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Determining an optimal operational parameter setting of a metrology system Grant 11,320,750 - Van Dijk , et al. May 3, 2 | 2022-05-03 |
Metrology apparatus Grant 11,300,889 - Van Dijk , et al. April 12, 2 | 2022-04-12 |
Method to change an etch parameter Grant 11,300,887 - Van Haren , et al. April 12, 2 | 2022-04-12 |
Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product Grant 11,300,888 - Van Haren , et al. April 12, 2 | 2022-04-12 |
Alignment mark positioning in a lithographic process Grant 11,294,294 - Van Haren , et al. April 5, 2 | 2022-04-05 |
Apparatus And Method For Property Joint Interpolation And Prediction App 20220083834 - HASIBI; Faegheh ;   et al. | 2022-03-17 |
Method For Adjusting A Target Feature In A Model Of A Patterning Process Based On Local Electric Fields App 20220050387 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2022-02-17 |
Methods and apparatus for use in a device manufacturing method Grant 11,226,567 - Van Haren , et al. January 18, 2 | 2022-01-18 |
Focus and overlay improvement by modifying a patterning device Grant 11,126,093 - Van Haren , et al. September 21, 2 | 2021-09-21 |
Metrology Apparatus App 20210165335 - VAN DIJK; Leon Paul ;   et al. | 2021-06-03 |
Alignment Mark Positioning In A Lithographic Process App 20210048758 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2021-02-18 |
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20210018852 - VAN DIJK; Leon Paul ;   et al. | 2021-01-21 |
Focus And Overlay Improvement By Modifying A Patterning Device App 20200310242 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2020-10-01 |
Determining an optimal operational parameter setting of a metrology system Grant 10,788,761 - Van Dijk , et al. September 29, 2 | 2020-09-29 |
Methods And Apparatus For Use In A Device Manufacturing Method App 20200218169 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2020-07-09 |
Methods Of Determining Stress In A Substrate, Control System For Controlling A Lithographic Process, Lithographic Apparatus And App 20200050117 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2020-02-13 |
Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product Grant 10,545,410 - Cekli , et al. Ja | 2020-01-28 |
Lithographic apparatus and device manufacturing method Grant 10,474,045 - Bijnen , et al. Nov | 2019-11-12 |
Method Of Determining Pellicle Compensation Corrections For A Lithographic Process, Metrology Apparatus And Computer Program App 20190294059 - VAN DIJK; Leon Paul ;   et al. | 2019-09-26 |
A Method To Change An Etch Parameter App 20190285992 - VAN HAREN; Richard Johannes Franciscus ;   et al. | 2019-09-19 |
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20190250523 - VAN DIJK; Leon Paul ;   et al. | 2019-08-15 |
Lithographic Apparatus, Device Manufacturing Method And Associated Data Processing Apparatus And Computer Program Product App 20190079411 - CEKLI; Hakki Ergun ;   et al. | 2019-03-14 |
Methods Of Determining A Mechanical Property Of A Layer Applied To A Substrate, Control System For A Lithographic Apparatus And Lithographic Apparatus App 20190041758 - VAN DIJK; Leon Paul ;   et al. | 2019-02-07 |