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Patent applications and USPTO patent grants for van Ommen; Alfred H..The latest application filed is for "method of manufacturing a semiconductor device having a semiconductor body with a buried silicide layer".
Patent | Date |
---|---|
Method of manufacturing a semiconductor device having a semiconductor body with a buried silicide layer Grant 5,236,872 - van Ommen , et al. August 17, 1 | 1993-08-17 |
Method of simultaneously manufacturing semiconductor regions having different dopings Grant 4,653,176 - Van Ommen March 31, 1 | 1987-03-31 |
Method of manufacturing a semiconductor device, in which patterns are formed in a layer of silicon nitride by means of ion implantation Grant 4,514,251 - van Ommen , et al. April 30, 1 | 1985-04-30 |
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