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Patent applications and USPTO patent grants for Vail; Robert C.The latest application filed is for "plasma etch reactor and method".
Patent | Date |
---|---|
Plasma etch reactor and method Grant 7,223,699 - DeOrnellas , et al. May 29, 2 | 2007-05-29 |
Plasma etch reactor and method App 20050164513 - DeOrnellas, Stephen P. ;   et al. | 2005-07-28 |
Plasma etch reactor and method Grant 6,905,969 - DeOrnellas , et al. June 14, 2 | 2005-06-14 |
Plasma etch reactor and method Grant 6,620,335 - DeOrnellas , et al. September 16, 2 | 2003-09-16 |
Plasma etch reactor and method App 20020139665 - DeOrnellas, Stephen P. ;   et al. | 2002-10-03 |
Plasma etch reactor having a plurality of magnets Grant 6,354,240 - DeOrnellas , et al. March 12, 2 | 2002-03-12 |
Plasma etch reactor and method for emerging films Grant 6,190,496 - DeOrnellas , et al. February 20, 2 | 2001-02-20 |
Plasma etch reactor and method for emerging films Grant 6,048,435 - DeOrnellas , et al. April 11, 2 | 2000-04-11 |
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