Walde; Hendrik V.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Walde; Hendrik V..The latest application filed is for "methods and apparatus for sputtering using direct current".

Company Profile

0.7.6

Walde; Hendrik V. - Fort Collins CO US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods and apparatus for sputtering using direct current Grant 9,150,960 - Nauman , et al. October 6, 2	2015-10-06
Sensor array for measuring plasma characteristics in plasma processing environments Grant 8,545,669 - Mahoney , et al. October 1, 2	2013-10-01
Methods And Apparatus For Sputtering Using Direct Current App 20120171390 - Nauman; Ken ; et al.	2012-07-05
Methods and apparatus for sputtering deposition using direct current Grant 8,133,359 - Nauman , et al. March 13, 2	2012-03-13
Protection method, system and apparatus for a power converter Grant 7,791,912 - Walde September 7, 2	2010-09-07
Protection Method, System and Apparatus for a Power Converter App 20090273954 - Walde; Hendrik V.	2009-11-05
Methods And Apparatus For Sputtering Deposition Using Direct Current App 20090127101 - Nauman; Ken ; et al.	2009-05-21
Sensor array for measuring plasma characteristics in plasma processing environments App 20050151544 - Mahoney, Leonard J. ; et al.	2005-07-14
Sensor array for measuring plasma characteristics in plasma processing environments Grant 6,902,646 - Mahoney , et al. June 7, 2	2005-06-07
Sensor array for measuring plasma characteristics in plasma processing enviroments App 20050034811 - Mahoney, Leonard J. ; et al.	2005-02-17
Stored energy arc detection and arc reduction circuit App 20040245999 - Walde, Hendrik V. ; et al.	2004-12-09

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