| Patent | Date |
|---|
Semiconductor devices, FinFET devices and methods of forming the same
Grant 9,876,083 - Chi , et al. January 23, 2 | 2018-01-23 |
Semiconductor Devices, Finfet Devices And Methods Of Forming The Same
App 20170222000 - Chi; Liang-Chen ; et al. | 2017-08-03 |
Semiconductor structure with interfacial layer and method for manufacturing the same
Grant 9,595,593 - Lee , et al. March 14, 2 | 2017-03-14 |
Epitaxial growth of doped film for source and drain regions
Grant 9,583,393 - Tsai , et al. February 28, 2 | 2017-02-28 |
Semiconductor Structure With Interfacial Layer And Method For Manufacturing The Same
App 20160380069 - LEE; Wei-Fan ; et al. | 2016-12-29 |
Epitaxial Growth of Doped Film for Source and Drain Regions
App 20160284597 - Tsai; Chun Hsiung ; et al. | 2016-09-29 |
Epitaxial growth of doped film for source and drain regions
Grant 9,362,175 - Tsai , et al. June 7, 2 | 2016-06-07 |
Method for forming gate dielectric layer
Grant 9,312,138 - Chi , et al. April 12, 2 | 2016-04-12 |
Method of forming semiconductor device
Grant 9,306,024 - Chi , et al. April 5, 2 | 2016-04-05 |
In-situ nitridation of gate dielectric for semiconductor devices
Grant 9,196,718 - Chi , et al. November 24, 2 | 2015-11-24 |
Method For Forming Gate Dielectric Layer
App 20150287605 - CHI; Liang-Chen ; et al. | 2015-10-08 |
Semiconductor Device And Formation Thereof
App 20150214321 - Chi; Liang-Chen ; et al. | 2015-07-30 |
Mechanisms for forming gate dielectric layer
Grant 9,064,865 - Chi , et al. June 23, 2 | 2015-06-23 |
Mechanisms For Forming Gate Dielectric Layer
App 20150102431 - CHI; Liang-Chen ; et al. | 2015-04-16 |
Method of forming dielectric films using a plurality of oxidation gases
Grant 8,946,036 - Chi , et al. February 3, 2 | 2015-02-03 |
Epitaxial Growth Of Doped Film For Source And Drain Regions
App 20150017776 - Tsai; Chun Hsiung ; et al. | 2015-01-15 |
Epitaxial growth of doped film for source and drain regions
Grant 8,877,592 - Tsai , et al. November 4, 2 | 2014-11-04 |
Epitaxial Growth Of Doped Film For Source And Drain Regions
App 20140273379 - Tsai; Chun Hsiung ; et al. | 2014-09-18 |
In-situ Nitridation Of Gate Dielectric For Semiconductor Devices
App 20140231931 - Chi; Liang-Chen ; et al. | 2014-08-21 |
Method Of Forming Dielectric Films Using A Plurality Of Oxidation Gases
App 20140162425 - Chi; Liang-Chen ; et al. | 2014-06-12 |
Substrate backside peeling control
Grant 8,729,645 - Chi , et al. May 20, 2 | 2014-05-20 |
Substrate Backside Peeling Control
App 20140061822 - Chi; Liang-Chen ; et al. | 2014-03-06 |
Method and system for providing a selection of golden tools for better defect density and product yield
Grant 8,041,440 - Cheng , et al. October 18, 2 | 2011-10-18 |
Method and System for Providing a Selection of Golden Tools for Better Defect Density and Product Yield
App 20080021585 - Cheng; Chang Yung ; et al. | 2008-01-24 |
Integration of spin-on gap filling dielectric with W-plug without outgassing
Grant 5,849,637 - Wang December 15, 1 | 1998-12-15 |
Optimized planarization process for SOG filled vias
Grant 5,792,705 - Wang , et al. August 11, 1 | 1998-08-11 |
Method for forming a low capacitance dielectric layer
Grant 5,728,631 - Wang March 17, 1 | 1998-03-17 |
method of forming inter-metal-dielectric structure
Grant 5,679,606 - Wang , et al. October 21, 1 | 1997-10-21 |
Method for minimizing peeling at the surface of spin-on glasses
Grant 5,567,658 - Wang , et al. October 22, 1 | 1996-10-22 |
Planarization and etch back process for semiconductor layers
Grant 5,552,346 - Huang , et al. September 3, 1 | 1996-09-03 |
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