Vinslava; Alina
Patent Applications and Registrations
Patent applications and USPTO patent grants for Vinslava; Alina.The latest application filed is for "dual-curvature cavity for epitaxial semiconductor growth".
- Vinslava; Alina - Ballston Lake NY
| Patent | Date |
|---|---|
| Epitaxial region for embedded source/drain region having uniform thickness Grant 10,461,155 - Yong , et al. Oc | 2019-10-29 |
| Single-curvature cavity for semiconductor epitaxy Grant 10,355,104 - Qi , et al. July 16, 2 | 2019-07-16 |
| Dual-curvature Cavity For Epitaxial Semiconductor Growth App 20190181243 - Vinslava; Alina ; et al. | 2019-06-13 |
| Dual-curvature cavity for epitaxial semiconductor growth Grant 10,297,675 - Vinslava , et al. | 2019-05-21 |
| Epitaxial Region For Embedded Source/drain Region Having Uniform Thickness App 20190148492 - Yong; Yoong Hooi ; et al. | 2019-05-16 |
| Single-curvature Cavity For Semiconductor Epitaxy App 20190131432 - Qi; Yi ; et al. | 2019-05-02 |
| Dual-curvature Cavity For Epitaxial Semiconductor Growth App 20190131433 - Vinslava; Alina ; et al. | 2019-05-02 |
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