loadpatents
Patent applications and USPTO patent grants for von Bunau; Rudolf.The latest application filed is for "optical arrangement".
Patent | Date |
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Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography Grant 6,784,977 - von Bunau , et al. August 31, 2 | 2004-08-31 |
Optical arrangement Grant 6,781,668 - Schuster , et al. August 24, 2 | 2004-08-24 |
Catadioptric objective comprising two intermediate images Grant 6,600,608 - Shafer , et al. July 29, 2 | 2003-07-29 |
Optical arrangement having improved temperature distribution within an optical element Grant 6,521,877 - Muller-Rissmann , et al. February 18, 2 | 2003-02-18 |
Optical arrangement Grant 6,504,597 - Schuster , et al. January 7, 2 | 2003-01-07 |
Optical arrangement Grant 6,466,382 - Muller-Rissmann , et al. October 15, 2 | 2002-10-15 |
Optical Arrangement App 20020126400 - Muller-Rissmann, Wemer ;   et al. | 2002-09-12 |
Projection exposure system App 20020075466 - Gruner, Toralf ;   et al. | 2002-06-20 |
Optical arrangement App 20010019403 - Schuster, Karl-Heinz ;   et al. | 2001-09-06 |
Optical system App 20010008440 - Hummel, Wolfgang ;   et al. | 2001-07-19 |
Optical arrangement App 20010006412 - Karl-Heinz, Schuster ;   et al. | 2001-07-05 |
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