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Patent applications and USPTO patent grants for Wang; Che Wei.The latest application filed is for "composition and process for electively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten".
Patent | Date |
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Composition And Process For Electively Etching A Hard Mask And/or An Etch-stop Layer In The Presence Of Layers Of Low-k Materials, Copper, Cobalt And/or Tungsten App 20220220421 - Hoogboom; Joannes Theodorus Valentinus ;   et al. | 2022-07-14 |
Composition And Process For Selectively Etching A Layer Comprising An Aluminium Compound In The Presence Of Layers Of Low-k Materials, Copper And/or Cobalt App 20200339523 - HOOGBOOM; Joannes Theodorus Valentinus ;   et al. | 2020-10-29 |
Lamp Grant 8,628,221 - Wang , et al. January 14, 2 | 2014-01-14 |
Lamp App 20120195046 - WANG; CHE-WEI ;   et al. | 2012-08-02 |
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