loadpatents
name:-0.013468980789185
name:-0.00642991065979
name:-0.0007319450378418
Wang; Chun-Ta Patent Filings

Wang; Chun-Ta

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Chun-Ta.The latest application filed is for "switchable grating and application thereof".

Company Profile
0.6.11
  • Wang; Chun-Ta - Kaohsiung TW
  • WANG; CHUN-TA - Kaohsiung City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Polishing pad, polishing apparatus and method for manufacturing polishing pad
Grant 10,022,836 - Feng , et al. July 17, 2
2018-07-17
Silicon based terahertz full wave liquid crystal phase shifter
Grant 9,835,924 - Lee , et al. December 5, 2
2017-12-05
Switchable Grating And Application Thereof
App 20160187679 - LIN; Tsung-Hsien ;   et al.
2016-06-30
Polishing Pad, Polishing Apparatus And Method For Manufacturing Polishing Pad
App 20160082568 - FENG; CHUNG-CHIH ;   et al.
2016-03-24
Polishing Pad, Polishing Apparatus And Method For Manufacturing Polishing Pad
App 20150202732 - FENG; CHUNG-CHIH ;   et al.
2015-07-23
Sheet for mounting a workpiece and method for making the same
Grant 9,044,840 - Feng , et al. June 2, 2
2015-06-02
Polishing Pad And Method For Making The Same
App 20130040543 - FENG; CHUNG-CHIH ;   et al.
2013-02-14
Conductive polishing pad and method for making the same
Grant 8,343,586 - Feng , et al. January 1, 2
2013-01-01
Sheet For Mounting A Workpiece And Method For Making The Same
App 20120094584 - FENG; CHUNG-CHIH ;   et al.
2012-04-19
Polishing Pad And Method For Making The Same
App 20110177305 - FENG; Chung-Chih ;   et al.
2011-07-21
Polishing Pad Having Insulation Layer And Method For Making The Same
App 20100146863 - Feng; Chung-Chih ;   et al.
2010-06-17
Conductive Polishing Pad And Method For Making The Same
App 20100119811 - Feng; Chung-Chih ;   et al.
2010-05-13
Polishing pad having groove structure for avoiding stripping of a polishing surface of the polishing pad
Grant 7,662,028 - Feng , et al. February 16, 2
2010-02-16
Method For Patterning A Covering Material By Using High-power Exciting Beam
App 20090258316 - FENG; Chung-Chih ;   et al.
2009-10-15
Polishing Pad Having Groove Structure For Avoiding The Polishing Surface Stripping
App 20090258587 - Feng; Chung-Chih ;   et al.
2009-10-15
Polishing Pad And Method For Making The Same
App 20090258578 - Feng; Chung-Chih ;   et al.
2009-10-15

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