Vorsa; Vasil

Patent Applications and Registrations

Patent applications and USPTO patent grants for Vorsa; Vasil.The latest application filed is for "mixed substantially homogenous coatings deposited by ald".

Company Profile

5.6.13

Vorsa; Vasil - Coopersburg PA
Vorsa; Vasil - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma etch-resistant film and a method for its fabrication Grant 11,421,319 - Soininen , et al. August 23, 2	2022-08-23
Mixed Substantially Homogenous Coatings Deposited By Ald App 20220098735 - Pavel; Alexandru C. ; et al.	2022-03-31
Plasma Etch-resistant Film And A Method For Its Fabrication App 20210115555 - SOININEN; Pekka J. ; et al.	2021-04-22
Plasma etch-resistant film and a method for its fabrication Grant 10,961,620 - Soininen , et al. March 30, 2	2021-03-30
Plasma Resistant Multi-Layer Coatings and Related Methods of Preparing Same App 20200131632 - Pavel; Alexandru ; et al.	2020-04-30
A Plasma Etch-resistant Film And A Method For Its Fabrication App 20200080197 - SOININEN; Pekka J. ; et al.	2020-03-12
Plasma Etch Resistant Films, Articles Bearing Plasma Etch Resistant Films and Related Methods App 20140099491 - Ameen; Mohammed ; et al.	2014-04-10
Amino Vinylsilane Precursors for Stressed SiN Films App 20140065844 - Vorsa; Vasil ; et al.	2014-03-06
Amino vinylsilane precursors for stressed SiN films Grant 8,580,993 - Vorsa , et al. November 12, 2	2013-11-12
Plasma Etch Resistant, Highly Oriented Yttria Films, Coated Substrates and Related Methods App 20130277332 - Aheem; Mohammed Mahbubul ; et al.	2013-10-24
UV absorption based monitor and control of chloride gas stream Grant 8,431,419 - Bertram, Jr. , et al. April 30, 2	2013-04-30
Plasma Etch Resistant, Highly Oriented Yttria Films, Coated Substrates and Related Methods App 20120103519 - Aheem; Mohammed ; et al.	2012-05-03
Uv Absorption Based Monitor And Control Of Chloride Gas Stream App 20110212546 - Bertram Jr.; Ronald Thomas ; et al.	2011-09-01
Methods For In-situ Chamber Cleaning Process For High Volume Manufacture Of Semiconductor Materials App 20100180913 - Arena; Chantal ; et al.	2010-07-22
Amino Vinylsilane Precursors for Stressed SiN Films App 20100120262 - Vorsa; Vasil ; et al.	2010-05-13
Thermal F2 etch process for cleaning CVD chambers App 20080142046 - Johnson; Andrew David ; et al.	2008-06-19

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