| Patent | Date |
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Self-topcoating resist for photolithography
Grant 8,945,808 - David , et al. February 3, 2 | 2015-02-03 |
Methods of directed self-assembly and layered structures formed therefrom
Grant 8,821,978 - Cheng , et al. September 2, 2 | 2014-09-02 |
Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
Grant 8,703,386 - Bass , et al. April 22, 2 | 2014-04-22 |
Metal Peroxo Compounds With Organic Co-ligands For Electron Beam, Deep Uv And Extreme Uv Photoresist Applications
App 20130224652 - Bass; John David ; et al. | 2013-08-29 |
Alkaline rinse agents for use in lithographic patterning
Grant 8,298,751 - Hinsberg , et al. October 30, 2 | 2012-10-30 |
Methods Of Directed Self-assembly And Layered Structures Formed Therefrom
App 20110147983 - CHENG; Joy ; et al. | 2011-06-23 |
Alkaline Rinse Agents For Use In Lithographic Patterning
App 20110104900 - Hinsberg; William D. ; et al. | 2011-05-05 |
Immersion topcoat materials with improved performance
Grant 7,855,045 - Allen , et al. December 21, 2 | 2010-12-21 |
Method for patterning a low activation energy photoresist
Grant 7,820,369 - Allen , et al. October 26, 2 | 2010-10-26 |
Photoresists for visible light imaging
Grant 7,807,340 - Breyta , et al. October 5, 2 | 2010-10-05 |
Discrete nano-textured structures in biomolecular arrays, and method of use
Grant 7,651,872 - Hart , et al. January 26, 2 | 2010-01-26 |
Bilayer film including an underlayer having vertical acid transport properties
Grant 7,585,609 - Larson , et al. September 8, 2 | 2009-09-08 |
Photoresists for Visible Light Imaging
App 20080166669 - Breyta; Gregory ; et al. | 2008-07-10 |
Discrete Nano-textured Structures In Biomolecular Arrays, And Method Of Use
App 20080132426 - Hart; Mark Whitney ; et al. | 2008-06-05 |
Photoresists for visible light imaging
Grant 7,354,692 - Breyta , et al. April 8, 2 | 2008-04-08 |
Discrete nano-textured structures in biomolecular arrays, and method of use
Grant 7,354,777 - Hart , et al. April 8, 2 | 2008-04-08 |
Immersion Topcoat Materials With Improved Performance
App 20080026330 - Allen; Robert David ; et al. | 2008-01-31 |
Advanced chemically amplified resist for sub 30 nm dense feature resolution
Grant 7,300,741 - Huang , et al. November 27, 2 | 2007-11-27 |
Self-topcoating Resist For Photolithography
App 20070254235 - ALLEN; ROBERT DAVID ; et al. | 2007-11-01 |
Immersion topcoat materials with improved performance
Grant 7,288,362 - Allen , et al. October 30, 2 | 2007-10-30 |
Advanced Chemically Amplified Resist For Sub 30nm Dense Feature Resolution
App 20070248908 - Huang; Wu-Song S. ; et al. | 2007-10-25 |
Low activation energy photoresists
Grant 7,193,023 - Allen , et al. March 20, 2 | 2007-03-20 |
Method for employing vertical acid transport for lithographic imaging applications
Grant 7,160,665 - Larson , et al. January 9, 2 | 2007-01-09 |
Method for employing vertical acid transport for lithographic imaging applications
App 20060257786 - Larson; Carl Eric ; et al. | 2006-11-16 |
Photoresists for visible light imaging
App 20060251989 - Breyta; Gregory ; et al. | 2006-11-09 |
Immersion topcoat materials with improved performance
App 20060188804 - Allen; Robert David ; et al. | 2006-08-24 |
Direct photo-patterning of nanoporous organosilicates, and method of use
Grant 7,056,840 - Miller , et al. June 6, 2 | 2006-06-06 |
Discrete nano-textured structures in biomolecular arrays, and method of use
App 20050255707 - Hart, Mark Whitney ; et al. | 2005-11-17 |
Discrete nano-textured structures in biomolecular arrays, and method of use
Grant 6,962,822 - Hart , et al. November 8, 2 | 2005-11-08 |
Low activation energy photoresists
App 20050124774 - Allen, Robert David ; et al. | 2005-06-09 |
Method for patterning a low activation energy photoresist
App 20050123852 - Allen, Robert David ; et al. | 2005-06-09 |
Direct photo-patterning of nanoporous organosilicates, and method of use
App 20050070124 - Miller, Robert Dennis ; et al. | 2005-03-31 |
Method for employing vertical acid transport for lithographic imaging applications
App 20040126715 - Larson, Carl Eric ; et al. | 2004-07-01 |
Lithographic photoresist composition and process for its use
Grant 6,730,452 - Brock , et al. May 4, 2 | 2004-05-04 |
Discrete nano-textured structures in biomolecular arrays, and method of use
App 20040029303 - Hart, Mark Whitney ; et al. | 2004-02-12 |
High silicon content monomers and polymers suitable for 193 nm bilayer resists
Grant 6,653,048 - Brock , et al. November 25, 2 | 2003-11-25 |
Process for using bilayer photoresist
Grant RE38,282 - Allen , et al. October 21, 2 | 2003-10-21 |
Organic light emitting displays and new fluorescent compounds
Grant 6,627,111 - Swanson , et al. September 30, 2 | 2003-09-30 |
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
Grant 6,610,456 - Allen , et al. August 26, 2 | 2003-08-26 |
Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions
Grant 6,548,219 - Ito , et al. April 15, 2 | 2003-04-15 |
Norbornene fluoroacrylate copolymers and process for the use thereof
Grant 6,509,134 - Ito , et al. January 21, 2 | 2003-01-21 |
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
App 20020164538 - Allen, Robert David ; et al. | 2002-11-07 |
Norbornene fluoroacrylate copolymers and process for use thereof
App 20020146638 - Ito, Hiroshi ; et al. | 2002-10-10 |
Lithographic photoresist composition and process for its use
App 20020146639 - Brock, Phillip Joe ; et al. | 2002-10-10 |
Organic light emitting displays and new fluorescent compounds
App 20020127428 - Swanson, Sally Ann ; et al. | 2002-09-12 |
High silicon content monomers and polymers suitable for 193 nm bilayer resists
App 20020127490 - Brock, Phillip Joe ; et al. | 2002-09-12 |
High silicon content monomers and polymers suitable for 193 nm bilayer resists
Grant 6,444,408 - Brock , et al. September 3, 2 | 2002-09-03 |
Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions
App 20020102490 - Ito, Hiroshi ; et al. | 2002-08-01 |
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits
Grant 6,165,678 - Allen , et al. December 26, 2 | 2000-12-26 |
Process for using bilayer photoresist
Grant 5,985,524 - Allen , et al. November 16, 1 | 1999-11-16 |
Process for use of photoresist composition with deep ultraviolet radiation
Grant 5,786,131 - Allen , et al. July 28, 1 | 1998-07-28 |
Process for generating negative tone resist images utilizing carbon dioxide critical fluid
Grant 5,665,527 - Allen , et al. September 9, 1 | 1997-09-09 |
Process for synthesizing chemical compounds
Grant 5,658,734 - Brock , et al. August 19, 1 | 1997-08-19 |
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