Walsh; Cormac
Patent Applications and Registrations
Patent applications and USPTO patent grants for Walsh; Cormac.The latest application filed is for "apparatus and method for removing a cmp polishing pad from a platen".
- Walsh; Cormac - Sunnyvale CA
| Patent | Date |
|---|---|
| Apparatus and method for removing a CMP polishing pad from a platen Grant 7,125,326 - Walsh , et al. October 24, 2 | 2006-10-24 |
| Apparatus And Method For Removing A Cmp Polishing Pad From A Platen App 20050277368 - Walsh, Cormac ; et al. | 2005-12-15 |
| Slurry distributor for chemical mechanical polishing apparatus and method of using the same App 20050130566 - Kajiwara, Jiro ; et al. | 2005-06-16 |
| Slurry distributor for chemical mechanical polishing apparatus and method of using the same Grant 6,887,132 - Kajiwara , et al. May 3, 2 | 2005-05-03 |
| Method and polishing pad design enabling improved wafer removal from a polishing pad in a CMP process App 20040108063 - Reyes, Alejandro ; et al. | 2004-06-10 |
| Slurry distributor for chemical mechanical polishing apparatus and method of using the same App 20030068959 - Kajiwara, Jiro ; et al. | 2003-04-10 |
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