VRTIS; RAYMOND NICHOLAS

Patent Applications and Registrations

Patent applications and USPTO patent grants for VRTIS; RAYMOND NICHOLAS.The latest application filed is for "monoalkoxysilanes and dense organosilica films made therefrom".

Company Profile

15.52.67

VRTIS; RAYMOND NICHOLAS - CARLSBAD CA
Vrtis; Raymond Nicholas - Tempe AZ
Vrtis; Raymond Nicholas - Carefree AZ
Vrtis; Raymond Nicholas - Orefield PA
Vrtis; Raymond Nicholas - Allentown PA
Vrtis, Raymond Nicholas - Allentwon PA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monoalkoxysilanes And Dense Organosilica Films Made Therefrom App 20220301862 - XIAO; MANCHAO ; et al.	2022-09-22
Silicon Compounds And Methods For Depositing Films Using Same App 20220293417 - VRTIS; RAYMOND NICHOLAS ; et al.	2022-09-15
Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features App 20220157601 - Li; Jianheng ; et al.	2022-05-19
Precursors and flowable CVD methods for making low-k films to fill surface features Grant 11,270,880 - Li , et al. March 8, 2	2022-03-08
Silacyclic Compounds And Methods For Depositing Silicon-containing Films Using Same App 20210339280 - Lei; Xinjian ; et al.	2021-11-04
Use of silicon structure former with organic substituted hardening additive compounds for dense OSG films Grant 11,164,739 - Vrtis , et al. November 2, 2	2021-11-02
Silacycloalkane compounds and methods for depositing silicon containing films using same Grant 11,043,374 - Xiao , et al. June 22, 2	2021-06-22
Precursors and flowable CVD methods for making low-K films to fill surface features Grant 11,017,998 - Li , et al. May 25, 2	2021-05-25
Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features App 20210043446 - Li; Jianheng ; et al.	2021-02-11
Alkoxysilacyclic Or Acyloxysilacyclic Compounds And Methods For Depositing Films Using Same App 20200354386 - Ridgeway; Robert Gordon ; et al.	2020-11-12
1-Methyl-1-Iso-Propoxy-Silacycloalkanes And Dense Organosilica Films Made Therefrom App 20200165727 - Entley; William Robert ; et al.	2020-05-28
Silacycloalkane Compounds And Methods For Depositing Silicon Containing Films Using Same App 20200075323 - Xiao; Manchao ; et al.	2020-03-05
Precursors And Flowable CVD Methods For Making Low-K Films To Fill Surface Features App 20200058496 - Li; Jianheng ; et al.	2020-02-20
Silicon Compounds And Methods For Depositing Films Using Same App 20200048286 - Xiao; Manchao ; et al.	2020-02-13
Precursors and flowable CVD methods for making low-K films to fill surface features Grant 10,468,244 - Li , et al. No	2019-11-05
Compositions And Methods Using Same For Deposition Of Silicon-containing Film App 20190292658 - Li; Jianheng ; et al.	2019-09-26
Alkyl-alkoxysilacyclic compounds Grant 10,395,920 - Vrtis , et al. A	2019-08-27
Use of Silicon Structure Former with Organic Substituted Hardening Additive Compounds for Dense OSG Films App 20190244810 - Vrtis; Raymond Nicholas ; et al.	2019-08-08
Method and precursors for manufacturing 3D devices Grant 10,354,860 - Li , et al. July 16, 2	2019-07-16
Barrier materials for display devices Grant 10,319,862 - Ridgeway , et al.	2019-06-11
Silacyclic Compounds and Methods for Depositing Silicon-Containing Films Using Same App 20190134663 - Lei; Xinjian ; et al.	2019-05-09
Use of silyl bridged alkyl compounds for dense OSG films Grant 10,249,489 - Vrtis , et al.	2019-04-02
Compositions And Methods Using Same For Deposition Of Silicon-containing Film App 20190055645 - Li; Jianheng ; et al.	2019-02-21
Compositions and Methods Using Same for Deposition of Silicon-Containing Film App 20190017167 - Vrtis; Raymond Nicholas ; et al.	2019-01-17
Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features App 20180315598 - Li; Jianheng ; et al.	2018-11-01
Compositions and methods using same for deposition of silicon-containing film Grant 10,106,890 - Li , et al. October 23, 2	2018-10-23
Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films App 20180277360 - Li; Jianheng ; et al.	2018-09-27
Alkyl-Alkoxysilacyclic Compounds And Methods For Depositing Films Using Same App 20180233355 - Vrtis; Raymond Nicholas ; et al.	2018-08-16
Composition for treating surface of substrate, method and device Grant 9,976,037 - Inaoka , et al. May 22, 2	2018-05-22
Use Of Silyl Bridged Alkyl Compounds For Dense Osg Films App 20180122632 - Vrtis; Raymond Nicholas ; et al.	2018-05-03
Alkyl-alkoxysilacyclic compounds Grant 9,922,818 - Vrtis , et al. March 20, 2	2018-03-20
Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features App 20180061636 - Li; Jianheng ; et al.	2018-03-01
Process For Depositing Porous Organosilicate Glass Films For Use As Resistive Random Access Memory App 20180047898 - RIDGEWAY; Robert Gordon ; et al.	2018-02-15
Compositions And Methods Using Same For Deposition Of Silicon-containing Film App 20170335449 - LI; Jianheng ; et al.	2017-11-23
Composition for Treating Surface of Substrate, Method and Device App 20160289455 - Inaoka; Seiji ; et al.	2016-10-06
Method And Precursors For Manufacturing 3d Devices App 20160225616 - Li; Jianheng ; et al.	2016-08-04
Method And Composition For Providing Pore Sealing Layer On Porous Low Dielectric Constant Films App 20160049293 - Li; Jianheng ; et al.	2016-02-18
Alkyl-Alkoxysilacyclic Compounds and Methods for Depositing Films Using Same App 20150364321 - Vrtis; Raymond Nicholas ; et al.	2015-12-17
Chemical vapor deposition method Grant 9,212,420 - Lee , et al. December 15, 2	2015-12-15
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 9,061,317 - Vrtis , et al. June 23, 2	2015-06-23
Low K precursors providing superior integration attributes Grant 9,018,107 - Haas , et al. April 28, 2	2015-04-28
Antireflective coatings for photovoltaic applications Grant 8,987,039 - Hurley , et al. March 24, 2	2015-03-24
Methods for using porogens for low k porous organosilica glass films Grant 8,951,342 - Vrtis , et al. February 10, 2	2015-02-10
Barrier Materials For Display Devices App 20150021599 - Ridgeway; Robert Gordon ; et al.	2015-01-22
Compositions And Methods For Making Silicon Containing Films App 20150014823 - Mallikarjunan; Anupama ; et al.	2015-01-15
Materials and Methods of Forming Controlled Void App 20140363950 - Vrtis; Raymond Nicholas ; et al.	2014-12-11
Dielectric barrier deposition using nitrogen containing precursor Grant 8,889,235 - Mallikarjunan , et al. November 18, 2	2014-11-18
Materials and methods of forming controlled void Grant 8,846,522 - Vrtis , et al. September 30, 2	2014-09-30
Low K Precursors Providing Superior Integration Attributes App 20140242813 - Haas; Mary Kathryn ; et al.	2014-08-28
Low k precursors providing superior integration attributes Grant 8,753,986 - Haas , et al. June 17, 2	2014-06-17
Dielectric barrier deposition using oxygen containing precursor Grant 8,637,396 - Matz , et al. January 28, 2	2014-01-28
Silicon Precursors And Compositions Comprising Same For Depositing Low Dielectric Constant Films App 20130260575 - Al-Rashid; Jennifer Elizabeth Antoline ; et al.	2013-10-03
Materials and Methods of Forming Controlled Void App 20130157435 - Vrtis; Raymond Nicholas ; et al.	2013-06-20
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants App 20130095255 - Vrtis; Raymond Nicholas ; et al.	2013-04-18
Materials and methods of forming controlled void Grant 8,399,349 - Vrtis , et al. March 19, 2	2013-03-19
Methods For Using Porogens For Low K Porous Organosilica Glass Films App 20120282415 - Vrtis; Raymond Nicholas ; et al.	2012-11-08
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 8,293,001 - Vrtis , et al. October 23, 2	2012-10-23
Process for restoring dielectric properties Grant 8,283,260 - Weigel , et al. October 9, 2	2012-10-09
Mechanical enhancer additives for low dielectric films Grant 8,137,764 - Vincent , et al. March 20, 2	2012-03-20
Low K Precursors Providing Superior Integration Attributes App 20110308937 - Haas; Mary Kathryn ; et al.	2011-12-22
Adhesion to copper and copper electromigration resistance Grant 8,043,976 - Vrtis , et al. October 25, 2	2011-10-25
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants App 20110143032 - Vrtis; Raymond Nicholas ; et al.	2011-06-16
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 7,943,195 - Vrtis , et al. May 17, 2	2011-05-17
Mechanical enhancement of dense and porous organosilicate materials by UV exposure Grant 7,932,188 - Lukas , et al. April 26, 2	2011-04-26
Dielectric Barrier Deposition Using Nitrogen Containing Precursor App 20100291321 - Mallikarjunan; Anupama ; et al.	2010-11-18
Chemical vapor deposition method App 20100247803 - LEE; Eric M. ; et al.	2010-09-30
Dielectric Barrier Deposition Using Oxygen Containing Precursor App 20100136789 - Matz; Laura M. ; et al.	2010-06-03
Process For Restoring Dielectric Properties App 20100041234 - Weigel; Scott Jeffrey ; et al.	2010-02-18
Adhesion to Copper and Copper Electromigration Resistance App 20090236745 - Vrtis; Raymond Nicholas ; et al.	2009-09-24
Method for removing carbon-containing residues from a substrate Grant 7,581,549 - Johnson , et al. September 1, 2	2009-09-01
Antireflective Coatings For Photovoltaic Applications App 20090095346 - Hurley; Patrick Timothy ; et al.	2009-04-16
Antireflective Coatings App 20090096106 - Vrtis; Raymond Nicholas ; et al.	2009-04-16
Cyclopentene As A Precursor For Carbon-Based Films App 20090087796 - Vrtis; Raymond Nicholas ; et al.	2009-04-02
Activated chemical process for enhancing material properties of dielectric films Grant 7,500,397 - Weigel , et al. March 10, 2	2009-03-10
Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure App 20090054674 - Lukas; Aaron Scott ; et al.	2009-02-26
Non-thermal process for forming porous low dielectric constant films Grant 7,470,454 - Lukas , et al. December 30, 2	2008-12-30
Mechanical enhancement of dense and porous organosilicate materials by UV exposure Grant 7,468,290 - Lukas , et al. December 23, 2	2008-12-23
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants App 20080271640 - Vrtis; Raymond Nicholas ; et al.	2008-11-06
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants App 20080268177 - Vrtis; Raymond Nicholas ; et al.	2008-10-30
Activated Chemical Process for Enhancing Material Properties of Dielectric Films App 20080199977 - Weigel; Scott Jeffrey ; et al.	2008-08-21
Non-thermal process for forming porous low dielectric constant films Grant 7,404,990 - Lukas , et al. July 29, 2	2008-07-29
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 7,384,471 - Vrtis , et al. June 10, 2	2008-06-10
Porous low dielectric constant compositions and methods for making and using same Grant 7,332,445 - Lukas , et al. February 19, 2	2008-02-19
Materials And Methods Of Forming Controlled Void App 20080038934 - VRTIS; RAYMOND NICHOLAS ; et al.	2008-02-14
Curing Dielectric Films Under A Reducing Atmosphere App 20070299239 - Weigel; Scott Jeffrey ; et al.	2007-12-27
Method for removing a residue from a chamber App 20060196525 - Vrtis; Raymond Nicholas ; et al.	2006-09-07
Mechanical enhancement of dense and porous organosilicate materials by UV exposure Grant 7,098,149 - Lukas , et al. August 29, 2	2006-08-29
Low dielectric constant material and method of processing by CVD Grant 7,074,489 - O'Neill , et al. July 11, 2	2006-07-11
Porous low dielectric constant compositions and methods for making and using same App 20060078676 - Lukas; Aaron Scott ; et al.	2006-04-13
Method for removing carbon-containing residues from a substrate App 20060027249 - Johnson; Andrew David ; et al.	2006-02-09
Deposition of titanium amides Grant 6,946,158 - Jahl , et al. September 20, 2	2005-09-20
Cleaning CVD chambers following deposition of porogen-containing materials App 20050161060 - Johnson, Andrew David ; et al.	2005-07-28
Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants Grant 6,846,515 - Vrtis , et al. January 25, 2	2005-01-25
Mechanical enhancer additives for low dielectric films App 20040241463 - Vincent, Jean Louise ; et al.	2004-12-02
Method for enhancing deposition rate of chemical vapor deposition films App 20040197474 - Vrtis, Raymond Nicholas ; et al.	2004-10-07
Mechanical enhancement of dense and porous organosilicate materials by UV exposure App 20040175501 - Lukas, Aaron Scott ; et al.	2004-09-09
Mechanical enhancement of dense and porous organosilicate materials by UV exposure App 20040175957 - Lukas, Aaron Scott ; et al.	2004-09-09
Non-thermal process for forming porous low dielectric constant films App 20040096593 - Lukas, Aaron Scott ; et al.	2004-05-20
Non-thermal process for forming porous low dielectric constant films App 20040096672 - Lukas, Aaron Scott ; et al.	2004-05-20
Low dielectric constant material and method of processing by CVD Grant 6,716,770 - O'Neill , et al. April 6, 2	2004-04-06
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants App 20030232137 - Vrtis, Raymond Nicholas ; et al.	2003-12-18
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants App 20030198742 - Vrtis, Raymond Nicholas ; et al.	2003-10-23
Low dielectric constant material and method of processing by CVD App 20030162034 - O'Neill, Mark Leonard ; et al.	2003-08-28
Deposition of titanium amides Grant 6,602,783 - Jahl , et al. August 5, 2	2003-08-05
Organosilicon precursors for interlayer dielectric films with low dielectric constants Grant 6,583,048 - Vincent , et al. June 24, 2	2003-06-24
Deposition of titanium amides App 20030072883 - Jahl, Matthias J. ; et al.	2003-04-17
Low dielectric constant material and method of processing by CVD App 20030049460 - O'Neill, Mark Leonard ; et al.	2003-03-13
Organosilicon Precursors For Interlayer Dielectric Films With Low Dielectric Constants App 20020142579 - Vincent, Jean Louise ; et al.	2002-10-03
Nonfunctionalized poly(arylene ethers) Grant 5,874,516 - Burgoyne, Jr. , et al. February 23, 1	1999-02-23
Nonfunctionalized poly(arylene ether) dielectrics Grant 5,658,994 - Burgoyne, Jr. , et al. August 19, 1	1997-08-19

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.