile
16.79.88
  • Wang; Deyan - Hudson MA
  • Wang; Deyan - Marlborough MA US
  • Wang; Deyan - Husdon MA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Photoresist Topcoat Compositions And Pattern Formation Methods
App 20220214619 - Kaitz; Joshua ;   et al.
2022-07-07
Photoresist Compositions And Pattern Formation Methods
App 20220214616 - Kaitz; Joshua ;   et al.
2022-07-07
Polymers for display devices
Grant 11,332,559 - Song , et al. May 17, 2
2022-05-17
High Refractive Index Materials
App 20220112321 - PATTERSON; Anastasia ;   et al.
2022-04-14
Coating Compositions And Methods Of Forming Electronic Devices
App 20210341840 - Liu; Sheng ;   et al.
2021-11-04
Optically Clear Shear Thickening Fluids And Optical Display Device Comprising Same
App 20210277219 - Wang; Deyan ;   et al.
2021-09-09
Compositions comprising base-reactive component and processes for photolithography
Grant 11,106,137 - Wang , et al. August 31, 2
2021-08-31
Polymers For Display Devices
App 20210017308 - Song; Yixuan ;   et al.
2021-01-21
Acoustic wave sensors and methods of sensing a gas-phase analyte
Grant 10,794,866 - Gilmore , et al. October 6, 2
2020-10-06
Anti-reflective Coating
App 20200263041 - Wang; Deyan ;   et al.
2020-08-20
Photoresist topcoat compositions and methods of processing photoresist compositions
Grant 10,578,969 - Liu , et al.
2020-03-03
Compositions comprising sulfonamide material and processes for photolithography
Grant 10,558,122 - Wang , et al. Feb
2020-02-11
Compositions Comprising Hetero-substituted Carbocyclic Aryl Component And Processes For Photolithography
App 20190346763 - Wang; Deyan ;   et al.
2019-11-14
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions
App 20190235385 - Liu; Cong ;   et al.
2019-08-01
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
Grant 10,359,698 - Wang , et al.
2019-07-23
Acoustic Wave Sensors And Methods Of Sensing A Gas-phase Analyte
App 20190219543 - GILMORE; Christopher ;   et al.
2019-07-18
Compositions and processes for immersion lithography
Grant 10,222,699 - Wang , et al.
2019-03-05
Photoresist topcoat compositions and methods of processing photoresist compositions
Grant 10,197,918 - Liu , et al. Fe
2019-02-05
Processes for photolithography
Grant 10,180,627 - Wang , et al. Ja
2019-01-15
Neutral layer polymers, methods of manufacture thereof and articles comprising the same
Grant 10,167,411 - Trefonas, III , et al. J
2019-01-01
A Method Of Making A Multilayer Structure
App 20180286598 - Wang; Deyan ;   et al.
2018-10-04
Method Of Forming A Multilayer Structure
App 20180282165 - Wang; Deyan
2018-10-04
A Method Of Making A Graphitic Carbon Sheet
App 20180273388 - Wang; Deyan ;   et al.
2018-09-27
A Method Of Making A Composite Multilayer Structure
App 20180265363 - Wang; Deyan ;   et al.
2018-09-20
Compositions And Methods For Forming A Pixel-defining Layer
App 20180224741 - Chuang; Peng-Wei ;   et al.
2018-08-09
Topcoat compositions and pattern-forming methods
Grant 10,042,259 - Kaur , et al. August 7, 2
2018-08-07
Topcoat Compositions And Pattern-forming Methods
App 20180118970 - Kaur; Irvinder ;   et al.
2018-05-03
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions
App 20180120703 - Liu; Cong ;   et al.
2018-05-03
Coating compositions for photoresists
Grant 9,958,780 - Wang , et al. May 1, 2
2018-05-01
Polyarylene materials
Grant 9,868,820 - Gilmore , et al. January 16, 2
2018-01-16
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same
App 20170327712 - Trefonas, III; Peter ;   et al.
2017-11-16
Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
Grant 9,802,400 - Trefonas, III , et al. October 31, 2
2017-10-31
Compositions and processes for immersion lithography
Grant 9,696,622 - Wang July 4, 2
2017-07-04
Compositions comprising base-reactive component and processes for photolithography
Grant 9,696,627 - Wang , et al. July 4, 2
2017-07-04
Metal hardmask compositions
Grant 9,562,169 - Wang , et al. February 7, 2
2017-02-07
Hardmask
Grant 9,563,126 - Yamada , et al. February 7, 2
2017-02-07
Compositions and processes for immersion lithography
Grant 9,563,128 - Wang February 7, 2
2017-02-07
Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate
Grant 9,515,272 - Kim , et al. December 6, 2
2016-12-06
Compositions and processes for photolithography
Grant 9,507,260 - Wang , et al. November 29, 2
2016-11-29
Photoresist Topcoat Compositions And Methods Of Processing Photoresist Compositions
App 20160333212 - Liu; Cong ;   et al.
2016-11-17
Photoresist compositions and methods of forming photolithographic patterns
Grant 9,482,945 - Park , et al. November 1, 2
2016-11-01
Photoresist compositions and methods of forming photolithographic patterns
Grant 9,482,948 - Bae , et al. November 1, 2
2016-11-01
Compositions comprising base-reactive component and processes for photolithography
Grant 9,436,082 - Wang , et al. September 6, 2
2016-09-06
Neutral layer polymers, methods of manufacture thereof and articles comprising the same
Grant 9,382,444 - Trefonas, III , et al. July 5, 2
2016-07-05
Display Device Manufacture
App 20160133864 - Kim; Young Seok ;   et al.
2016-05-12
Topcoat Compositions And Photolithographic Methods
App 20160130462 - LIU; Cong ;   et al.
2016-05-12
Photoresist Compositions And Methods Of Forming Photolithographic Patterns
App 20160109800 - BAE; Young Cheol ;   et al.
2016-04-21
Photoresist Compositions And Methods Of Forming Photolithographic Patterns
App 20160103393 - PARK; Jong Keun ;   et al.
2016-04-14
Hardmask
Grant 9,296,879 - Yamada , et al. March 29, 2
2016-03-29
Compositions Comprising Sulfonamide Material And Processes For Photolithography
App 20160070172 - Wang; Deyan ;   et al.
2016-03-10
Polyarylene Materials
App 20160060393 - GILMORE; Christopher D. ;   et al.
2016-03-03
Compositions and processes for photolithography
Grant 9,274,427 - Wang , et al. March 1, 2
2016-03-01
Hardmask
App 20160048077 - YAMADA; Shintaro ;   et al.
2016-02-18
Compositions and processes for immersion lithography
Grant 9,244,355 - Caporale , et al. January 26, 2
2016-01-26
Compositions Comprising Carboxy Component And Processes For Photolithography
App 20150378255 - Wang; Deyan ;   et al.
2015-12-31
Photoresist compositions and methods of forming photolithographic patterns
Grant 9,188,864 - Bae , et al. November 17, 2
2015-11-17
Topcoat Compositions And Photolithographic Methods
App 20150323869 - Liu; Cong ;   et al.
2015-11-12
Hardmask surface treatment
Grant 9,171,720 - Wang , et al. October 27, 2
2015-10-27
Metal Hardmask Compositions
App 20150291829 - Wang; Deyan ;   et al.
2015-10-15
Base reactive photoacid generators and photoresists comprising same
Grant 9,156,785 - Aqad , et al. October 13, 2
2015-10-13
Photoresist compositions and methods of forming photolithographic patterns
Grant 9,158,198 - Park , et al. October 13, 2
2015-10-13
Hardmask surface treatment
Grant 9,136,123 - Wang , et al. September 15, 2
2015-09-15
Methods and compositions for removal of metal hardmasks
Grant 9,102,901 - Wang , et al. August 11, 2
2015-08-11
Metal hardmask compositions
Grant 9,070,548 - Wang , et al. June 30, 2
2015-06-30
Topcoat compositions and photolithographic methods
Grant 9,063,425 - Wang June 23, 2
2015-06-23
Photoresist and coated substrate comprising same
Grant 9,012,128 - Wang , et al. April 21, 2
2015-04-21
Compositions comprising sulfonamide material and processes for photolithography
Grant 9,005,880 - Wang , et al. April 14, 2
2015-04-14
Compositions comprising carboxy component and processes for photolithography
Grant 8,975,006 - Wang , et al. March 10, 2
2015-03-10
Hardmask
App 20150064612 - YAMADA; Shintaro ;   et al.
2015-03-05
Compositions And Processes For Immersion Lithography
App 20150044609 - Wang; Deyan ;   et al.
2015-02-12
Organometal Materials And Process
App 20150024522 - WANG; Deyan ;   et al.
2015-01-22
Organoaluminum Materials For Forming Aluminum Oxide Layer From Coating Composition That Contains Organic Solvent
App 20150024607 - WANG; Deyan ;   et al.
2015-01-22
Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent
Grant 8,927,439 - Wang , et al. January 6, 2
2015-01-06
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same
App 20140378592 - Trefonas, III; Peter ;   et al.
2014-12-25
Orientation Control Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same
App 20140377518 - Trefonas, III; Peter ;   et al.
2014-12-25
Neutral Layer Polymers, Methods Of Manufacture Thereof And Articles Comprising The Same
App 20140377465 - Trefonas, III; Peter ;   et al.
2014-12-25
Compositions and processes for photolithography
Grant 8,883,400 - Wang , et al. November 11, 2
2014-11-11
Compositions And Processes For Immersion Lithography
App 20140322648 - Wang; Deyan
2014-10-30
Compositions and processes for immersion lithography
Grant 8,871,428 - Wang , et al. October 28, 2
2014-10-28
Compositions And Processes For Photolithography
App 20140295348 - WANG; Deyan ;   et al.
2014-10-02
Compositions and processes for photolithography
Grant 8,808,967 - Wang , et al. August 19, 2
2014-08-19
Hardmask
Grant 8,795,774 - Wang , et al. August 5, 2
2014-08-05
Hardmask Surface Treatment
App 20140202632 - WANG; Deyan ;   et al.
2014-07-24
Hardmask Surface Treatment
App 20140206201 - WANG; Deyan ;   et al.
2014-07-24
Methods And Compositions For Removal Of Metal Hardmasks
App 20140179582 - Wang; Deyan ;   et al.
2014-06-26
Compositions and processes for photolithography
Grant 8,748,080 - Wang , et al. June 10, 2
2014-06-10
Surface active additive and photoresist composition comprising same
Grant 8,722,825 - Wang , et al. May 13, 2
2014-05-13
Compositions and processes for immersion lithography
Grant 8,715,902 - Wang May 6, 2
2014-05-06
Hardmask
App 20140087066 - WANG; Deyan ;   et al.
2014-03-27
Photoresist And Coated Substrate Comprising Same
App 20140065540 - Wang; Deyan ;   et al.
2014-03-06
Photoresist Compositions And Methods Of Forming Photolithographic Patterns
App 20140038102 - PARK; Jong Keun ;   et al.
2014-02-06
Metal Hardmask Compositions
App 20130337179 - Wang; Deyan ;   et al.
2013-12-19
Leveler compounds
Grant 8,506,788 - Wang , et al. August 13, 2
2013-08-13
Surface Active Additive And Photoresist Composition Comprising Same
App 20130137035 - Wang; Deyan ;   et al.
2013-05-30
Topcoat Compositions And Photolithographic Methods
App 20130115553 - Wang; Deyan
2013-05-09
Compositions And Processes For Immersion Lithography
App 20130065178 - WANG; Deyan ;   et al.
2013-03-14
Compositions And Processes For Photolithography
App 20130017487 - Wang; Deyan ;   et al.
2013-01-17
Leveler Compounds
App 20130001088 - Wang; Deyan ;   et al.
2013-01-03
Compositions And Processes For Photolithography
App 20120264053 - WANG; Deyan
2012-10-18
Leveler compounds
Grant 8,262,891 - Wang , et al. September 11, 2
2012-09-11
Compositions And Processes For Photolithography
App 20120225384 - Wang; Deyan ;   et al.
2012-09-06
Compositons and processes for immersion lithography
Grant 8,257,902 - Wang , et al. September 4, 2
2012-09-04
Compositions and processes for photolithography
Grant 8,241,832 - Wang , et al. August 14, 2
2012-08-14
Compositions Comprising Base-reactive Component And Processes For Photolithography
App 20120171626 - WANG; Deyan ;   et al.
2012-07-05
Compositions Comprising Sugar Component And Processes For Photolithography
App 20120156595 - OH; Joon-Seok ;   et al.
2012-06-21
Base Reactive Photoacid Generators And Photoresists Comprising Same
App 20120129108 - AQAD; Emad ;   et al.
2012-05-24
Compositions Comprising Base-reactive Component And Processes For Photolithography
App 20120122030 - WANG; Deyan ;   et al.
2012-05-17
Compositions and processes for photolithography
Grant 8,158,325 - Wang , et al. April 17, 2
2012-04-17
Photoresist Compositions And Methods Of Forming Photolithographic Patterns
App 20110294069 - Bae; Young Cheol ;   et al.
2011-12-01
Compositions And Processes For Immersion Lithography
App 20110255069 - WANG; Deyan
2011-10-20
Compositions Comprising Base-reactive Component And Processes For Photolithography
App 20110255061 - Wang; Deyan ;   et al.
2011-10-20
Compositions and processes for photolithography
Grant 8,012,666 - Gallagher , et al. September 6, 2
2011-09-06
Compositions and processes for immersion lithography
Grant 7,968,268 - Wang June 28, 2
2011-06-28
Coating Compositions For Photoresists
App 20110143281 - WANG; Deyan ;   et al.
2011-06-16
Compositions and processes for photolithography
Grant 7,955,778 - Gallagher , et al. June 7, 2
2011-06-07
Processes For Photolithography
App 20110003257 - Wang; Deyan ;   et al.
2011-01-06
Compositions and processes for photolithography
App 20100304290 - Wang; Deyan ;   et al.
2010-12-02
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
App 20100297549 - Wang; Deyan ;   et al.
2010-11-25
Compositions comprising sulfonamide material and processes for photolithography
App 20100297550 - Wang; Deyan ;   et al.
2010-11-25
Coating compositions for photoresists
Grant 7,776,506 - Wang , et al. August 17, 2
2010-08-17
Compositions and processes for photolithography
App 20100183976 - Wang; Deyan ;   et al.
2010-07-22
Compositions and processes for photolithography
App 20100183977 - Wang; Deyan ;   et al.
2010-07-22
Compositions comprising carboxy component and processes for photolithography
App 20100173245 - Wang; Deyan ;   et al.
2010-07-08
Leveler compounds
Grant 7,662,981 - Wang , et al. February 16, 2
2010-02-16
Compositions and processes for photolithography
App 20090233224 - Gallagher; Michael K. ;   et al.
2009-09-17
Leveler compounds
App 20090139873 - Wang; Deyan ;   et al.
2009-06-04
Compositions and processes for immersion lithography
App 20090130592 - Wang; Deyan
2009-05-21
Compositions and processes for immersion lithography
App 20090123869 - Wang; Deyan
2009-05-14
Compositons and processes for immersion lithography
App 20090117489 - Wang; Deyan ;   et al.
2009-05-07
Leveler compounds
Grant 7,510,639 - Wang , et al. March 31, 2
2009-03-31
Compositions and processes for immersion lithography
App 20080193872 - Caporale; Stefan J. ;   et al.
2008-08-14
Compositions and processes for photolithography
App 20070212646 - Gallagher; Michael K. ;   et al.
2007-09-13
Coating compositions for photoresists
App 20070160930 - Wang; Deyan ;   et al.
2007-07-12
Leveler compounds
App 20070084732 - Wang; Deyan ;   et al.
2007-04-19
Compositions and processes for photolithography
App 20070087286 - Wang; Deyan ;   et al.
2007-04-19
Compositions and processes for immersion lithography
App 20060246373 - Wang; Deyan
2006-11-02
Leveler compounds
Grant 7,128,822 - Wang , et al. October 31, 2
2006-10-31
Leveler compounds
App 20060016693 - Wang; Deyan ;   et al.
2006-01-26
Plating method
App 20050020068 - Wang, Deyan ;   et al.
2005-01-27
Leveler compounds
App 20040249177 - Wang, Deyan ;   et al.
2004-12-09
Electroplating composition
App 20040222104 - Wang, Deyan ;   et al.
2004-11-11
Electroplating bath
App 20040217009 - Mikkola, Robert D. ;   et al.
2004-11-04

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