Van Dijk; Leon Paul

Patent Applications and Registrations

Patent applications and USPTO patent grants for Van Dijk; Leon Paul.The latest application filed is for "apparatus and method for property joint interpolation and prediction".

Company Profile

16.10.13

Van Dijk; Leon Paul - Veldhoven NL
Van Dijk; Leon Paul - Eindhoven NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Determining an optimal operational parameter setting of a metrology system Grant 11,320,750 - Van Dijk , et al. May 3, 2	2022-05-03
Metrology apparatus Grant 11,300,889 - Van Dijk , et al. April 12, 2	2022-04-12
Method to change an etch parameter Grant 11,300,887 - Van Haren , et al. April 12, 2	2022-04-12
Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product Grant 11,300,888 - Van Haren , et al. April 12, 2	2022-04-12
Alignment mark positioning in a lithographic process Grant 11,294,294 - Van Haren , et al. April 5, 2	2022-04-05
Apparatus And Method For Property Joint Interpolation And Prediction App 20220083834 - HASIBI; Faegheh ; et al.	2022-03-17
Method For Adjusting A Target Feature In A Model Of A Patterning Process Based On Local Electric Fields App 20220050387 - VAN HAREN; Richard Johannes Franciscus ; et al.	2022-02-17
Methods and apparatus for use in a device manufacturing method Grant 11,226,567 - Van Haren , et al. January 18, 2	2022-01-18
Focus and overlay improvement by modifying a patterning device Grant 11,126,093 - Van Haren , et al. September 21, 2	2021-09-21
Metrology Apparatus App 20210165335 - VAN DIJK; Leon Paul ; et al.	2021-06-03
Alignment Mark Positioning In A Lithographic Process App 20210048758 - VAN HAREN; Richard Johannes Franciscus ; et al.	2021-02-18
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20210018852 - VAN DIJK; Leon Paul ; et al.	2021-01-21
Focus And Overlay Improvement By Modifying A Patterning Device App 20200310242 - VAN HAREN; Richard Johannes Franciscus ; et al.	2020-10-01
Determining an optimal operational parameter setting of a metrology system Grant 10,788,761 - Van Dijk , et al. September 29, 2	2020-09-29
Methods And Apparatus For Use In A Device Manufacturing Method App 20200218169 - VAN HAREN; Richard Johannes Franciscus ; et al.	2020-07-09
Methods Of Determining Stress In A Substrate, Control System For Controlling A Lithographic Process, Lithographic Apparatus And App 20200050117 - VAN HAREN; Richard Johannes Franciscus ; et al.	2020-02-13
Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product Grant 10,545,410 - Cekli , et al. Ja	2020-01-28
Lithographic apparatus and device manufacturing method Grant 10,474,045 - Bijnen , et al. Nov	2019-11-12
Method Of Determining Pellicle Compensation Corrections For A Lithographic Process, Metrology Apparatus And Computer Program App 20190294059 - VAN DIJK; Leon Paul ; et al.	2019-09-26
A Method To Change An Etch Parameter App 20190285992 - VAN HAREN; Richard Johannes Franciscus ; et al.	2019-09-19
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20190250523 - VAN DIJK; Leon Paul ; et al.	2019-08-15
Lithographic Apparatus, Device Manufacturing Method And Associated Data Processing Apparatus And Computer Program Product App 20190079411 - CEKLI; Hakki Ergun ; et al.	2019-03-14
Methods Of Determining A Mechanical Property Of A Layer Applied To A Substrate, Control System For A Lithographic Apparatus And Lithographic Apparatus App 20190041758 - VAN DIJK; Leon Paul ; et al.	2019-02-07

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