Van Eijck; Petrus Anton Willem Cornelia Maria
Patent Applications and Registrations
Patent applications and USPTO patent grants for Van Eijck; Petrus Anton Willem Cornelia Maria.The latest application filed is for "substrate placement in immersion lithography".
- Van Eijck; Petrus Anton Willem Cornelia Maria - Budel NL
| Patent | Date |
|---|---|
| Substrate placement in immersion lithography Grant 10,345,711 - Hoogendam , et al. July 9, 2 | 2019-07-09 |
| Substrate Placement In Immersion Lithography App 20180067401 - HOOGENDAM; Christiaan Alexander ; et al. | 2018-03-08 |
| Substrate placement in immersion lithography Grant 9,740,106 - Hoogendam , et al. August 22, 2 | 2017-08-22 |
| Substrate Placement In Immersion Lithography App 20160054665 - HOOGENDAM; Christiaan Alexander ; et al. | 2016-02-25 |
| Substrate placement in immersion lithography Grant 9,182,222 - Hoogendam , et al. November 10, 2 | 2015-11-10 |
| Substrate Placement In Immersion Lithography App 20130182231 - Hoogendam; Christiaan Alexander ; et al. | 2013-07-18 |
| Substrate placement in immersion lithography Grant 8,441,617 - Hoogendam , et al. May 14, 2 | 2013-05-14 |
| Substrate Placement In Immersion Lithography App 20120050740 - HOOGENDAM; CHRISTIAAN ALEXANDER ; et al. | 2012-03-01 |
| Object Alignment Measurement Method and Apparatus App 20110013188 - SLOTBOOM; Daan Maurits ; et al. | 2011-01-20 |
| Substrate placement in immersion lithography Grant 7,352,440 - Hoogendam , et al. April 1, 2 | 2008-04-01 |
| Substrate placement in immersion lithography App 20060126038 - Hoogendam; Christiaan Alexander ; et al. | 2006-06-15 |
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