| Patent | Date |
|---|
Lithographic Patterning Device Multichannel Position And Level Gauge
App 20220299893 - VLADIMIRSKY; Yuli ; et al. | 2022-09-22 |
Compact two-sided reticle inspection system
Grant 10,156,527 - Janik , et al. Dec | 2018-12-18 |
Compact Two-Sided Reticle Inspection System
App 20170212057 - JANIK; Stanley G. ; et al. | 2017-07-27 |
Lithographic apparatus and device manufacturing method
Grant 9,594,030 - Vladimirsky , et al. March 14, 2 | 2017-03-14 |
Optical system, inspection system and manufacturing method
Grant 9,411,244 - Ryzhikov , et al. August 9, 2 | 2016-08-09 |
Compact Self-Contained Holographic and Interferometric Apparatus
App 20150085291 - Vladimirsky; Yuli ; et al. | 2015-03-26 |
Lithographic Apparatus And Device Manufacturing Method
App 20140264054 - Vladimirsky; Yuli ; et al. | 2014-09-18 |
Optical System, Inspection System And Manufacturing Method
App 20140098356 - RYZHIKOV; Lev ; et al. | 2014-04-10 |
Optical system, inspection system and manufacturing method
Grant 8,692,977 - Ryzhikov , et al. April 8, 2 | 2014-04-08 |
Diffraction elements for alignment targets
Grant 8,681,313 - Vladimirsky , et al. March 25, 2 | 2014-03-25 |
Particle detection on an object surface
Grant 8,634,054 - Vladimirsky , et al. January 21, 2 | 2014-01-21 |
Thin film continuous spatially modulated grey attenuators and filters
Grant 8,558,988 - Vladimirsky , et al. October 15, 2 | 2013-10-15 |
Surface Inspection System with Advanced Illumination
App 20120086800 - VLADIMIRSKY; Yuli ; et al. | 2012-04-12 |
Object Inspection Systems and Methods
App 20120081684 - Den Oef; Arie Jeffrey ; et al. | 2012-04-05 |
Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window
App 20110317136 - Ryzhikov; Lev ; et al. | 2011-12-29 |
Optical System, Inspection System And Manufacturing Method
App 20110279805 - Ryzhikov; Lev ; et al. | 2011-11-17 |
Diffraction Elements for Alignment Targets
App 20110019173 - Vladimirsky; Yuli ; et al. | 2011-01-27 |
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
Grant 7,859,735 - Cebuhar , et al. December 28, 2 | 2010-12-28 |
Optical system for transforming numerical aperture
Grant 7,859,756 - Ryzhikov , et al. December 28, 2 | 2010-12-28 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,773,199 - Bleeker , et al. August 10, 2 | 2010-08-10 |
Method and system for wavefront measurements of an optical system
Grant 7,768,653 - Latypov , et al. August 3, 2 | 2010-08-03 |
Particle Detection on an Object Surface
App 20100045955 - VLADIMIRSKY; Yuli ; et al. | 2010-02-25 |
Systems and Methods for Minimizing Scattered Light in Multi-SLM Maskless Lithography
App 20100002221 - CEBUHAR; Wenceslao A. ; et al. | 2010-01-07 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,630,054 - Bleeker , et al. December 8, 2 | 2009-12-08 |
Optical System for Transforming Numerical Aperture
App 20090251786 - RYZHIKOV; Lev ; et al. | 2009-10-08 |
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
Grant 7,567,368 - Cebuhar , et al. July 28, 2 | 2009-07-28 |
Thin Film Continuous Spatially Modulated Grey Attenuators and Filters
App 20090122289 - VLADIMIRSKY; Yuli ; et al. | 2009-05-14 |
Optical system for transforming numerical aperture
Grant 7,532,403 - Ryzhikov , et al. May 12, 2 | 2009-05-12 |
Method and system for wavefront measurements of an optical system
App 20090021748 - Latypov; Azat M. ; et al. | 2009-01-22 |
Speckle reduction method and system for EUV interferometry
Grant 7,411,687 - Gontin , et al. August 12, 2 | 2008-08-12 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094596 - Bleeker; Arno ; et al. | 2008-04-24 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094595 - Bleeker; Arno ; et al. | 2008-04-24 |
System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System
App 20070165200 - Ryzhikov; Lev ; et al. | 2007-07-19 |
System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System
App 20070165201 - Ryzhikov; Lev ; et al. | 2007-07-19 |
System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
Grant 7,242,456 - Ryzhikov , et al. July 10, 2 | 2007-07-10 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20070146672 - Bleeker; Arno ; et al. | 2007-06-28 |
Lithographic apparatus having double telecentric illumination
Grant 7,227,613 - Ryzhikov , et al. June 5, 2 | 2007-06-05 |
Speckle reduction method and system for EUV interferometry
App 20060256349 - Gontin; Richard A. ; et al. | 2006-11-16 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
Grant 7,133,121 - Bleeker , et al. November 7, 2 | 2006-11-07 |
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
App 20060146308 - Cebuhar; Wenceslao A. ; et al. | 2006-07-06 |
System and method for reducing disturbances caused by movement in an immersion lithography system
App 20060044533 - Ryzhikov; Lev ; et al. | 2006-03-02 |
Lithographic apparatus having double telecentric illumination
App 20060017902 - Rhyzhikov; Lev ; et al. | 2006-01-26 |
System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
App 20050264782 - Ryzhikov, Lev ; et al. | 2005-12-01 |
Shearing interferometer with dynamic pupil fill
App 20050259269 - Latypov, Azat M. ; et al. | 2005-11-24 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20050170267 - Bleeker, Arno ; et al. | 2005-08-04 |
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
Grant 6,876,440 - Bleeker , et al. April 5, 2 | 2005-04-05 |
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
App 20050068514 - Bleeker, Arno ; et al. | 2005-03-31 |
Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
Grant 6,383,697 - Vladimirsky , et al. May 7, 2 | 2002-05-07 |
High aspect ratio microstructures and methods for manufacturing microstructures
Grant 6,093,520 - Vladimirsky , et al. July 25, 2 | 2000-07-25 |
Microsystem for rapid DNA sequencing
Grant 5,846,727 - Soper , et al. December 8, 1 | 1998-12-08 |
Segmented mask and exposure system for x-ray lithography
Grant 5,235,626 - Flamholz , et al. August 10, 1 | 1993-08-10 |
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