Wang; Daimian

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Daimian.The latest application filed is for "substrate measurement recipe configuration to improve device matching".

Company Profile

4.12.11

Wang; Daimian - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Automatic selection of metrology target measurement recipes Grant 10,782,616 - Wang , et al. Sept	2020-09-22
Substrate measurement recipe configuration to improve device matching Grant 10,691,029 - Gu , et al.	2020-06-23
Substrate Measurement Recipe Configuration To Improve Device Matching App 20190250519 - GU; Ning ; et al.	2019-08-15
Automatic Selection Of Metrology Target Measurement Recipes App 20190204750 - WANG; Daimian ; et al.	2019-07-04
Source multiplexing illumination for mask inspection Grant 9,625,810 - Wang , et al. April 18, 2	2017-04-18
Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems Grant 9,453,801 - Wang , et al. September 27, 2	2016-09-27
Spectral purity filter and light monitor for an EUV reticle inspection system Grant 9,348,214 - Wang , et al. May 24, 2	2016-05-24
Phase grating for mask inspection system Grant 9,151,881 - Wang , et al. October 6, 2	2015-10-06
Illumination system with time multiplexed sources for reticle inspection Grant 9,151,718 - Wang , et al. October 6, 2	2015-10-06
Multiplexing EUV sources in reticle inspection Grant 8,917,432 - Wack , et al. December 23, 2	2014-12-23
EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating Grant 8,916,831 - Wang December 23, 2	2014-12-23
Spectral Purity Filter And Light Monitor For An Euv Actinic Reticle Inspection System App 20140217298 - Wang; Daimian ; et al.	2014-08-07
Methods Of Using Polished Silicon Wafer Strips For Euv Homogenizer App 20140151580 - Wang; Daimian ; et al.	2014-06-05
Phase Grating For Mask Inspection System App 20140131586 - Wang; Daimian ; et al.	2014-05-15
Multiplexing Euv Sources In Reticle Inspection App 20140036333 - Wack; Daniel ; et al.	2014-02-06
Photoemission Monitoring Of Euv Mirror And Mask Surface Contamination In Actinic Euv Systems App 20130313442 - Wang; Li ; et al.	2013-11-28
Illumination System with Time Multiplexed Sources for Reticle Inspection App 20130242295 - Wang; Daimian ; et al.	2013-09-19
Euv Actinic Reticle Inspection System Using Imaging Sensor With Thin Film Spectral Purity Filter Coating App 20120235049 - Wang; Daimian	2012-09-20
Source Multiplexing Illumination For Mask Inspection App 20120236281 - Wang; Daimian ; et al.	2012-09-20

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