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name:-0.009026050567627
name:-0.016851902008057
name:-0.0016200542449951
Venkatesan; Mahalingam Patent Filings

Venkatesan; Mahalingam

Patent Applications and Registrations

Patent applications and USPTO patent grants for Venkatesan; Mahalingam.The latest application filed is for "patterning of magnetic thin film using energized ions and thermal excitation".

Company Profile
0.16.7
  • Venkatesan; Mahalingam - San Jose CA
  • Venkatesan; Mahalingam - Mohegan Lake NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Patterning of magnetic thin film using energized ions
Grant 9,263,078 - Verhaverbeke , et al. February 16, 2
2016-02-16
Patterning Of Magnetic Thin Film Using Energized Ions And Thermal Excitation
App 20140083363 - NALAMASU; Omkaram ;   et al.
2014-03-27
Patterning Of Magnetic Thin Film Using Energized Ions
App 20140017518 - VERHAVERBEKE; Steven ;   et al.
2014-01-16
Patterning of magnetic thin film using energized ions and thermal excitation
Grant 8,551,578 - Nalamasu , et al. October 8, 2
2013-10-08
Patterning of magnetic thin film using energized ions
Grant 8,535,766 - Verhaverbeke , et al. September 17, 2
2013-09-17
Patterning Of Magnetic Thin Film Using Energized Ions
App 20100098873 - VERHAVERBEKE; STEVEN ;   et al.
2010-04-22
Patterning Of Magnetic Thin Film Using Energized Ions And Thermal Excitation
App 20100096256 - NALAMASU; OMKARAM ;   et al.
2010-04-22
Magnetic Domain Patterning Using Plasma Ion Implantation
App 20090199768 - Verhaverbeke; Steven ;   et al.
2009-08-13
Method Including Magnetic Domain Patterning Using Plasma Ion Implantation For Mram Fabrication
App 20090201722 - Giridhar; Kamesh ;   et al.
2009-08-13
Gas inlets for wafer processing chamber
App 20030092266 - Anderson, Roger N. ;   et al.
2003-05-15
Gas inlets for wafer processing chamber
Grant 6,500,734 - Anderson , et al. December 31, 2
2002-12-31
Method and apparatus for processing the upper and lower faces of a wafer
Grant 6,113,703 - Anderson , et al. September 5, 2
2000-09-05
Deposition of silicon nitride thin films
Grant 5,932,286 - Beinglass , et al. August 3, 1
1999-08-03
Gas inlets for wafer processing chamber
Grant 5,916,369 - Anderson , et al. June 29, 1
1999-06-29
Method of forming doped silicon in high aspect ratio openings
Grant 5,863,598 - Venkatesan , et al. January 26, 1
1999-01-26
Process of depositing a layer of material on a wafer with susceptor back coating
Grant 5,834,059 - Anderson , et al. November 10, 1
1998-11-10
Method of enhancing step coverage of polysilicon deposits
Grant 5,695,819 - Beinglass , et al. December 9, 1
1997-12-09
Susceptor for deposition apparatus
Grant 5,645,646 - Beinglass , et al. July 8, 1
1997-07-08
Semiconductor wafer process chamber with suspector back coating
Grant 5,599,397 - Anderson , et al. February 4, 1
1997-02-04
Semiconductor wafer process chamber with susceptor back coating
Grant 5,551,982 - Anderson , et al. September 3, 1
1996-09-03
Method for the fabrication of low leakage polysilicon thin film transistors
Grant 5,112,764 - Mitra , et al. May 12, 1
1992-05-12

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