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name:-0.017523050308228
name:-0.012960910797119
name:-0.0021018981933594
Vatus; Jean R. Patent Filings

Vatus; Jean R.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Vatus; Jean R..The latest application filed is for "silicon wafers by epitaxial deposition".

Company Profile
1.15.13
  • Vatus; Jean R. - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Silicon wafers by epitaxial deposition
Grant 11,041,253 - Sivaramakrishnan , et al. June 22, 2
2021-06-22
Silicon Wafers By Epitaxial Deposition
App 20190003076 - Sivaramakrishnan; Visweswaren ;   et al.
2019-01-03
Silicon wafers by epitaxial deposition
Grant 9,982,363 - Sivaramakrishnan , et al. May 29, 2
2018-05-29
Silicon Wafers By Epitaxial Deposition
App 20160222544 - Sivaramakrishnan; Visweswaren ;   et al.
2016-08-04
Silicon wafers by epitaxial deposition
Grant 9,255,346 - Sivaramakrishnan , et al. February 9, 2
2016-02-09
Methods for depositing layers having reduced interfacial contamination
Grant 9,058,988 - Vatus , et al. June 16, 2
2015-06-16
Method and apparatus to enhance process gas temperature in a CVD reactor
Grant 8,512,472 - Vatus , et al. August 20, 2
2013-08-20
System And Method For Pedestal Adjustment
App 20130152859 - Collins; Richard O. ;   et al.
2013-06-20
Non-contact substrate support position sensing system and corresponding adjustments
Grant 8,441,640 - Patalay , et al. May 14, 2
2013-05-14
System and method for pedestal adjustment
Grant 8,398,777 - Collins , et al. March 19, 2
2013-03-19
Silicon Wafers By Epitaxial Deposition
App 20130032084 - Sivaramakrishnan; Visweswaren ;   et al.
2013-02-07
Apparatus for improved azimuthal thermal uniformity of a substrate
Grant 7,964,038 - Patalay , et al. June 21, 2
2011-06-21
Methods For Depositing Layers Having Reduced Interfacial Contamination
App 20100255661 - VATUS; JEAN R. ;   et al.
2010-10-07
Method And Apparatus To Enhance Process Gas Temperature In A Cvd Reactor
App 20100120259 - VATUS; JEAN R. ;   et al.
2010-05-13
Methods And Apparatus For Improved Azimuthal Thermal Uniformity Of A Substrate
App 20100086784 - PATALAY; KAILASH KIRAN ;   et al.
2010-04-08
Pre-cleaning of substrates in epitaxy chambers
Grant 7,651,948 - Kim , et al. January 26, 2
2010-01-26
System And Method For Pedestal Adjustment
App 20090272719 - Collins; Richard O. ;   et al.
2009-11-05
Non-contact Substrate Support Position Sensing System And Corresponding Adjustments
App 20090276097 - Patalay; Kailash Kiran ;   et al.
2009-11-05
Pre-cleaning of substrates in epitaxy chambers
App 20080245767 - Kim; Yihwan ;   et al.
2008-10-09
Method of calibrating and using a semiconductor processing system
Grant 6,876,442 - Vatus , et al. April 5, 2
2005-04-05
Apparatuses and methods for forming a substantially facet-free epitaxial film
App 20040175893 - Vatus, Jean R. ;   et al.
2004-09-09
Method of calibrating and using a semiconductor processing system
App 20030151733 - Vatus, Jean R. ;   et al.
2003-08-14

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