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name:-0.0087778568267822
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Voelkl; Edgar Patent Filings

Voelkl; Edgar

Patent Applications and Registrations

Patent applications and USPTO patent grants for Voelkl; Edgar.The latest application filed is for "two-wavelength spatial-heterodyne holography".

Company Profile
0.7.7
  • Voelkl; Edgar - Austin TX
  • Voelkl; Edgar - Oak Ridge TN
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Two-wavelength spatial-heterodyne holography
Grant 7,312,875 - Hanson , et al. December 25, 2
2007-12-25
Direct-to-digital holography reduction of reference hologram noise and fourier space smearing
Grant 7,068,375 - Voelkl June 27, 2
2006-06-27
Individually addressable cathodes with integrated focusing stack or detectors
Grant 6,917,043 - Thomas , et al. July 12, 2
2005-07-12
Two-wavelength spatial-heterodyne holography
App 20040213462 - Hanson, Gregory R. ;   et al.
2004-10-28
System and method for acquiring and processing complex images
App 20040179738 - Dai, X. Long ;   et al.
2004-09-16
Direct-to-digital holography reduction of reference hologram noise and fourier space smearing
App 20040145745 - Voelkl, Edgar
2004-07-29
Off-axis illumination direct-to-digital holography
Grant 6,747,771 - Thomas , et al. June 8, 2
2004-06-08
System and method for detecting differences between complex images
App 20040057089 - Voelkl, Edgar
2004-03-25
Off-axis illumination direct-to-digital holography
App 20040042057 - Thomas, Clarence E. ;   et al.
2004-03-04
Electron holography microscope
Grant 6,617,580 - Voelkl September 9, 2
2003-09-09
Design for an electron holography microscope
App 20030122075 - Voelkl, Edgar
2003-07-03
Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital e-beam direct write lithography and scanning electron microscopy
App 20030038244 - Thomas, Clarence E. ;   et al.
2003-02-27
Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy
Grant 6,498,349 - Thomas , et al. December 24, 2
2002-12-24
Virtual mask digital electron beam lithography
Grant 5,892,231 - Baylor , et al. April 6, 1
1999-04-06

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