Von Blanckenhagen; Gisela

Patent Applications and Registrations

Patent applications and USPTO patent grants for Von Blanckenhagen; Gisela.The latest application filed is for "euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror".

Company Profile

0.11.12

Von Blanckenhagen; Gisela - Aalen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multilayer mirror Grant 10,209,411 - Goehnermeier , et al. Feb	2019-02-19
Reflective optical element Grant 10,061,205 - Ehm , et al. August 28, 2	2018-08-28
Reflective optical element and optical system for EUV lithography Grant 9,996,005 - Ehm , et al. June 12, 2	2018-06-12
Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus Grant 9,880,476 - Ehm , et al. January 30, 2	2018-01-30
Euv Multilayer Mirror, Optical System Including A Multilayer Mirror And Method Of Manufacturing A Multilayer Mirror App 20170365371 - HUANG; Qiushi ; et al.	2017-12-21
Mirror for the EUV wavelength range, method for producing such a mirror, and projection exposure apparatus comprising such a mirror Grant 9,696,632 - Huber , et al. July 4, 2	2017-07-04
Reflective Optical Element App 20170160639 - EHM; Dirk Heinrich ; et al.	2017-06-08
Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective Grant 9,494,718 - Muellender , et al. November 15, 2	2016-11-15
Multilayer Mirror App 20160202396 - GOEHNERMEIER; Aksel ; et al.	2016-07-14
EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method Grant 9,229,331 - von Blanckenhagen , et al. January 5, 2	2016-01-05
Mirror for the EUV Wavelength Range, Method for Producing such a Mirror, and Projection Exposure Apparatus Comprising such a Mirror App 20150055108 - Huber; Peter ; et al.	2015-02-26
Method For Producing A Capping Layer Composed Of Silicon Oxide On An Euv Mirror, Euv Mirror, And Euv Lithography Apparatus App 20140211178 - EHM; Dirk Heinrich ; et al.	2014-07-31
Euv Mirror Comprising An Oxynitride Capping Layer Having A Stable Composition, Euv Lithography Apparatus, And Operating Method App 20140211179 - von BLANCKENHAGEN; Gisela ; et al.	2014-07-31
Reflective Optical Element And Optical System For Euv Lithography App 20140199543 - EHM; Dirk Heinrich ; et al.	2014-07-17
Reflective optical element and method for production of such an optical element Grant 8,430,514 - Von Blanckenhagen April 30, 2	2013-04-30
Mirror For The Euv Wavelength Range, Substrate For Such A Mirror, Projection Objective For Microlithography Comprising Such A Mirror Or Such A Substrate, And Projection Exposure Apparatus For Microlithography Comprising Such A Projection Objective App 20130038929 - MUELLENDER; Stephan ; et al.	2013-02-14
Reflective Optical Element And Method For Production Of Such An Optical Element App 20120314281 - Von Blanckenhagen; Gisela	2012-12-13
Reflective Optical Element And Method For Operating An Euv Lithography Apparatus App 20120250144 - EHM; Dirk Heinrich ; et al.	2012-10-04
Reflective optical element and method for production of such an optical element Grant 8,246,182 - Von Blanckenhagen August 21, 2	2012-08-21
Reflective Optical Element And Method For Production Of Such An Optical Element App 20110228234 - VON BLANCKENHAGEN; Gisela	2011-09-22

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