Varanasi; Pushkara R.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Varanasi; Pushkara R..The latest application filed is for "exposure photolithography methods".

Company Profile

0.60.49

Varanasi; Pushkara R. - Poughkeepsie NY
Varanasi; Pushkara R. - Hopewell Junction NY
Varanasi; Pushkara R. - Monmouth Junction NJ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Coating compositions suitable for use with an overcoated photoresist Grant 9,726,977 - Cameron , et al. August 8, 2	2017-08-08
Exposure photolithography methods Grant 9,235,119 - Chen , et al. January 12, 2	2016-01-12
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,906,591 - Liu , et al. December 9, 2	2014-12-09
Exposure Photolithography Methods App 20140349237 - Chen; Kuang-Jung ; et al.	2014-11-27
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,883,395 - Liu , et al. November 11, 2	2014-11-11
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,871,429 - Liu , et al. October 28, 2	2014-10-28
Photoresist compositions Grant 8,846,296 - Chen , et al. September 30, 2	2014-09-30
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,741,545 - Liu , et al. June 3, 2	2014-06-03
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,709,700 - Liu , et al. April 29, 2	2014-04-29
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,663,901 - Liu , et al. March 4, 2	2014-03-04
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,658,345 - Liu , et al. February 25, 2	2014-02-25
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,628,909 - Liu , et al. January 14, 2	2014-01-14
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,628,910 - Liu , et al. January 14, 2	2014-01-14
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,623,584 - Liu , et al. January 7, 2	2014-01-07
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,617,791 - Liu , et al. December 31, 2	2013-12-31
Near-infrared absorbing film compositions Grant 8,586,283 - Glodde , et al. November 19, 2	2013-11-19
Multiple exposure photolithography methods Grant 8,568,960 - Chen , et al. October 29, 2	2013-10-29
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,518,630 - Liu , et al. August 27, 2	2013-08-27
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130017490 - Liu; Sen ; et al.	2013-01-17
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130017489 - Liu; Sen ; et al.	2013-01-17
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130017491 - Liu; Sen ; et al.	2013-01-17
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011789 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011795 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011787 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011792 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011786 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011790 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011794 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011793 - Liu; Sen ; et al.	2013-01-10
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20130011788 - Liu; Sen ; et al.	2013-01-10
Near-Infrared Absorbing Film Compositions App 20130001484 - Glodde; Martin ; et al.	2013-01-03
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same Grant 8,343,706 - Liu , et al. January 1, 2	2013-01-01
Top antireflective coating composition containing hydrophobic and acidic groups Grant 8,304,178 - Khojasteh , et al. November 6, 2	2012-11-06
Near-infrared absorbing film compositions Grant 8,293,451 - Glodde , et al. October 23, 2	2012-10-23
Photoresist Compositions App 20120214099 - Chen; Kuang-Jung ; et al.	2012-08-23
Multiple exposure photolithography methods and photoresist compositions Grant 8,236,476 - Chen , et al. August 7, 2	2012-08-07
Multiple Exposure Photolithography Methods App 20120178027 - Chen; Kuang-Jung ; et al.	2012-07-12
Wet developable bottom antireflective coating composition and method for use thereof Grant 8,202,678 - Chen , et al. June 19, 2	2012-06-19
Photoresists and methods for optical proximity correction Grant 8,053,172 - Halle , et al. November 8, 2	2011-11-08
Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same Grant 8,034,533 - Liu , et al. October 11, 2	2011-10-11
Fused aromatic structures and methods for photolithographic applications Grant 8,029,975 - Bucchignano , et al. October 4, 2	2011-10-04
Photoresist compositions and methods related to near field masks Grant 8,021,828 - Huang , et al. September 20, 2	2011-09-20
Ultra low post exposure bake photoresist materials Grant 8,017,303 - Goldfarb , et al. September 13, 2	2011-09-13
Fluorine-free Fused Ring Heteroaromatic Photoacid Generators And Resist Compositions Containing The Same App 20110183259 - Liu; Sen ; et al.	2011-07-28
Near-Infrared Absorbing Film Compositions App 20110042653 - Glodde; Martin ; et al.	2011-02-24
Coating compositions suitable for use with an overcoated photoresist App 20100297557 - Cameron; James F. ; et al.	2010-11-25
Photoresist compositions and method for multiple exposures with multiple layer resist systems Grant 7,838,198 - Chen , et al. November 23, 2	2010-11-23
Photoresist compositions and method for multiple exposures with multiple layer resist systems Grant 7,838,200 - Chen , et al. November 23, 2	2010-11-23
Underlayer compositions containing heterocyclic aromatic structures Grant 7,816,068 - Huang , et al. October 19, 2	2010-10-19
Underlayer compositions containing heterocyclic aromatic structures Grant 7,807,332 - Huang , et al. October 5, 2	2010-10-05
Photoresist Compositions And Process For Multiple Exposures With Multiple Layer Photoresist Systems App 20100248147 - Chen; Kuang-Jung ; et al.	2010-09-30
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems Grant 7,803,521 - Chen , et al. September 28, 2	2010-09-28
Ultra Low Post Exposure Bake Photoresist Materials App 20100216071 - Goldfarb; Dario Leonardo ; et al.	2010-08-26
Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application Grant 7,754,820 - Huang , et al. July 13, 2	2010-07-13
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20100047712 - Khojasteh; Mahmoud ; et al.	2010-02-25
Wet Developable Bottom Antireflective Coating Composition And Method For Use Thereof App 20090291392 - Chen; Kuang-Jung J. ; et al.	2009-11-26
Fused Aromatic Structures And Methods For Photolithographic Applications App 20090286180 - Bucchignano; James J. ; et al.	2009-11-19
Top antireflective coating composition containing hydrophobic and acidic groups Grant 7,608,390 - Khojasteh , et al. October 27, 2	2009-10-27
Photoresists And Methods For Optical Proximity Correction App 20090214981 - Halle; Scott David ; et al.	2009-08-27
Photoresist Compositions And Methods Related To Near Field Masks App 20090214959 - Huang; Wu-Song ; et al.	2009-08-27
Fused aromatic structures and methods for photolithographic applications Grant 7,566,527 - Bucchignano , et al. July 28, 2	2009-07-28
Wet developable bottom antireflective coating composition and method for use thereof Grant 7,563,563 - Chen , et al. July 21, 2	2009-07-21
Aromatic Fluorine-free Photoacid Generators And Photoresist Compositions Containing The Same App 20090181319 - Li; Wenjie ; et al.	2009-07-16
Fluorine-free Heteroaromatic Photoacid Generators And Photoresist Compositions Containing The Same App 20090181320 - Liu; Sen ; et al.	2009-07-16
Multiple Exposure Photolithography Methods And Photoresist Compostions App 20090176174 - Chen; Kuang-Jung ; et al.	2009-07-09
Photoresist Compositions And Method For Multiple Exposures With Multiple Layer Resist Systems App 20090155718 - Chen; Kuang-Jung ; et al.	2009-06-18
Top antireflective coating composition with low refractive index at 193nm radiation wavelength Grant 7,544,750 - Huang , et al. June 9, 2	2009-06-09
Photoresist Compositions And Process For Multiple Exposures With Multiple Layer Photoresist Systems App 20090130590 - Chen; Kuang-Jung ; et al.	2009-05-21
Fused Aromatic Structures And Methods For Photolithographic Applications App 20090004596 - Bucchignano; James J. ; et al.	2009-01-01
Fluorinated Half Ester Of Maleic Anhydride Polymers For Dry 193 Nm Top Antireflective Coating Application App 20080286686 - Huang; Wu-Song S. ; et al.	2008-11-20
Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application Grant 7,435,537 - Huang , et al. October 14, 2	2008-10-14
Underlayer Compositions Containing Heterocyclic Aromatic Structures App 20080213697 - Huang; Wu-Song S. ; et al.	2008-09-04
Underlayer compositions containing heterocyclic aromatic structures Grant 7,375,172 - Huang , et al. May 20, 2	2008-05-20
Underlayer Compositions Containing Heterocyclic Aromatic Structures App 20080044776 - Huang; Wu-Song S. ; et al.	2008-02-21
Top Antireflective Coating Composition Containing Hydrophobic And Acidic Groups App 20080032228 - Khojasteh; Mahmoud ; et al.	2008-02-07
Fluorinated Half Ester Of Maleic Anhydride Polymers For Dry 193 Nm Top Antireflective Coating Application App 20080026315 - Huang; Wu-Song S. ; et al.	2008-01-31
Wet developable bottom antireflective coating composition and method for use thereof App 20070243484 - Chen; Kuang-Jung J. ; et al.	2007-10-18
Bottom antireflective coating composition and method for use thereof App 20070231736 - Chen; Kuang-Jung J. ; et al.	2007-10-04
Negative photoresist composition including non-crosslinking chemistry Grant 7,235,342 - Li , et al. June 26, 2	2007-06-26
Top antireflective coating composition with low refractive index at 193nm radiation wavelength App 20070087285 - Huang; Wu-Song S. ; et al.	2007-04-19
Underlayer compositons containing heterocyclic aromatic structures App 20070009830 - Huang; Wu-Song S. ; et al.	2007-01-11
Negative photoresist and method of using thereof Grant 7,081,326 - Li , et al. July 25, 2	2006-07-25
Negative photoresist and method of using thereof Grant 7,011,923 - Li , et al. March 14, 2	2006-03-14
Negative photoresist composition involving non-crosslinking chemistry Grant 6,991,890 - Li , et al. January 31, 2	2006-01-31
Negative photoresist and method of using thereof App 20050227167 - Li, Wenjie ; et al.	2005-10-13
Negative photoresist and method of using thereof App 20050202339 - Li, Wenjie ; et al.	2005-09-15
Negative photoresist composition involving non-crosslinking chemistry App 20050175928 - Li, Wenjie ; et al.	2005-08-11
Negative photoresist composition including non-crosslinking chemistry App 20050164507 - Li, Wenjie ; et al.	2005-07-28
Positive photoresists containing crosslinked polymers App 20020012869 - Adams, Timothy G. ; et al.	2002-01-31
Tricyanovinyl substitution process for NLO polymers Grant 5,395,556 - Drost , et al. March 7, 1	1995-03-07