Verbeek; Martin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Verbeek; Martin.The latest application filed is for "method for removing defect material of a lithography mask".

Company Profile

0.4.6

Verbeek; Martin - Munich DE
Verbeek; Martin - Munchen DE
Verbeek, Martin - Muenchen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for checking periodic structures on lithography masks Grant 7,424,144 - Koehle , et al. September 9, 2	2008-09-09
Method for inspection of periodic grating structures on lithography masks Grant 7,262,850 - Dettmann , et al. August 28, 2	2007-08-28
Method for removing defect material of a lithography mask App 20070037071 - Noelscher; Christoph ; et al.	2007-02-15
Defect repair method, in particular for repairing quartz defects on alternating phase shift masks Grant 7,108,798 - Ludwig , et al. September 19, 2	2006-09-19
Method for checking periodic structures on lithography masks App 20050048379 - Koehle, Roderick ; et al.	2005-03-03
Method for inspection of periodic grating structures on lithography masks App 20040165763 - Dettmann, Wolfgang ; et al.	2004-08-26
Defect repair method, in particular for repairing quartz defects on alternating phase shift masks App 20040124175 - Ludwig, Ralf ; et al.	2004-07-01
Exposure mask with repaired dummy structure and method of repairing an exposure mask Grant 6,756,164 - Franke , et al. June 29, 2	2004-06-29
Exposure mask with repaired dummy structure and method of repairing an exposure mask App 20030003377 - Franke, Torsten ; et al.	2003-01-02
Method and device for analyzing structures of a photomask App 20020001764 - Ruhl, Guenther ; et al.	2002-01-03

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