Patent | Date |
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Dielectric Gapfill Using Atomic Layer Deposition (ald), Inhibitor Plasma And Etching App 20220205096 - ABEL; Joseph ;   et al. | 2022-06-30 |
Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching Grant 11,293,098 - Abel , et al. April 5, 2 | 2022-04-05 |
Dielectric Gapfill Using Atomic Layer Deposition (ald), Inhibitor Plasma And Etching App 20200017967 - ABEL; Joseph ;   et al. | 2020-01-16 |
Semiconductor substrate processing apparatus including uniformity baffles Grant 10,351,955 - Keshavamurthy , et al. July 16, 2 | 2019-07-16 |
Systems and methods for creating airgap seals using atomic layer deposition and high density plasma chemical vapor deposition Grant 10,224,235 - Park , et al. | 2019-03-05 |
Ultra-high vacuum transport and storage Grant 10,153,282 - Panagopoulos , et al. Dec | 2018-12-11 |
Plasma activated conformal dielectric film deposition Grant 10,043,655 - Swaminathan , et al. August 7, 2 | 2018-08-07 |
UV and reducing treatment for K recovery and surface clean in semiconductor processing Grant 10,037,905 - Varadarajan , et al. July 31, 2 | 2018-07-31 |
Inhibitor plasma mediated atomic layer deposition for seamless feature fill Grant 9,966,299 - Tang , et al. May 8, 2 | 2018-05-08 |
Method of densifying films in semiconductor device Grant 9,786,496 - van Schravendijk , et al. October 10, 2 | 2017-10-10 |
Densification of dielectric film using inductively coupled high density plasma Grant 9,741,584 - Park , et al. August 22, 2 | 2017-08-22 |
Systems And Methods For Creating Airgap Seals Using Atomic Layer Deposition And High Density Plasma Chemical Vapor Deposition App 20170229337 - Park; Jason Daejin ;   et al. | 2017-08-10 |
Method for depositing a chlorine-free conformal SiN film Grant 9,670,579 - Hausmann , et al. June 6, 2 | 2017-06-06 |
Plasma Activated Conformal Dielectric Film Deposition App 20170148628 - Swaminathan; Shankar ;   et al. | 2017-05-25 |
Method Of Densifying Films In Semiconductor Device App 20170053799 - van Schravendijk; Bart ;   et al. | 2017-02-23 |
Plasma activated conformal dielectric film deposition Grant 9,570,274 - Swaminathan , et al. February 14, 2 | 2017-02-14 |
Air gap spacer integration for improved fin device performance Grant 9,515,156 - Besser , et al. December 6, 2 | 2016-12-06 |
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill App 20160329238 - Tang; Wei ;   et al. | 2016-11-10 |
Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery Grant 9,447,499 - Roy , et al. September 20, 2 | 2016-09-20 |
Inhibitor plasma mediated atomic layer deposition for seamless feature fill Grant 9,425,078 - Tang , et al. August 23, 2 | 2016-08-23 |
Systems and methods for eliminating seams in atomic layer deposition of silicon dioxide film in gap fill applications Grant 9,406,544 - Tang , et al. August 2, 2 | 2016-08-02 |
Method for forming a mask by etching conformal film on patterned ashable hardmask Grant 9,362,133 - Shamma , et al. June 7, 2 | 2016-06-07 |
Conformal film deposition for gapfill Grant 9,355,886 - Swaminathan , et al. May 31, 2 | 2016-05-31 |
Air Gap Spacer Integration For Improved Fin Device Performance App 20160111515 - Besser; Paul Raymond ;   et al. | 2016-04-21 |
Flowable oxide film with tunable wet etch rate Grant 9,299,559 - Draeger , et al. March 29, 2 | 2016-03-29 |
CVD flowable gap fill Grant 9,257,302 - Wang , et al. February 9, 2 | 2016-02-09 |
Systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia Grant 9,147,589 - Varadarajan , et al. September 29, 2 | 2015-09-29 |
Method For Depositing A Chlorine-free Conformal Sin Film App 20150259791 - Hausmann; Dennis ;   et al. | 2015-09-17 |
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill App 20150243545 - Tang; Wei ;   et al. | 2015-08-27 |
Plasma Activated Conformal Dielectric Film Deposition App 20150206719 - Swaminathan; Shankar ;   et al. | 2015-07-23 |
Method for depositing a chlorine-free conformal sin film Grant 9,070,555 - Hausmann , et al. June 30, 2 | 2015-06-30 |
Semiconductor Substrate Processing Apparatus Including Uniformity Baffles App 20150167168 - Keshavamurthy; Arun ;   et al. | 2015-06-18 |
In-situ deposition of film stacks Grant 9,028,924 - Haverkamp , et al. May 12, 2 | 2015-05-12 |
Atomic Layer Removal Process With Higher Etch Amount App 20150118848 - Draeger; Nerissa ;   et al. | 2015-04-30 |
Conformal doping via plasma activated atomic layer deposition and conformal film deposition Grant 8,956,983 - Swaminathan , et al. February 17, 2 | 2015-02-17 |
Flowable Oxide Film With Tunable Wet Etch Rate App 20150044882 - Draeger; Nerissa ;   et al. | 2015-02-12 |
Methods And Apparatus For Dielectric Deposition App 20140302689 - Ashtiani; Kaihan ;   et al. | 2014-10-09 |
Flowable oxide film with tunable wet etch rate Grant 8,846,536 - Draeger , et al. September 30, 2 | 2014-09-30 |
Hardmask materials Grant 8,846,525 - Rangarajan , et al. September 30, 2 | 2014-09-30 |
Image Reversal With Ahm Gap Fill For Multiple Patterning App 20140170853 - Shamma; Nader ;   et al. | 2014-06-19 |
In-situ deposition of film stacks Grant 8,741,394 - Haverkamp , et al. June 3, 2 | 2014-06-03 |
Method For Depositing A Chlorine-free Conformal Sin Film App 20140141626 - Hausmann; Dennis ;   et al. | 2014-05-22 |
Gap fill integration Grant 8,728,958 - Ashtiani , et al. May 20, 2 | 2014-05-20 |
Conformal Film Deposition For Gapfill App 20140134827 - Swaminathan; Shankar ;   et al. | 2014-05-15 |
Smooth silicon-containing films Grant 8,709,551 - Fox , et al. April 29, 2 | 2014-04-29 |
Premetal dielectric integration process Grant 8,685,867 - Danek , et al. April 1, 2 | 2014-04-01 |
Defect Reduction In Plasma Processing App 20140049162 - Thomas; George ;   et al. | 2014-02-20 |
Systems And Methods For At Least Partially Converting Films To Silicon Oxide And/or Improving Film Quality Using Ultraviolet Curing In Steam And Densification Of Films Using Uv Curing In Ammonia App 20140020259 - Varadarajan; Bhadri N. ;   et al. | 2014-01-23 |
Dual Plenum, Axi-symmetric Showerhead With Edge-to-center Gas Delivery App 20130341433 - Roy; Shambhu N. ;   et al. | 2013-12-26 |
Hardmask Materials App 20130330932 - Rangarajan; Vishwanathan ;   et al. | 2013-12-12 |
Method for depositing a chlorine-free conformal sin film Grant 8,592,328 - Hausmann , et al. November 26, 2 | 2013-11-26 |
PECVD flowable dielectric gap fill Grant 8,557,712 - Antonelli , et al. October 15, 2 | 2013-10-15 |
Hardmask materials Grant 8,536,073 - Rangarajan , et al. September 17, 2 | 2013-09-17 |
Systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia Grant 8,528,224 - Varadarajan , et al. September 10, 2 | 2013-09-10 |
Flowable Oxide Film With Tunable Wet Etch Rate App 20130230987 - Draeger; Nerissa ;   et al. | 2013-09-05 |
Method For Depositing A Chlorine-free Conformal Sin Film App 20130189854 - Hausmann; Dennis ;   et al. | 2013-07-25 |
In-situ Deposition Of Film Stacks App 20130171834 - Haverkamp; Jason ;   et al. | 2013-07-04 |
Carbon containing low-k dielectric constant recovery using UV treatment Grant 8,465,991 - Varadarajan , et al. June 18, 2 | 2013-06-18 |
Protective self-aligned buffer layers for damascene interconnects Grant 8,430,992 - Chattopadhyay , et al. April 30, 2 | 2013-04-30 |
Conformal Doping Via Plasma Activated Atomic Layer Deposition And Conformal Film Deposition App 20130040447 - Swaminathan; Shankar ;   et al. | 2013-02-14 |
Protective self-aligned buffer layers for damascene interconnects Grant 8,317,923 - Chattopadhyay , et al. November 27, 2 | 2012-11-27 |
Hardmask Materials App 20120276752 - RANGARAJAN; Vishwanathan ;   et al. | 2012-11-01 |
Multistep method of depositing metal seed layers Grant 8,298,936 - Rozbicki , et al. October 30, 2 | 2012-10-30 |
Interfacial capping layers for interconnects Grant 8,268,722 - Yu , et al. September 18, 2 | 2012-09-18 |
Hardmask materials Grant 8,247,332 - Rangarajan , et al. August 21, 2 | 2012-08-21 |
UV treatment of etch stop and hard mask films for selectivity and hermeticity enhancement Grant 8,242,028 - van Schravendijk , et al. August 14, 2 | 2012-08-14 |
Remote plasma processing of interface surfaces Grant 8,217,513 - Antonelli , et al. July 10, 2 | 2012-07-10 |
Bottom Up Fill In High Aspect Ratio Trenches App 20120149213 - Nittala; Lakshminarayana ;   et al. | 2012-06-14 |
Pecvd Deposition Of Smooth Polysilicon Films App 20120142172 - FOX; Keith ;   et al. | 2012-06-07 |
Hardmask materials Grant 8,178,443 - Rangarajan , et al. May 15, 2 | 2012-05-15 |
Methods for reducing UV and dielectric diffusion barrier interaction Grant 8,173,537 - Chattopadhyay , et al. May 8, 2 | 2012-05-08 |
Protective layer to enable damage free gap fill Grant 8,133,797 - van Schravendijk , et al. March 13, 2 | 2012-03-13 |
Reducing UV and dielectric diffusion barrier interaction through the modulation of optical properties Grant 8,124,522 - Wu , et al. February 28, 2 | 2012-02-28 |
Remote plasma processing of interface surfaces Grant 8,084,339 - Antonelli , et al. December 27, 2 | 2011-12-27 |
Atomic layer removal process with higher etch amount Grant 8,058,179 - Draeger , et al. November 15, 2 | 2011-11-15 |
Protection of Cu damascene interconnects by formation of a self-aligned buffer layer Grant 8,030,777 - van Schravendijk , et al. October 4, 2 | 2011-10-04 |
In-Situ Deposition of Film Stacks App 20110236594 - Haverkamp; Jason ;   et al. | 2011-09-29 |
Smooth Silicon-Containing Films App 20110236600 - Fox; Keith ;   et al. | 2011-09-29 |
Methods of forming moisture barrier for low K film integration with anti-reflective layers Grant 8,003,549 - Li , et al. August 23, 2 | 2011-08-23 |
Atomic layer removal for high aspect ratio gapfill Grant 7,981,763 - van Schravendijk , et al. July 19, 2 | 2011-07-19 |
Novel Gap Fill Integration App 20110151678 - Ashtiani; Kaihan ;   et al. | 2011-06-23 |
Hardmask Materials App 20110133313 - Rangarajan; Vishwanathan ;   et al. | 2011-06-09 |
Hardmask Materials App 20110135557 - Rangarajan; Vishwanathan ;   et al. | 2011-06-09 |
Remote Plasma Processing Of Interface Surfaces App 20110120377 - Antonelli; George Andrew ;   et al. | 2011-05-26 |
Carbon Containing Low-k Dielectric Constant Recovery Using Uv Treatment App 20110117678 - Varadarajan; Bhadri N. ;   et al. | 2011-05-19 |
Uv And Reducing Treatment For K Recovery And Surface Clean In Semiconductor Processing App 20110111533 - Varadarajan; Bhadri ;   et al. | 2011-05-12 |
Uv Treatment For Carbon-containing Low-k Dielectric Repair In Semiconductor Processing App 20110045610 - van Schravendijk; Bart ;   et al. | 2011-02-24 |
Interfacial layers for electromigration resistance improvement in damascene interconnects Grant 7,858,510 - Banerji , et al. December 28, 2 | 2010-12-28 |
Remote Plasma Processing Of Interface Surfaces App 20100317198 - Antonelli; George Andrew ;   et al. | 2010-12-16 |
UV treatment for carbon-containing low-k dielectric repair in semiconductor processing Grant 7,851,232 - van Schravendijk , et al. December 14, 2 | 2010-12-14 |
Interfacial Capping Layers For Interconnects App 20100308463 - Yu; Jengyi ;   et al. | 2010-12-09 |
Apparatus For Uv Damage Repair Of Low K Films Prior To Copper Barrier Deposition App 20100267231 - van Schravendijk; Bart ;   et al. | 2010-10-21 |
Uv Treatment For Carbon-containing Low-k Dielectric Repair In Semiconductor Processing App 20100261349 - van Schravendijk; Bart ;   et al. | 2010-10-14 |
Interfacial layers for electromigration resistance improvement in damascene interconnects Grant 7,799,671 - Banerji , et al. September 21, 2 | 2010-09-21 |
Protective self-aligned buffer layers for damascene interconnects Grant 7,727,880 - Chattopadhyay , et al. June 1, 2 | 2010-06-01 |
Protective self-aligned buffer layers for damascene interconnects Grant 7,727,881 - Chattopadhyay , et al. June 1, 2 | 2010-06-01 |
Method of improving adhesion between two dielectric films Grant 7,705,431 - Sanganeria , et al. April 27, 2 | 2010-04-27 |
Method For Improving Process Control And Film Conformality Of Pecvd Film App 20100099271 - Hausmann; Dennis ;   et al. | 2010-04-22 |
Multistep method of depositing metal seed layers Grant 7,682,966 - Rozbicki , et al. March 23, 2 | 2010-03-23 |
Interfacial layers for electromigration resistance improvement in damascene interconnects Grant 7,648,899 - Banerji , et al. January 19, 2 | 2010-01-19 |
Methods of forming moisture barrier for low k film integration with anti-reflective layers Grant 7,642,202 - Li , et al. January 5, 2 | 2010-01-05 |
Method of improving adhesion between two dielectric films Grant 7,622,380 - Sanganeria , et al. November 24, 2 | 2009-11-24 |
UV treatment of STI films for increasing tensile stress Grant 7,622,162 - van Schravendijk , et al. November 24, 2 | 2009-11-24 |
Protective Layer To Enable Damage Free Gap Fill App 20090286381 - van Schravendijk; Bart ;   et al. | 2009-11-19 |
Protection of Cu damascene interconnects by formation of a self-aligned buffer layer Grant 7,396,759 - van Schravendijk , et al. July 8, 2 | 2008-07-08 |
Gap fill for high aspect ratio structures Grant 7,067,440 - Bayman , et al. June 27, 2 | 2006-06-27 |
Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing Grant 7,052,988 - van Schravendijk , et al. May 30, 2 | 2006-05-30 |
Method of improving adhesion between two dielectric films Grant 6,972,252 - Sanganeria , et al. December 6, 2 | 2005-12-06 |
Process for depositing F-doped silica glass in high aspect ratio structures Grant 6,846,391 - Papasouliotis , et al. January 25, 2 | 2005-01-25 |
Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing Grant 6,720,251 - van Schravendijk , et al. April 13, 2 | 2004-04-13 |
Gap fill for high aspect ratio structures Grant 6,596,654 - Bayman , et al. July 22, 2 | 2003-07-22 |
Very high aspect ratio gapfill using HDP Grant 6,395,150 - Van Cleemput , et al. May 28, 2 | 2002-05-28 |