Wallow; Thomas

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wallow; Thomas.The latest application filed is for "method for determining suitability of a resist in semiconductor wafer fabrication".

Company Profile

0.15.10

Wallow; Thomas - San Carlos CA
Wallow; Thomas - Union City CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis Grant 8,852,854 - Wallow , et al. October 7, 2	2014-10-07
Method for producing a high resolution resist pattern on a semiconductor wafer Grant 8,715,912 - Okoroanyanwu , et al. May 6, 2	2014-05-06
Method for forming a high resolution resist pattern on a semiconductor wafer Grant 8,586,269 - Okoroanyanwu , et al. November 19, 2	2013-11-19
Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processing Grant 8,067,252 - Ma , et al. November 29, 2	2011-11-29
Method for determining suitability of a resist in semiconductor wafer fabrication Grant 7,858,276 - Wallow , et al. December 28, 2	2010-12-28
EUV pellicle with increased EUV light transmittance Grant 7,723,704 - Wood, II , et al. May 25, 2	2010-05-25
EUV debris mitigation filter and method for fabricating semiconductor dies using same Grant 7,663,127 - Wood, II , et al. February 16, 2	2010-02-16
Methods for enhancing resolution of a chemically amplified photoresist Grant 7,504,198 - LaFontaine , et al. March 17, 2	2009-03-17
Method for determining suitability of a resist in semiconductor wafer fabrication App 20090011524 - Wallow; Thomas ; et al.	2009-01-08
Method for producing a high resolution resist pattern on a semiconductor wafer App 20080292996 - Okoroanyanwu; Uzodinma ; et al.	2008-11-27
Method for forming a high resolution resist pattern on a semiconductor wafer App 20080233494 - Okoroanyanwu; Uzodinma ; et al.	2008-09-25
EUV debris mitigation filter and method for fabricating semiconductor dies using same App 20080225245 - Wood; Obert Reeves ; et al.	2008-09-18
Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis App 20080199813 - Wallow; Thomas ; et al.	2008-08-21
Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processing App 20080194046 - Ma; Yuansheng ; et al.	2008-08-14
EUV pellicle with increased EUV light transmittance App 20080113491 - Wood; Obert Reeves ; et al.	2008-05-15
Methods for enhancing resolution of a chemically amplified photoresist App 20070275321 - LaFontaine; Bruno ; et al.	2007-11-29
Modified polycyclic polymers Grant 6,794,459 - Jayaraman , et al. September 21, 2	2004-09-21
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Grant 6,723,486 - Goodall , et al. April 20, 2	2004-04-20
Modified polycyclic polymers App 20030018153 - Jayaraman, Saikumar ; et al.	2003-01-23
Modified polycyclic polymers Grant 6,451,945 - Jayaraman , et al. September 17, 2	2002-09-17
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups App 20020128408 - Goodall, Brian L. ; et al.	2002-09-12
Polycyclic resist compositions with increased etch resistance Grant 6,147,177 - Jayaraman , et al. November 14, 2	2000-11-14

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.