VAN DEN BROEKE; Douglas

Patent Applications and Registrations

Patent applications and USPTO patent grants for VAN DEN BROEKE; Douglas.The latest application filed is for "method, program product and apparatus for performing double exposure lithography".

Company Profile

0.33.22

VAN DEN BROEKE; Douglas - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method, Program Product And Apparatus For Performing Double Exposure Lithography App 20150095858 - CHEN; Jang Fung ; et al.	2015-04-02
Method, program product and apparatus for performing double exposure lithography Grant 8,910,091 - Chen , et al. December 9, 2	2014-12-09
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 8,632,930 - Hsu , et al. January 21, 2	2014-01-21
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography Grant 8,495,529 - van Den Broeke , et al. July 23, 2	2013-07-23
Method and Apparatus for Performing Model-Based OPC for Pattern Decomposed Features App 20130182940 - Hsu; Duan-Fu Stephen ; et al.	2013-07-18
Method and apparatus for performing model-based OPC for pattern decomposed features Grant 8,391,605 - Hsu , et al. March 5, 2	2013-03-05
Method, Program Product and Apparatus for Performing Double Exposure Lithography App 20130055171 - Chen; Jang Fung ; et al.	2013-02-28
Method and Apparatus for Performing Model-Based OPC for Pattern Decomposed Features App 20120122023 - Hsu; Duan-Fu Stephen ; et al.	2012-05-17
Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process Grant 8,132,130 - Chen , et al. March 6, 2	2012-03-06
Method, program product and apparatus for performing double exposure lithography Grant 8,122,391 - Chen , et al. February 21, 2	2012-02-21
Method and apparatus for performing model-based OPC for pattern decomposed features Grant 8,111,921 - Hsu , et al. February 7, 2	2012-02-07
Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration Grant 8,040,573 - Shi , et al. October 18, 2	2011-10-18
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 8,039,180 - Laidig , et al. October 18, 2	2011-10-18
Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) App 20110236808 - Hsu; Duan-Fu Stephen ; et al.	2011-09-29
CPL mask and a method and program product for generating the same Grant 7,998,355 - Van Den Broeke , et al. August 16, 2	2011-08-16
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 7,981,576 - Hsu , et al. July 19, 2	2011-07-19
Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning App 20110143268 - Laidig; Thomas ; et al.	2011-06-16
CPL mask and a method and program product for generating the same Grant 7,892,703 - Chen , et al. February 22, 2	2011-02-22
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,892,707 - Laidig , et al. February 22, 2	2011-02-22
Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) App 20110014552 - Hsu; Duan-Fu Stephen ; et al.	2011-01-20
Method and apparatus for performing dark field double dipole lithography (DDL) Grant 7,824,826 - Hsu , et al. November 2, 2	2010-11-02
Method, program product and apparatus for performing double exposure lithography Grant 7,681,171 - Chen , et al. March 16, 2	2010-03-16
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography Grant 7,620,930 - Van Den Broeke , et al. November 17, 2	2009-11-17
Method for performing pattern pitch-split decomposition utilizing anchoring features Grant 7,617,476 - Hsu , et al. November 10, 2	2009-11-10
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology Grant 7,614,034 - Van Den Broeke , et al. November 3, 2	2009-11-03
Method for improved manufacturability and patterning of sub-wavelength contact hole mask Grant 7,604,909 - Hsu , et al. October 20, 2	2009-10-20
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography Grant 7,550,235 - Shi , et al. June 23, 2	2009-06-23
Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM Grant 7,523,438 - Hsu , et al. April 21, 2	2009-04-21
Method for performing transmission tuning of a mask pattern to improve process latitude Grant 7,514,183 - Hsu , et al. April 7, 2	2009-04-07
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,485,396 - Laidig , et al. February 3, 2	2009-02-03
Eigen decomposition based OPC model Grant 7,398,508 - Shi , et al. July 8, 2	2008-07-08
Method, program product and apparatus for generating assist features utilizing an image field map Grant 7,376,930 - Wampler , et al. May 20, 2	2008-05-20
Method for performing pattern pitch-split decomposition utilizing anchoring features App 20080092106 - Hsu; Duan-Fu Stephen ; et al.	2008-04-17
Scattering bar OPC application method for sub-half wavelength lithography patterning Grant 7,354,681 - Laidig , et al. April 8, 2	2008-04-08
Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration App 20080068668 - Shi; Xuelong ; et al.	2008-03-20
Method and apparatus for performing model-based OPC for pattern decomposed features App 20080069432 - Hsu; Duan-Fu Stephen ; et al.	2008-03-20
Method and apparatus for performing dark field double dipole lithography (DDL) App 20080020296 - Hsu; Duan-Fu Stephen ; et al.	2008-01-24
Method for improved manufacturability and patterning of sub-wavelength contact hole mask App 20080014509 - Hsu; Chung-Wei ; et al.	2008-01-17
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology App 20070122719 - Van Den Broeke; Douglas ; et al.	2007-05-31
CPL mask and a method and program product for generating the same App 20070065733 - Chen; Jang Fung ; et al.	2007-03-22
Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process App 20070031740 - Chen; Jang Fung ; et al.	2007-02-08
Method, program product and apparatus for performing double exposure lithography App 20060277521 - Chen; Jang Fung ; et al.	2006-12-07
Optical proximity correction method utilizing phase-edges as sub-resolution assist features Grant 7,026,081 - Van Den Broeke , et al. April 11, 2	2006-04-11
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM Grant 6,951,701 - Hsu , et al. October 4, 2	2005-10-04
Method for performing transmission tuning of a mask pattern to improve process latitude App 20050196682 - Hsu, Stephen D. ; et al.	2005-09-08
Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique Grant 6,920,628 - Chen , et al. July 19, 2	2005-07-19
Method, program product and apparatus for generating assist features utilizing an image field map App 20050053848 - Wampler, Kurt E. ; et al.	2005-03-10
Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique App 20040006757 - Chen, Jang Fung ; et al.	2004-01-08
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM App 20030073013 - Hsu, Michael ; et al.	2003-04-17

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