loadpatents
Patent applications and USPTO patent grants for Wang; Chang-Gong.The latest application filed is for "multiple vapor sources for vapor deposition".
Patent | Date |
---|---|
Methods of vapor deposition with multiple vapor sources Grant 9,873,942 - Pomarede , et al. January 23, 2 | 2018-01-23 |
Multiple Vapor Sources For Vapor Deposition App 20160097121 - Pomarede; Christophe ;   et al. | 2016-04-07 |
Multiple vapor sources for vapor deposition Grant 9,238,865 - Pomarede , et al. January 19, 2 | 2016-01-19 |
Doping with ALD technology Grant 9,139,906 - Wang , et al. September 22, 2 | 2015-09-22 |
Systems and methods for thin-film deposition of metal oxides using excited nitrogen--oxygen species Grant 8,883,270 - Shero , et al. November 11, 2 | 2014-11-11 |
Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species Grant 8,877,655 - Shero , et al. November 4, 2 | 2014-11-04 |
ALD of metal silicate films Grant 8,563,444 - Wang , et al. October 22, 2 | 2013-10-22 |
Multiple Vapor Sources For Vapor Deposition App 20130203267 - Pomarede; Christophe ;   et al. | 2013-08-08 |
Systems And Methods For Thin-film Deposition Of Metal Oxides Using Excited Nitrogen-oxygen Species App 20110275166 - Shero; Eric J. ;   et al. | 2011-11-10 |
Ald Of Metal Silicate Films App 20110256735 - Wang; Chang-Gong ;   et al. | 2011-10-20 |
ALD of metal silicate films Grant 7,972,977 - Wang , et al. July 5, 2 | 2011-07-05 |
Systems And Methods For Thin-film Deposition Of Metal Oxides Using Excited Nitrogen-oxygen Species App 20110070380 - Shero; Eric ;   et al. | 2011-03-24 |
ALD of metal silicate films Grant 7,795,160 - Wang , et al. September 14, 2 | 2010-09-14 |
Doping With Ald Technology App 20090214767 - Wang; Chang-gong ;   et al. | 2009-08-27 |
Ald Of Metal Silicate Films App 20080085610 - Wang; Chang-Gong ;   et al. | 2008-04-10 |
ALD of metal silicate films App 20080020593 - Wang; Chang-gong ;   et al. | 2008-01-24 |
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