Wampler; Kurt E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wampler; Kurt E..The latest application filed is for "rule-based deployment of assist features".

Company Profile

0.25.23

Wampler; Kurt E. - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Rule-based deployment of assist features Grant 11,022,894 - Hsu , et al. June 1, 2	2021-06-01
Rule-based Deployment Of Assist Features App 20190294053 - HSU; Duan-Fu Stephen ; et al.	2019-09-26
Rule-based deployment of assist features Grant 10,331,039 - Hsu , et al.	2019-06-25
Rule-based Deployment Of Assist Features App 20170329235 - HSU; Duan-Fu Stephen ; et al.	2017-11-16
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 8,039,180 - Laidig , et al. October 18, 2	2011-10-18
CPL mask and a method and program product for generating the same Grant 7,998,355 - Van Den Broeke , et al. August 16, 2	2011-08-16
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,985,515 - Hsu , et al. July 26, 2	2011-07-26
Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning App 20110143268 - Laidig; Thomas ; et al.	2011-06-16
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,892,707 - Laidig , et al. February 22, 2	2011-02-22
Method of two dimensional feature model calibration and optimization Grant 7,820,341 - Laidig , et al. October 26, 2	2010-10-26
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,774,736 - Broeke , et al. August 10, 2	2010-08-10
Method And Apparatus For Performing Model-based Layout Conversion For Use With Dipole Illumination App 20100167183 - HSU; Duan-Fu Stephen ; et al.	2010-07-01
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,666,554 - Hsu , et al. February 23, 2	2010-02-23
Scattering Bar Opc Application Method For Sub-half Wavelength Lithography Patterning Field Of The Invention App 20090233186 - Laidig; Thomas ; et al.	2009-09-17
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography Grant 7,550,235 - Shi , et al. June 23, 2	2009-06-23
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Grant 7,549,140 - Van Den Broeke , et al. June 16, 2	2009-06-16
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,485,396 - Laidig , et al. February 3, 2	2009-02-03
Method for performing full-chip manufacturing reliability checking and correction Grant 7,434,195 - Hsu , et al. October 7, 2	2008-10-07
Scattering bar OPC application method for sub-half wavelength lithography patterning App 20080206656 - Laidig; Thomas ; et al.	2008-08-28
Method, program product and apparatus for generating assist features utilizing an image field map Grant 7,376,930 - Wampler , et al. May 20, 2	2008-05-20
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,354,681 - Laidig , et al. April 8, 2	2008-04-08
CPL mask and a method and program product for generating the same App 20080067143 - Broeke; Douglas Van den ; et al.	2008-03-20
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,247,574 - Broeke , et al. July 24, 2	2007-07-24
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20070162889 - Broeke; Douglas Van Den ; et al.	2007-07-12
Method of two dimensional feature model calibration and optimization App 20070117030 - Laidig; Thomas ; et al.	2007-05-24
Method and apparatus for performing model-based layout conversion for use with dipole illumination App 20070042277 - Hsu; Duan-Fu Stephen ; et al.	2007-02-22
Method of two dimensional feature model calibration and optimization Grant 7,175,940 - Laidig , et al. February 13, 2	2007-02-13
Method and apparatus for performing model-based layout conversion for use with dipole illumination Grant 7,138,212 - Hsu , et al. November 21, 2	2006-11-21
Method for performing full-chip manufacturing reliability checking and correction App 20060080633 - Hsu; Michael ; et al.	2006-04-13
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography App 20050142449 - Shi, Xuelong ; et al.	2005-06-30
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography App 20050125765 - Broeke, Doug Van Den ; et al.	2005-06-09
Scattering bar OPC application method for sub-half wavelength lithography patterning App 20050074677 - Laidig, Thomas ; et al.	2005-04-07
Method, program product and apparatus for generating assist features utilizing an image field map App 20050053848 - Wampler, Kurt E. ; et al.	2005-03-10
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Grant 6,851,103 - Van Den Broeke , et al. February 1, 2	2005-02-01
Hybrid phase-shift mask Grant 6,835,510 - Chen , et al. December 28, 2	2004-12-28
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20040209170 - Broeke, Douglas Van Den ; et al.	2004-10-21
Method and apparatus for performing model-based layout conversion for use with dipole illumination App 20040142251 - Hsu, Duan-Fu Stephen ; et al.	2004-07-22
Hybrid phase-shift mask App 20040067423 - Chen, Jang Fung ; et al.	2004-04-08
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography App 20040010770 - Broeke, Doug Van Den ; et al.	2004-01-15
Optical proximity correction method utilizing serifs having variable dimensions Grant 6,670,081 - Laidig , et al. December 30, 2	2003-12-30
Hybrid phase-shift mask Grant 6,623,895 - Chen , et al. September 23, 2	2003-09-23
Method of two dimensional feature model calibration and optimization App 20030082463 - Laidig, Thomas ; et al.	2003-05-01
Method of patterning sub-0.25.lambda. line features with high transmission, "attenuated" phase shift masks Grant 6,482,555 - Chen , et al. November 19, 2	2002-11-19
Method of patterning sub-0.25lambda line features with high transmission, "attenuated" phase shift masks App 20020048708 - Chen, J. Fung ; et al.	2002-04-25
Optical proximity correction method utilizing serifs having variable dimensions App 20020028393 - Laidig, Thomas ; et al.	2002-03-07
Hybrid phase-shift mask App 20020015899 - Chen, Jang Fung ; et al.	2002-02-07
Method of fine feature edge tuning with optically-halftoned mask Grant 6,114,071 - Chen , et al. September 5, 2	2000-09-05
Method for generating proximity correction features for a lithographic mask pattern Grant 5,663,893 - Wampler , et al. September 2, 1	1997-09-02

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