Wack; Daniel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wack; Daniel.The latest application filed is for "methods and systems for semiconductor metrology based on polychromatic soft x-ray diffraction".

Company Profile

2.18.15

Wack; Daniel - Fredericksburg VA
Wack; Daniel - Fredricksburg VA US
Wack; Daniel - Los Altos CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction Grant 11,333,621 - Wack , et al. May 17, 2	2022-05-17
Spectral reflectometry for in-situ process monitoring and control Grant 10,438,825 - Jain , et al. O	2019-10-08
Methods And Systems For Semiconductor Metrology Based On Polychromatic Soft X-Ray Diffraction App 20190017946 - Wack; Daniel ; et al.	2019-01-17
Spectral Reflectometry For In-Situ Process Monitoring And Control App 20180061691 - Jain; Prateek ; et al.	2018-03-01
Particle and chemical control using tunnel flow Grant 9,759,912 - Chilese , et al. September 12, 2	2017-09-12
Source multiplexing illumination for mask inspection Grant 9,625,810 - Wang , et al. April 18, 2	2017-04-18
Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation Grant 9,335,637 - Delgado , et al. May 10, 2	2016-05-10
Temperature control in EUV reticle inspection tool Grant 9,164,388 - Chilese , et al. October 20, 2	2015-10-20
Phase grating for mask inspection system Grant 9,151,881 - Wang , et al. October 6, 2	2015-10-06
Multiplexing EUV sources in reticle inspection Grant 8,917,432 - Wack , et al. December 23, 2	2014-12-23
Measuring critical dimensions of a semiconductor structure Grant 8,798,966 - Hench , et al. August 5, 2	2014-08-05
Apparatus and method for synchronizing sample stage motion with a time delay integration charge-couple device in a semiconductor inspection tool Grant 8,772,731 - Subrahmanyan , et al. July 8, 2	2014-07-08
Phase Grating For Mask Inspection System App 20140131586 - Wang; Daimian ; et al.	2014-05-15
Particle And Chemical Control Using Tunnel Flow App 20140085724 - Chilese; Frank ; et al.	2014-03-27
Multiplexing Euv Sources In Reticle Inspection App 20140036333 - Wack; Daniel ; et al.	2014-02-06
Apparatus And Method For Synchronizing Sample Stage Motion With A Time Delay Integration Charge-couple Device In A Semiconductor Inspection Tool App 20130270444 - Subrahmanyan; Pradeep ; et al.	2013-10-17
Temperature Control In Euv Reticle Inspection Tool App 20130265557 - Chilese; Frank ; et al.	2013-10-10
Laser-produced Plasma Euv Source With Reduced Debris Generation App 20130063803 - Delgado; Gildardo ; et al.	2013-03-14
Source Multiplexing Illumination For Mask Inspection App 20120236281 - Wang; Daimian ; et al.	2012-09-20
Time-domain computation of scattering spectra for use in spectroscopic metrology Grant 7,480,047 - Ratner , et al. January 20, 2	2009-01-20
Focus masking structures, focus patterns and measurements thereof App 20070108368 - Mieher; Walter Dean ; et al.	2007-05-17
Focus masking structures, focus patterns and measurements thereof Grant 7,175,945 - Mieher , et al. February 13, 2	2007-02-13
Focus masking structures, focus patterns and measurements thereof App 20050208391 - Mieher, Walter Dean ; et al.	2005-09-22
Focus masking structures, focus patterns and measurements thereof Grant 6,884,552 - Mieher , et al. April 26, 2	2005-04-26
Focus masking structures, focus patterns and measurements thereof App 20030095267 - Mieher, Walter Dean ; et al.	2003-05-22

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