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Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Grant 10,585,347 - Sriraman , et al. | 2020-03-10 |
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Photoresist Design Layout Pattern Proximity Correction Through Fast Edge Placement Error Prediction Via A Physics-based Etch Pro App 20190250501 - Sriraman; Saravanapriyan ;   et al. | 2019-08-15 |
High aspect ratio etch of oxide metal oxide metal stack Grant 10,242,883 - Guha , et al. | 2019-03-26 |
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Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Grant 10,197,908 - Sriraman , et al. Fe | 2019-02-05 |
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System Implementing Machine Learning in Complex Multivariate Wafer Processing Equipment App 20180247798 - Guha; Joydeep ;   et al. | 2018-08-30 |
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Method and process of implementing machine learning in complex multivariate wafer processing equipment Grant 9,972,478 - Guha , et al. May 15, 2 | 2018-05-15 |
Method and Process of Implementing Machine Learning in Complex Multivariate Wafer Processing Equipment App 20180082826 - Guha; Joydeep ;   et al. | 2018-03-22 |
Photoresist Design Layout Pattern Proximity Correction Through Fast Edge Placement Error Prediction Via A Physics-based Etch Profile Modeling Framework App 20170363950 - Sriraman; Saravanapriyan ;   et al. | 2017-12-21 |
Equipment front end module for transferring wafers and method of transferring wafers Grant 9,818,633 - Lill , et al. November 14, 2 | 2017-11-14 |
High aspect ratio etch with combination mask Grant 9,659,783 - Guha , et al. May 23, 2 | 2017-05-23 |
Internal Plasma Grid For Semiconductor Fabrication App 20160203990 - Singh; Harmeet ;   et al. | 2016-07-14 |
Internal Plasma Grid For Semiconductor Fabrication App 20160181130 - Singh; Harmeet ;   et al. | 2016-06-23 |
Equipment Front End Module For Transferring Wafers And Method Of Transferring Wafers App 20160111309 - Lill; Thorsten ;   et al. | 2016-04-21 |
Internal plasma grid for semiconductor fabrication Grant 9,245,761 - Singh , et al. January 26, 2 | 2016-01-26 |
Tunable Multi-zone Gas Injection System App 20150235811 - Cooperberg; David J. ;   et al. | 2015-08-20 |
High Aspect Ratio Etch With Combination Mask App 20150200106 - GUHA; Joydeep ;   et al. | 2015-07-16 |
High aspect ratio etch with combination mask Grant 9,018,103 - Guha , et al. April 28, 2 | 2015-04-28 |
High Aspect Ratio Etch With Combination Mask App 20150087154 - GUHA; Joydeep ;   et al. | 2015-03-26 |
Internal Plasma Grid For Semiconductor Fabrication App 20140302681 - Paterson; Alex ;   et al. | 2014-10-09 |
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Adjusting Substrate Temperature To Improve Cd Uniformity App 20140110060 - Gaff; Keith William ;   et al. | 2014-04-24 |
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Method and apparatus of halogen removal Grant 8,525,139 - Singh , et al. September 3, 2 | 2013-09-03 |
Adjusting Substrate Temperature To Improve Cd Uniformity App 20110143462 - Gaff; Keith William ;   et al. | 2011-06-16 |
Method And Apparatus Of Halogen Removal App 20110097902 - Singh; Harmeet ;   et al. | 2011-04-28 |
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Components For Use In A Plasma Chamber Having Reduced Particle Generation And Method Of Making App 20090261065 - SINGH; HARMEET ;   et al. | 2009-10-22 |
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Method To Improve Profile Control And N/p Loading In Dual Doped Gate Applications App 20070119545 - Del Puppo; Helene ;   et al. | 2007-05-31 |
Method To Improve Profile Control And N/p Loading In Dual Doped Gate Applications App 20070117399 - Del Puppo; Helene ;   et al. | 2007-05-24 |
Method for planarization etch with in-situ monitoring by interferometry prior to recess etch Grant 7,204,934 - Braly , et al. April 17, 2 | 2007-04-17 |
Method and apparatus to calibrate a semi-empirical process simulator Grant RE39,534 - Cooperberg , et al. March 27, 2 | 2007-03-27 |
Method to improve profile control and N/P loading in dual doped gate applications Grant 7,186,661 - Puppo , et al. March 6, 2 | 2007-03-06 |
Method and apparatus for tuning a set of plasma processing steps App 20070034604 - Vahedi; Vahid ;   et al. | 2007-02-15 |
Methods and apparatus for tuning a set of plasma processing steps Grant 7,138,067 - Vahedi , et al. November 21, 2 | 2006-11-21 |
Enhanced process and profile simulator algorithms Grant 7,139,632 - Cooperberg , et al. November 21, 2 | 2006-11-21 |
Methods and apparatus for tuning a set of plasma processing steps App 20060065628 - Vahedi; Vahid ;   et al. | 2006-03-30 |
Methods for controlling and reducing profile variation in photoresist trimming Grant 7,018,780 - Vahedi , et al. March 28, 2 | 2006-03-28 |
In-situ cleaning of a polymer coated plasma processing chamber Grant 6,994,769 - Singh , et al. February 7, 2 | 2006-02-07 |
Enhanced process and profile simulator algorithms App 20050278057 - Cooperberg, David ;   et al. | 2005-12-15 |
Variable temperature processes for tunable electrostatic chuck Grant 6,921,724 - Kamp , et al. July 26, 2 | 2005-07-26 |
Plasma processor with electrode simultaneously responsive to plural frequencies Grant 6,841,943 - Vahedi , et al. January 11, 2 | 2005-01-11 |
In-situ cleaning of a polymer coated plasma processing chamber App 20040231800 - Singh, Harmeet ;   et al. | 2004-11-25 |
Enhanced process and profile simulator algorithms Grant 6,804,572 - Cooperberg , et al. October 12, 2 | 2004-10-12 |
Method to improve profile control and n/p loading in dual doped gate applications App 20040175950 - Puppo, Helene Del ;   et al. | 2004-09-09 |
In-situ cleaning of a polymer coated plasma processing chamber Grant 6,776,851 - Singh , et al. August 17, 2 | 2004-08-17 |
Plasma processor with electrode simultaneously responsive to plural frequencies App 20040000875 - Vahedi, Vahid ;   et al. | 2004-01-01 |
Methods for reducing profile variation in photoresist trimming Grant 6,653,058 - Vahedi , et al. November 25, 2 | 2003-11-25 |
Variable temperature processes for tunable electrostatic chuck App 20030186545 - Kamp, Tom A. ;   et al. | 2003-10-02 |
Method for scaling processes between different etching chambers and wafer sizes Grant 6,618,638 - Vahedi , et al. September 9, 2 | 2003-09-09 |
Methods for controlling and reducing profile variation in photoresist trimming App 20030148224 - Vahedi, Vahid ;   et al. | 2003-08-07 |
Applications of a semi-empirical, physically based, profile simulator Grant 6,577,915 - Cooperberg , et al. June 10, 2 | 2003-06-10 |
Tunable multi-zone gas injection system App 20030070620 - Cooperberg, David J. ;   et al. | 2003-04-17 |
Methods for reducing profile variation in photoresist trimming App 20020018965 - Vahedi, Vahid ;   et al. | 2002-02-14 |
Techniques for improving etch rate uniformity Grant 6,344,105 - Daugherty , et al. February 5, 2 | 2002-02-05 |
Methods for reducing profile variation in photoresist trimming Grant 6,316,169 - Vahedi , et al. November 13, 2 | 2001-11-13 |
Method and apparatus to calibrate a semi-empirical process simulator Grant 6,301,510 - Cooperberg , et al. October 9, 2 | 2001-10-09 |
Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features Grant 6,218,309 - Miller , et al. April 17, 2 | 2001-04-17 |
Method and apparatus for predicting plasma-process surface profiles Grant 6,151,532 - Barone , et al. November 21, 2 | 2000-11-21 |
Methods for reducing mask erosion during plasma etching Grant 6,093,332 - Winniczek , et al. July 25, 2 | 2000-07-25 |
Method for reduction of plasma charging damage during chemical vapor deposition Grant 5,913,140 - Roche , et al. June 15, 1 | 1999-06-15 |