Visintin; Pamela M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Visintin; Pamela M..The latest application filed is for "chlorinated copper phthalocyanine pigments".

Company Profile

3.7.14

Visintin; Pamela M. - Charleston SC
Visintin; Pamela M. - North Charleston SC US
Visintin; Pamela M. - Red Hook NY
Visintin, Pamela M. - Carrboro NC

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chlorinated copper phthalocyanine pigments Grant 11,059,978 - Visintin , et al. July 13, 2	2021-07-13
Pigment compositions containing chlorinated copper phthalocyanine pigments in the gamma crystal form Grant 10,711,137 - Visintin	2020-07-14
Chlorinated Copper Phthalocyanine Pigments App 20200109291 - Visintin; Pamela M. ; et al.	2020-04-09
Chlorinated copper phthalocyanine pigments Grant 10,544,307 - Visintin , et al. Ja	2020-01-28
Pigment Compositions Containing Chlorinated Copper Phthalocyanine Pigments In The Gamma Crystal Form App 20190256712 - Visintin; Pamela M.	2019-08-22
Chlorinated Copper Phthalocyanine Pigments App 20180215921 - Visintin; Pamela M. ; et al.	2018-08-02
Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon Grant 8,642,526 - Visintin , et al. February 4, 2	2014-02-04
Compositions And Method For The Removal Of Photoresist For A Wafer Rework Application App 20120042898 - Visintin; Pamela M. ; et al.	2012-02-23
Formulations for cleaning ion-implanted photoresist layers from microelectronic devices Grant 8,114,220 - Visintin , et al. February 14, 2	2012-02-14
Composition And Method For Recycling Semiconductor Wafers Having Low-k Dielectric Materials Thereon App 20110275164 - Visintin; Pamela M. ; et al.	2011-11-10
Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon Grant 7,960,328 - Visintin , et al. June 14, 2	2011-06-14
Compositions And Methods For The Removal Of Photoresist For A Wafer Rework Application App 20100056410 - Visintin; Pamela M. ; et al.	2010-03-04
Formulations For Removing Cooper-containing Post-etch Residue From Microelectronic Devices App 20090301996 - Visintin; Pamela M. ; et al.	2009-12-10
Dense Fluid Compositions For Removal Of Hardened Photoresist, Post-etch Residue And/or Bottom Anti-reflective Coating App 20090192065 - Korzenski; Michael B. ; et al.	2009-07-30
Apparatus and Method for Supercritical Fluid Removal or Deposition Processes App 20080271991 - Korzenski; Michael B. ; et al.	2008-11-06
Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices App 20080269096 - Visintin; Pamela M. ; et al.	2008-10-30
Composition and Method for Recycling Semiconductor Wafers Having Low-K Dielectric Materials Thereon App 20080261847 - Visintin; Pamela M. ; et al.	2008-10-23
Formulations For Cleaning Memory Device Structures App 20080125342 - Visintin; Pamela M. ; et al.	2008-05-29
Removal Of High-dose Ion-implanted Photoresist Using Self-assembled Monolayers In Solvent Systems App 20070251551 - Korzenski; Michael B. ; et al.	2007-11-01
Metal chelation in carbon dioxide App 20040175948 - DeSimone, Joseph M. ; et al.	2004-09-09

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