loadpatents
Patent applications and USPTO patent grants for Vanhaelemeersch; Serge.The latest application filed is for "protective treatment for porous materials".
Patent | Date |
---|---|
Protective treatment for porous materials Grant 8,540,890 - Baklanov , et al. September 24, 2 | 2013-09-24 |
Protective Treatment For Porous Materials App 20130119014 - Baklanov; Mikhail ;   et al. | 2013-05-16 |
High aspect ratio via etch Grant 7,807,583 - Van Aelst , et al. October 5, 2 | 2010-10-05 |
Dual damascene patterning method Grant 7,611,986 - Olmen , et al. November 3, 2 | 2009-11-03 |
Method for chip singulation Grant 7,566,634 - Beyne , et al. July 28, 2 | 2009-07-28 |
Method of producing microcystalline silicon germanium suitable for micromachining Grant 7,557,027 - Witvrouw , et al. July 7, 2 | 2009-07-07 |
Formation of deep via airgaps for three dimensional wafer to wafer interconnect Grant 7,338,896 - Vanhaelemeersch , et al. March 4, 2 | 2008-03-04 |
High Aspect Ratio Via Etch App 20080050919 - Van Aelst; Joke ;   et al. | 2008-02-28 |
Dual damascene patterning method App 20060264033 - Olmen; Jan Van ;   et al. | 2006-11-23 |
Formation of deep via airgaps for three dimensional wafer to wafer interconnect App 20060223301 - Vanhaelemeersch; Serge ;   et al. | 2006-10-05 |
Method of producing microcrystalline silicon germanium suitable for micromachining App 20060166467 - Witvrouw; Ann ;   et al. | 2006-07-27 |
Fluorinated hard mask for micropatterning of polymers Grant 7,042,091 - Baklanov , et al. May 9, 2 | 2006-05-09 |
Method for chip singulation App 20060068567 - Beyne; Eric ;   et al. | 2006-03-30 |
Anisotropic etching of organic-containing insulating layers Grant 6,900,140 - Vanhaelemeersch , et al. May 31, 2 | 2005-05-31 |
Method for removal of SiC App 20050099078 - Vanhaelemeersch, Serge ;   et al. | 2005-05-12 |
Method of fabricating a semiconductor device App 20050056941 - Vanhaelemeersch, Serge ;   et al. | 2005-03-17 |
Method of fabricating a semiconductor device App 20050048782 - Vanhaelemeersch, Serge ;   et al. | 2005-03-03 |
Anisotropic etching of organic-containing insulating layers Grant 6,844,267 - Vanhaelemeersch , et al. January 18, 2 | 2005-01-18 |
Anisotropic etching of organic-containing insulating layers Grant 6,844,266 - Maex , et al. January 18, 2 | 2005-01-18 |
Method of fabricating a semiconductor device Grant 6,821,884 - Vanhaelemeersch , et al. November 23, 2 | 2004-11-23 |
Integrated circuit having SiC layer Grant 6,806,501 - Vanhaelemeersch , et al. October 19, 2 | 2004-10-19 |
Anisotropic etching of organic-containing insulating layers App 20040175945 - Vanhaelemeersch, Serge ;   et al. | 2004-09-09 |
Surface preparation using plasma for ALD Films App 20040071878 - Schuhmacher, Jorg ;   et al. | 2004-04-15 |
Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof Grant 6,635,964 - Maex , et al. October 21, 2 | 2003-10-21 |
Method to produce a porous oxygen-silicon layer App 20030181066 - Baklanov, Mikhail ;   et al. | 2003-09-25 |
Anisotropic etching of organic-containing insulating layers App 20030162407 - Maex, Karen ;   et al. | 2003-08-28 |
MIS transistors with a metal gate and high-k dielectric and method of forming Grant 6,607,950 - Henson , et al. August 19, 2 | 2003-08-19 |
Integrated circuit having SiC layer App 20030143816 - Vanhaelemeersch, Serge ;   et al. | 2003-07-31 |
Method for removal of sic Grant 6,599,814 - Vanhaelemeersch , et al. July 29, 2 | 2003-07-29 |
Method to produce a porous oxygen-silicon layer Grant 6,593,251 - Baklanov , et al. July 15, 2 | 2003-07-15 |
Method of fabricating a semiconductor device App 20020173142 - Vanhaelemeersch, Serge ;   et al. | 2002-11-21 |
Anisotropic etching of organic-containing insulating layers App 20020076935 - Maex, Karen ;   et al. | 2002-06-20 |
Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof App 20020066957 - Maex, Karen ;   et al. | 2002-06-06 |
Method for stripping ion implanted photoresist layer Grant 6,352,936 - Jehoul , et al. March 5, 2 | 2002-03-05 |
Method to produce a porous oxygen-silicon layer App 20020022378 - Baklanov, Mikhail ;   et al. | 2002-02-21 |
Method for forming MIS transistors with a metal gate and high-k dielectric using a replacement gate process and devices obtained thereof App 20010049183 - Henson, Kirklen ;   et al. | 2001-12-06 |
Fluorinated hard mask for micropattering of polymers App 20010026956 - Baklanov, Mikhail Rodionovich ;   et al. | 2001-10-04 |
Method For Forming A Fet App 20010012668 - BADENES, GONCAL ;   et al. | 2001-08-09 |
Fluorinated hard mask for micropatterning of polymers Grant 6,245,489 - Baklanov , et al. June 12, 2 | 2001-06-12 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.